Patents by Inventor Ayano SASAKI

Ayano SASAKI has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20230407127
    Abstract: A coating agent has: a film-forming component containing an organosilicon compound having a radical polymerizable functional group and an alkoxysilyl group; and a film-curing component composed so that a base and a radical can be generated on irradiation with ultraviolet light. The film-curing component includes a nonionic photobase generator having no ionic bond in the molecular structure. The content of the nonionic photobase generator is 0.1 parts by mass or more and 50 parts by mass or less, based on 100 parts by mass of the organosilicon compound.
    Type: Application
    Filed: November 12, 2021
    Publication date: December 21, 2023
    Applicants: KABUSHIKI KAISHA TOYOTA JIDOSHOKKI, Tokyo University of Science Foundation
    Inventors: Ayano SASAKI, Sayako SATO, Hidenori MUNEKATA, Motoshige ISOBE, Hisashi MURAMATSU, Koji ARIMITSU
  • Publication number: 20170202217
    Abstract: Provided is a polymer material having effective antibacterial properties and having bio adaptability in which cytotoxicity, especially low hemolysis, when used in contact with in vivo tissue and blood is suppressed so as to be low. The polymer is characterized by comprising a main chain and a side chain portion which is linked to the main chain via a linker and which contains at least a structure specified by the following (A) and (B). (A) A structure containing a cationic group and (B) a structure in which expression of bio adaptability is expected.
    Type: Application
    Filed: May 8, 2015
    Publication date: July 20, 2017
    Applicant: NATIONAL UNIVERSITY CORPORATION YAMAGATA UNIVERSITY
    Inventors: Masaru Tanaka, Kazuki Fukushima, Chikako Sato, Ayano Sasaki, Kouhei Kishi
  • Patent number: 9637722
    Abstract: A polyurethane porous membrane is produced by a simple method to be used for at least one of applications of cell culture and cancer cell growth inhibition. The production method of the polyurethane porous membrane to be used for at least one of the applications of cell culture and cancer cell growth inhibition comprises: a first step of forming a layer of a polyurethane material which is uncured, on a substrate; and a second step of supplying water vapor to an exposed surface of the layer of the polyurethane material formed on the substrate, which is away from the substrate, so as to cure the polyurethane material and provide the layer of the polyurethane material with a porous structure having a plurality of irregularities on the exposed surface.
    Type: Grant
    Filed: July 1, 2014
    Date of Patent: May 2, 2017
    Assignees: TOYODA GOSEI CO., LTD., National University Corporation Yamagata University
    Inventors: Seitaro Taki, Hisashi Mizuno, Hiroyuki Nakagawa, Toshiyuki Hagiyama, Atsuki Yoshimura, Masaru Tanaka, Ayano Sasaki, Toshifumi Takahashi, Tsuyoshi Ohta
  • Publication number: 20150017725
    Abstract: A polyurethane porous membrane is produced by a simple method to be used for at least one of applications of cell culture and cancer cell growth inhibition. The production method of the polyurethane porous membrane to be used for at least one of the applications of cell culture and cancer cell growth inhibition comprises: a first step of forming a layer of a polyurethane material which is uncured, on a substrate; and a second step of supplying water vapor to an exposed surface of the layer of the polyurethane material formed on the substrate, which is away from the substrate, so as to cure the polyurethane material and provide the layer of the polyurethane material with a porous structure having a plurality of irregularities on the exposed surface.
    Type: Application
    Filed: July 1, 2014
    Publication date: January 15, 2015
    Inventors: Seitaro TAKI, Hisashi MIZUNO, Hiroyuki NAKAGAWA, Toshiyuki HAGIYAMA, Atsuki YOSHIMURA, Masaru TANAKA, Ayano SASAKI, Toshifumi TAKAHASHI, Tsuyoshi OHTA