Patents by Inventor Baastiaan Wolschrijn

Baastiaan Wolschrijn has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Lithographic device, device manufacturing method and device manufactured thereby
    Publication number: 20060268246
    Abstract: A lithographic apparatus is configured to project a pattern from a patterning device onto a substrate. The apparatus includes a gas purged sealing aperture extending between at least two different zones of the apparatus, and a gas supplier configured to supply the sealing aperture one or more gases selected from a group including hydrogen, deuterium, heavy hydrogen, deuterated hydrogen, and a mixture of argon and hydrogen.
    Type: Application
    Filed: March 29, 2006
    Publication date: November 30, 2006
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Johannes Jacobs, Vadim Banine, Barrie Brewster, Vladimir Ivanov, Bastiaan Mertens, Johannes Moors, Robert Livesey, Baastiaan Wolschrijn