Patents by Inventor Ayako TATEMATSU

Ayako TATEMATSU has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method for particle analysis and method for particle production
    Patent number: 11988636
    Abstract: The method for particle analysis includes a first magnetic susceptibility measurement step S4 of measuring a volume magnetic susceptibility of each of first particles p1; an encapsulation treatment step S5 of performing an encapsulation treatment so that the first particles p1 encapsulate an encapsulation target component pt smaller than the first particles p1; a second magnetic susceptibility measurement step S8 of measuring a volume magnetic susceptibility of each of second particles p2 as an analysis target that are the first particles p1 after the encapsulation treatment; and a step S9 of analyzing whether or not the encapsulation target component pt is encapsulated in the second particles p2 based on a result of measurement in the first magnetic susceptibility measurement step S4 and a result of measurement in the second magnetic susceptibility measurement step S8.
    Type: Grant
    Filed: April 24, 2020
    Date of Patent: May 21, 2024
    Assignees: KAWANO Lab. Inc., TableMark Co., Ltd.
    Inventors: Makoto Kawano, Ayako Tatematsu, Ryosuke Abe
  • METHOD FOR PARTICLE ANALYSIS AND METHOD FOR PARTICLE PRODUCTION
    Publication number: 20200340947
    Abstract: The method for particle analysis includes a first magnetic susceptibility measurement step S4 of measuring a volume magnetic susceptibility of each of first particles p1; an encapsulation treatment step S5 of performing an encapsulation treatment so that the first particles p1 encapsulate an encapsulation target component pt smaller than the first particles p1; a second magnetic susceptibility measurement step S8 of measuring a volume magnetic susceptibility of each of second particles p2 as an analysis target that are the first particles p1 after the encapsulation treatment; and a step S9 of analyzing whether or not the encapsulation target component pt is encapsulated in the second particles p2 based on a result of measurement in the first magnetic susceptibility measurement step S4 and a result of measurement in the second magnetic susceptibility measurement step S8.
    Type: Application
    Filed: April 24, 2020
    Publication date: October 29, 2020
    Applicants: KAWANO Lab. Inc., TableMark Co., Ltd.
    Inventors: Makoto KAWANO, Ayako TATEMATSU, Ryosuke ABE