Abstract: An analyzing method includes preparing measured position information that is position information of a plurality of measured-parts formed on a substrate, and fitting a reference function, which is a sum of at least one function obtained by multiplying a criterion function expressed using a first type Bessel function by a proportional coefficient, to the measured position information and calculating an optimum value of at least one of the proportional coefficient.

Abstract: An exposure apparatus comprises: a first optical member for acquiring positional information about the substrate through a first liquid that is for measurement; a second optical member that emits the exposure beam; a first movable member that holds the substrate and is capable of moving within a prescribed area that includes a first position, which opposes the first optical member, and a second position, which opposes the second optical member; and a first liquid holding member that can be positioned at the first position; wherein, by disposing at least one of the first movable member and the first liquid holding member at the first position, a first space, which is capable of holding the first liquid, continues to be formed between the first optical member and at least one of the first movable member, the substrate, which is held by the first movable member, and the first liquid holding member.