Patents by Inventor B. Eugene Hammons

B. Eugene Hammons has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Reflection mass spectrometry technique for monitoring and controlling composition during molecular beam epitaxy
    Patent number: 5171399
    Abstract: A method for on-line accurate monitoring and precise control of molecular beam epitaxial growth of Groups III-III-V or Groups III-V-V layers in an advanced semiconductor device incorporates reflection mass spectrometry. The reflection mass spectrometry is responsive to intentional perturbations in molecular fluxes incident on a substrate by accurately measuring the molecular fluxes reflected from the substrate.The reflected flux is extremely sensitive to the state of the growing surface and the measurements obtained enable control of newly forming surfaces that are dynamically changing as a result of growth.
    Type: Grant
    Filed: August 15, 1990
    Date of Patent: December 15, 1992
    Assignee: The United States of America as represented by the United States Department of Energy
    Inventors: Thomas M. Brennan, B. Eugene Hammons, Jeffrey Y. Tsao