Patents by Inventor Ayao Nabeya

Ayao Nabeya has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Film forming apparatus and film forming method
    Patent number: 8702913
    Abstract: A film formation apparatus and film formation method that improve film thickness uniformity. A rotation mechanism holds a target having a sputtered surface in a state inclined relative to a surface of a substrate. The rotation mechanism rotatably supports the target about an axis extending along a normal of the sputtered surface. The target supported by the rotation mechanism is sputtered to form a thin film on the surface of the substrate. When forming the thin film, the rotation mechanism maintains the rotational angle of the target.
    Type: Grant
    Filed: September 29, 2008
    Date of Patent: April 22, 2014
    Assignee: Ulvac, Inc.
    Inventors: Kenichi Imakita, Tadashi Morita, Hiroki Yamamoto, Naoki Morimoto, Ayao Nabeya, Shinya Nakamura
  • FILM FORMING APPARATUS AND FILM FORMING METHOD
    Publication number: 20100236918
    Abstract: A film formation apparatus and film formation method that improve film thickness uniformity. A rotation mechanism holds a target having a sputtered surface in a state inclined relative to a surface of a substrate. The rotation mechanism rotatably supports the target about an axis extending along a normal of the sputtered surface. The target supported by the rotation mechanism is sputtered to form a thin film on the surface of the substrate. When forming the thin film, the rotation mechanism maintains the rotational angle of the target.
    Type: Application
    Filed: September 29, 2008
    Publication date: September 23, 2010
    Applicant: ULVAC, INC.
    Inventors: Kenichi Imakita, Tadashi Morita, Hiroki Yamamoto, Naoki Morimoto, Ayao Nabeya, Shinya Nakamura