Abstract: A method includes receiving, using radio frequency (RF) collectors, RF signals from a target object. The RF signals of target object may be converted to In-phase and Quadrature (I/Q) data. Navigation data of each RF collector may be determined and I/Q data of each of RF collectors are paired. Processing functions may be applied on paired I/Q data. Using paired I/Q data, one or more of time difference of arrival (TDOA) measurement data and frequency difference of arrival (FDOA) measurement data between each pair of the RF collectors are determined. One or more of TDOA measurement data, FDOA measurement data and navigation data of each RF collector are converted to message data. A trajectory of target object may be estimated based on confidence measure of one or more of TDOA and FDOA measurement data. Using estimated trajectory of target object for displaying on a display device of a computing device.

Abstract: A method of determining overlay error between a template and a substrate using placement of template features and placement of substrate features in one or more images. Estimated distortion of the template and/or substrate may be determined using the overlay error. One or more forces acting on the template and/or substrate may be varied based on the estimated distortion for subsequent nano-lithography imprinting. Additionally, bias may be introduced in subsequent imprinting steps based on overlay performance.

Abstract: Imprint lithography benefits from precise alignment between a template and a substrate during imprinting. A moiré signal resulting from indicia on the template and the substrate are acquired by a system comprising a line-scan camera and a digital micromirror device (DMD) which provides a high bandwidth, low-latency signal. Once acquired, the moiré signal may be used directly to align the template and the substrate without need for discrete position/angle encoders.

Abstract: A method of determining overlay error between a template and a substrate using placement of template features and placement of substrate features in one or more images. Estimated distortion of the template and/or substrate may be determined using the overlay error. One or more forces acting on the template and/or substrate may be varied based on the estimated distortion for subsequent nano-lithography imprinting. Additionally, bias may be introduced in subsequent imprinting steps based on overlay performance.

Abstract: Imprint lithography benefits from precise alignment between a template and a substrate during imprinting. A moiré signal resulting from indicia on the template and the substrate are acquired by a system comprising a line-scan camera and a digital micromirror device (DMD) which provides a high bandwidth, low-latency signal. Once acquired, the moiré signal may be used directly to align the template and the substrate without need for discrete position/angle encoders.

Abstract: Methods for locating an alignment mark on a substrate are described. Generally, the substrate includes one or more locator marks adjacent to a substrate alignment mark. Locator marks provide the relative location of the substrate alignment mark such that the substrate alignment mark may be used in aligning a substrate with a template within a lithographic system with a reduced magnitude of relative displacement.