Patents by Inventor Ayumu Miyoshi
Ayumu Miyoshi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 8900426Abstract: A sputtering apparatus including a target holder configured to hold at least two targets; a substrate holder configured to hold a substrate; a first shutter plate arranged between the target holder and the substrate holder, the first shutter plate having at least two holes and being capable of rotating around an axis; a second shutter plate arranged between the first shutter plate and the substrate holder, the second shutter plate having at least two holes and being capable of rotating around the axis; wherein the first and second shutter plates are rotated such that paths are simultaneously created between the at least two targets and the substrate through the at least two holes of the rotated first shutter plate and the at least two holes of the rotated second shutter plate, and a film is formed on the substrate by co-sputtering of the at least two targets.Type: GrantFiled: December 12, 2011Date of Patent: December 2, 2014Assignee: Canon Anelva CorporationInventors: Shuji Nomura, Ayumu Miyoshi, Hiroshi Miki
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Patent number: 8601978Abstract: The present invention provides a substrate processing apparatus capable of suppressing mutual contamination and/or damage of the insides of ion beam generators arranged opposite each other via a substrate, and a magnetic recording medium manufacturing method. A substrate processing apparatus according to an embodiment of the present invention includes a first ion beam generator that applies an ion beam to one surface to be processed of a substrate, and a second ion beam generator that applies an ion beam to another surface to be processed, which are arranged opposite each other via the substrate, and a first grid in the first ion beam generator, and a second grid in the second ion beam generator are configured so as to be asymmetrical to each other.Type: GrantFiled: July 14, 2009Date of Patent: December 10, 2013Assignee: Canon Anelva CorporationInventors: Kazuto Yamanaka, Masahiro Shibamoto, Ayumu Miyoshi, Satoshi Hitomi, David Djulianto Djayaprawira
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Patent number: 8536539Abstract: An ion beam generator includes a discharge tank for generating plasma that includes ions. A lead-out electrode has an annular grid portion provided with openings for leading out the ions generated in the discharge tank, while accelerating the generated ions as an annular ion beam. A deflecting electrode deflects the annular ion beam, which is led out of the lead-out electrode, in an annular center direction.Type: GrantFiled: November 30, 2010Date of Patent: September 17, 2013Assignee: Canon Anelva CorporationInventors: Hirohisa Hirayanagi, Ayumu Miyoshi, Einstein Noel Abarra
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Patent number: 8281740Abstract: The present invention provides a substrate processing apparatus capable of suppressing mutual contamination and/or damage of the insides of ion beam generators arranged opposite each other via a substrate, and a magnetic recording medium manufacturing method. A substrate processing apparatus according to an embodiment of the present invention includes a first ion beam generator that applies an ion beam to one surface to be processed of a substrate W, and a second ion beam generator that applies an ion beam to another surface to be processed, which are arranged opposite each other via the substrate W, and an area of a first grid in the first ion beam generator, and an area of a second grid in the second ion beam generator, each area corresponding to an opening of the substrate W, are occluded.Type: GrantFiled: July 14, 2009Date of Patent: October 9, 2012Assignee: Canon Anelva CorporationInventors: Kazuto Yamanaka, Masahiro Shibamoto, Ayumu Miyoshi, Satoshi Hitomi, David Djulianto Djayaprawira
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Publication number: 20120104274Abstract: There is provided an ion beam generating apparatus capable of reducing power consumption and obtain highly-accurate uniformity in a substrate process without providing a mechanism to rotate a substrate. Each of ion beam generating apparatuses 1a and 1b includes a discharging tank for generating plasma, an extraction electrode including an inclined portion arranged so as to be inclined with respect to an irradiated surface for extracting an ion generated in the discharging tank, a rotating driving unit 30 provided out of the discharging tank for rotating the extraction electrode, and a rotation supporting member 31 for coupling the rotating driving unit 30 and the extraction electrode 7, wherein an insulator block 34 arranged around the rotation supporting member 31 is included in the discharging tank.Type: ApplicationFiled: July 13, 2010Publication date: May 3, 2012Applicant: CANON ANELVA CORPORATIONInventors: Hirohisa Hirayanagi, Ayumu Miyoshi, Einstein Noel Abarra
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Publication number: 20120097533Abstract: A sputtering apparatus including a target holder configured to hold at least two targets; a substrate holder configured to hold a substrate; a first shutter plate arranged between the target holder and the substrate holder, the first shutter plate having at least two holes and being capable of rotating around an axis; a second shutter plate arranged between the first shutter plate and the substrate holder, the second shutter plate having at least two holes and being capable of rotating around the axis; wherein the first and second shutter plates are rotated such that paths are simultaneously created between the at least two targets and the substrate through the at least two holes of the rotated first shutter plate and the at least two holes of the rotated second shutter plate, and a film is formed on the substrate by co-sputtering of the at least two targets.Type: ApplicationFiled: December 12, 2011Publication date: April 26, 2012Applicant: CANON ANELVA CORPORATIONInventors: Shuji NOMURA, Ayumu Miyoshi, Hiroshi Miki
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Publication number: 20110147200Abstract: An ion beam generator generates plasma in a discharge tank 2, leads out an annular ion beam by a lead-out electrode 7, and deflects the ion beam in an annular center direction by a deflecting electrode 30 to enter a substrate W from the inclined direction to provide uniformity of the incident ion beam to the substrate without increasing the size of the whole apparatus.Type: ApplicationFiled: November 30, 2010Publication date: June 23, 2011Applicant: CANON ANELVA CORPORATIONInventors: Hirohisa Hirayanagi, Ayumu Miyoshi, Einstein Noel Abarra
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Patent number: 7850827Abstract: A double-layer shutter control method of a multi-sputtering system provided with three targets in a single chamber and a double-layer rotating shutter mechanism having shutter plates which independently rotate and have holes formed therein, comprising selecting a target by a combination of holes of a first shutter plate and a second shutter plate and uses the selected target for a pre-sputtering step and a main sputtering step with continuous discharge so as to deposit a film on a substrate, whereby it is possible to prevent cross-contamination between targets due to target substances etc. deposited on the shutter plates.Type: GrantFiled: March 14, 2005Date of Patent: December 14, 2010Assignee: Canon Anelva CorporationInventors: Shuji Nomura, Ayumu Miyoshi, Hiroshi Miki
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Publication number: 20100028529Abstract: The present invention provides a substrate processing apparatus capable of suppressing mutual contamination and/or damage of the insides of ion beam generators arranged opposite each other via a substrate, and a magnetic recording medium manufacturing method. A substrate processing apparatus according to an embodiment of the present invention includes a first ion beam generator that applies an ion beam to one surface to be processed of a substrate, and a second ion beam generator that applies an ion beam to another surface to be processed, which are arranged opposite each other via the substrate, and a first grid in the first ion beam generator, and a second grid in the second ion beam generator are configured so as to be asymmetrical to each other.Type: ApplicationFiled: July 14, 2009Publication date: February 4, 2010Applicant: CANON ANELVA CORPORATIONInventors: Kazuto Yamanaka, Masahiro Shibamoto, Ayumu Miyoshi, Satoshi Hitomi, David Djulianto Djayaprawira
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Publication number: 20100025363Abstract: The present invention provides a substrate processing apparatus capable of suppressing mutual contamination and/or damage of the insides of ion beam generators arranged opposite each other via a substrate, and a magnetic recording medium manufacturing method. A substrate processing apparatus according to an embodiment of the present invention includes a first ion beam generator that applies an ion beam to one surface to be processed of a substrate W, and a second ion beam generator that applies an ion beam to another surface to be processed, which are arranged opposite each other via the substrate W, and an area of a first grid in the first ion beam generator, and an area of a second grid in the second ion beam generator, each area corresponding to an opening of the substrate W, are occluded.Type: ApplicationFiled: July 14, 2009Publication date: February 4, 2010Applicant: CANON ANELVA CORPORATIONInventors: Kazuto Yamanaka, Masahiro Shibamoto, Ayumu Miyoshi, Satoshi Hitomi, David Djulianto Djayaprawira
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Publication number: 20090139865Abstract: A double-layer shutter control method of a multi-sputtering system provided with three targets in a single chamber and a double-layer rotating shutter mechanism having shutter plates which independently rotate and have holes formed therein, comprising selecting a target by a combination of holes of a first shutter plate and a second shutter plate and uses the selected target for a pre-sputtering step and a main sputtering step with continuous discharge so as to deposit a film on a substrate, whereby it is possible to prevent cross-contamination between targets due to target substances etc. deposited on the shutter plates.Type: ApplicationFiled: November 17, 2008Publication date: June 4, 2009Applicant: Canon Anelva CorporationInventors: Shuji Nomura, Ayumu Miyoshi, Hiroshi Miki
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Publication number: 20050199490Abstract: A double-layer shutter control method of a multi-sputtering system provided with three targets in a single chamber and a double-layer rotating shutter mechanism having shutter plates which independently rotate and have holes formed therein, comprising selecting a target by a combination of holes of a first shutter plate and a second shutter plate and uses the selected target for a pre-sputtering step and a main sputtering step with continuous discharge so as to deposit a film on a substrate, whereby it is possible to prevent cross-contamination between targets due to target substances etc. deposited on the shutter plates.Type: ApplicationFiled: March 14, 2005Publication date: September 15, 2005Applicant: ANELVA CorporationInventors: Shuji Nomura, Ayumu Miyoshi, Hiroshi Miki
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Patent number: 6641703Abstract: A magnetic multi-layer film manufacturing apparatus has a transferring chamber, a plurality of film-depositing chambers, and a robotic transferring device. Each film-depositing chamber has a rotatable substrate holder, a plurality of targets positioned at an incline on an opposing interior surface from the substrate holder, and a double layer rotating shutter mechanism and is controllable to deposit at least one layer of a magnetic multi-layer film structure. Magnetic multi-layer film structures are formed by depositing a plurality of magnetic films divided into a plurality of groups, each one of the plurality of groups deposited in an associated one of the plurality of film-depositing chambers continuously in a laminated state. A first division between successive groups of magnetic films is between a metal oxide film and a magnetic layer continuous therewith and a second division is between an antiferromagnetic layer and a magnetic layer continuous therewith.Type: GrantFiled: November 30, 2001Date of Patent: November 4, 2003Assignee: Anelva CorporationInventors: Shuji Nomura, Ayumu Miyoshi, Koji Tsunekawa
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Publication number: 20020064595Abstract: A magnetic multi-layer film manufacturing apparatus has a transferring chamber, a plurality of film-depositing chambers, and a robotic transferring device. Each film-depositing chamber has a rotatable substrate holder, a plurality of targets positioned at an incline on an opposing interior surface from the substrate holder, and a double layer rotating shutter mechanism and is controllable to deposit at least one layer of a magnetic multi-layer film structure. Magnetic multi-layer film structures are formed by depositing a plurality of magnetic films divided into a plurality of groups, each one of the plurality of groups deposited in an associated one of the plurality of film-depositing chambers continuously in a laminated state. A first division between successive groups of magnetic films is between a metal oxide film and a magnetic layer continuous therewith and a second division is between an antiferromagnetic layer and a magnetic layer continuous therewith.Type: ApplicationFiled: November 30, 2001Publication date: May 30, 2002Inventors: Shuji Nomura, Ayumu Miyoshi, Koji Tsunekawa