Patents by Inventor Azusa SUZUKI

Azusa SUZUKI has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 12060207
    Abstract: Provided are: a laminate film which is equipped with a vapor-deposited aluminum oxide film exhibiting high barrier performance and excellent so-called retort resistance, and also exhibits favorable adhesion between the vapor-deposited aluminum oxide film and a plastic substrate even after undergoing a hydrothermal treatment; a barrier laminate film containing the laminate film; and a barrier packaging material which uses the barrier laminate film.
    Type: Grant
    Filed: March 20, 2019
    Date of Patent: August 13, 2024
    Assignee: DAI NIPPON PRINTING CO., LTD.
    Inventors: Yoshihiro Kishimoto, Azusa Suzuki, Kanari Aono, Yasunari Iio, Shohei Itami
  • Patent number: 11655087
    Abstract: The present invention addresses the problem of providing a barrier resin film exhibiting excellent barrier properties without adopting a multilayer structure such as the structures used by the prior art. A barrier resin film obtained by forming a vapor-deposited aluminum oxide film on the surface of a resin substrate, wherein an elementally bonded structural unit represented by Al3 is distributed in the vapor-deposited aluminum oxide film, and the intensity ratio (Al3/Al2O3×100) of the maximum Al3 concentration elementally bonded structure section according to Time-of-Flight secondary ion mass spectrometry (TOF-SIMS) is 1-20, inclusive.
    Type: Grant
    Filed: March 20, 2019
    Date of Patent: May 23, 2023
    Assignee: DAI NIPPON PRINTING CO., LTD.
    Inventors: Yoshihiro Kishimoto, Azusa Suzuki
  • Publication number: 20210002050
    Abstract: The present invention addresses the problem of providing a barrier resin film exhibiting excellent barrier properties without adopting a multilayer structure such as the structures used by the prior art. A barrier resin film obtained by forming a vapor-deposited aluminum oxide film on the surface of a resin substrate, wherein an elementally bonded structural unit represented by Al3 is distributed in the vapor-deposited aluminum oxide film, and the intensity ratio (Al3/Al2O3×100) of the maximum Al3 concentration elementally bonded structure section according to Time-of-Flight secondary ion mass spectrometry (TOF-SIMS) is 1-20, inclusive.
    Type: Application
    Filed: March 20, 2019
    Publication date: January 7, 2021
    Inventors: Yoshihiro KISHIMOTO, Azusa SUZUKI
  • Publication number: 20200407136
    Abstract: Provided are: a laminate film which is equipped with a vapor-deposited aluminum oxide film exhibiting high barrier performance and excellent so-called retort resistance, and also exhibits favorable adhesion between the vapor-deposited aluminum oxide film and a plastic substrate even after undergoing a hydrothermal treatment; a barrier laminate film containing the laminate film; and a barrier packaging material which uses the barrier laminate film.
    Type: Application
    Filed: March 20, 2019
    Publication date: December 31, 2020
    Inventors: Yoshihiro KISHIMOTO, Azusa SUZUKI, Kanari AONO, Yasunari IIO, Shohei ITAMI
  • Patent number: 10030113
    Abstract: The invention provides a gas barrier film with low deterioration in the gas barrier property before and after high-temperature hot water treatment. The gas barrier film has a gas barrier coating film, formed as a composite film comprising a network structure having a mesh structure with Si—O—Si bonds as the basic lattice and a water-soluble polymer crystallized as microcrystals, incorporated into the mesh of the network structure, wherein a barrier coating agent, obtained by mixing a condensate solution of an alkoxysilane hydrolysate prepared as a mixed solution in which the proportion of bonded states of the silicon atoms of the condensate with Q1 and Q2 structures is at least 60% of the total silicon atoms, with a crystalline water-soluble polymer, is coated on a base material film, either after forming or without forming an aluminum oxide vapor deposition film, to form a coating layer.
    Type: Grant
    Filed: March 27, 2015
    Date of Patent: July 24, 2018
    Assignee: Dai Nippon Printing Co., Ltd.
    Inventors: Azusa Suzuki, Hiroyuki Iwahashi, Takeshi Nishizono, Shigeki Matsui, Kazutoshi Haraguchi
  • Publication number: 20170009034
    Abstract: The invention provides a gas barrier film with low deterioration in the gas barrier property before and after high-temperature hot water treatment. The gas barrier film has a gas barrier coating film, formed as a composite film comprising a network structure having a mesh structure with Si—O—Si bonds as the basic lattice and a water-soluble polymer crystallized as microcrystals, incorporated into the mesh of the network structure, wherein a barrier coating agent, obtained by mixing a condensate solution of an alkoxysilane hydrolysate prepared as a mixed solution in which the proportion of bonded states of the silicon atoms of the condensate with Q1 and Q2 structures is at least 60% of the total silicon atoms, with a crystalline water-soluble polymer, is coated on a base material film, either after forming or without forming an aluminum oxide vapor deposition film, to form a coating layer.
    Type: Application
    Filed: March 27, 2015
    Publication date: January 12, 2017
    Inventors: Azusa SUZUKI, Hiroyuki IWAHASHI, Kenji NISHIZONO, Shigeki MATSUI, Kazutoshi HARAGUCHI