Patents by Inventor Balaji Devulapalli

Balaji Devulapalli has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • MODELING APPROACH FOR DEVELOPMENT OF GAS INJECTION UNIT WITHIN PROCESSING CHAMBER
    Publication number: 20260099638
    Abstract: A model of a processing chamber with a gas injection unit is used to perform simulated process conditions based on different combinations of parameter values. The simulated process conditions correspond to different measurements of a process variable, such as a etch byproduct removal rate. Based on the simulations, an optimal set of parameter values is determined that optimizes the variable. The gas injection unit is designed in accordance with this optimal set of parameter values.
    Type: Application
    Filed: October 4, 2024
    Publication date: April 9, 2026
    Inventors: Devi Raghavee Veerappan, Balaji Devulapalli, Shreeram Jyoti Dash, Ajit Balakrishna, Alok Ranjan
  • Fluidized bed reactor systems
    Patent number: 8906313
    Abstract: Gas distribution units of fluidized bed reactors are configured to direct thermally decomposable compounds to the center portion of the reactor and away from the reactor wall to prevent deposition of material on the reactor wall and process for producing polycrystalline silicon product in a reactor that reduce the amount of silicon which deposits on the reactor wall.
    Type: Grant
    Filed: June 29, 2009
    Date of Patent: December 9, 2014
    Assignee: SunEdison, Inc.
    Inventors: Milind S. Kulkarni, Puneet Gupta, Balaji Devulapalli, Jameel Ibrahim, Vithal Revankar, Kwasi Foli
  • Methods for introducing a first gas and a second gas into a reaction chamber
    Patent number: 8728574
    Abstract: Gas distribution units of fluidized bed reactors are configured to direct thermally decomposable compounds to the center portion of the reactor and away from the reactor wall to prevent deposition of material on the reactor wall and process for producing polycrystalline silicon product in a reactor that reduce the amount of silicon which deposits on the reactor wall.
    Type: Grant
    Filed: April 25, 2012
    Date of Patent: May 20, 2014
    Assignee: MEMC Electronic Materials, Inc.
    Inventors: Milind S. Kulkarni, Puneet Gupta, Balaji Devulapalli, Jameel Ibrahim, Vithal Revankar, Kwasi Foli
  • Methods for producing polycrystalline silicon that reduce the deposition of silicon on reactor walls
    Patent number: 8404206
    Abstract: Gas distribution units of fluidized bed reactors are configured to direct thermally decomposable compounds to the center portion of the reactor and away from the reactor wall to prevent deposition of material on the reactor wall and process for producing polycrystalline silicon product in a reactor that reduce the amount of silicon which deposits on the reactor wall.
    Type: Grant
    Filed: June 17, 2011
    Date of Patent: March 26, 2013
    Assignee: MEMC Electronic Materials, Inc.
    Inventors: Milind S. Kulkarni, Puneet Gupta, Balaji Devulapalli, Jameel Ibrahim, Vithal Revankar, Kwasi Foli
  • METHODS FOR INTRODUCTING A FIRST GAS AND A SECEOND GAS INTO A REACTION CHAMBER
    Publication number: 20120230903
    Abstract: Gas distribution units of fluidized bed reactors are configured to direct thermally decomposable compounds to the center portion of the reactor and away from the reactor wall to prevent deposition of material on the reactor wall and process for producing polycrystalline silicon product in a reactor that reduce the amount of silicon which deposits on the reactor wall.
    Type: Application
    Filed: April 25, 2012
    Publication date: September 13, 2012
    Applicant: MEMC ELECTRONIC MATERIALS, INC.
    Inventors: Milind Kulkarni, Puneet Gupta, Balaji Devulapalli, Jameel Ibrahim, Vithal Revankar, Kwasi Foli
  • METHODS FOR PRODUCING POLYCRYSTALLINE SILICON THAT REDUCE THE DEPOSITION OF SILICON ON REACTOR WALLS
    Publication number: 20110244124
    Abstract: Gas distribution units of fluidized bed reactors are configured to direct thermally decomposable compounds to the center portion of the reactor and away from the reactor wall to prevent deposition of material on the reactor wall and process for producing polycrystalline silicon product in a reactor that reduce the amount of silicon which deposits on the reactor wall.
    Type: Application
    Filed: June 17, 2011
    Publication date: October 6, 2011
    Applicant: MEMC ELECTRONIC MATERIALS, INC.
    Inventors: Milind S. Kulkarni, Puneet Gupta, Balaji Devulapalli, Jameel Ibrahim, Vithal Revankar, Kwasi Foli
  • Crucible For Use In A Directional Solidification Furnace
    Publication number: 20110180229
    Abstract: A directional solidification furnace comprises a crucible assembly including a crucible for containing a melt having walls and a base with an opening therein, a crucible support for supporting the crucible, and a lid covering the crucible. A plate is received in the opening in the base. The plate has a higher thermal conductivity than that of the base. The base can include a composite having an additive such that the composite base has a higher thermal conductivity than a comparable without the additive.
    Type: Application
    Filed: January 27, 2011
    Publication date: July 28, 2011
    Applicant: MEMC SINGAPORE PTE. LTD. (UEN200614794D)
    Inventors: Richard J. Phillips, Balaji Devulapalli, Steven L. Kimbel, Aditya J. Deshpande
  • FLUIDIZED BED REACTOR SYSTEMS AND METHODS FOR REDUCING THE DEPOSITION OF SILICON ON REACTOR WALLS
    Publication number: 20090324479
    Abstract: Gas distribution units of fluidized bed reactors are configured to direct thermally decomposable compounds to the center portion of the reactor and away from the reactor wall to prevent deposition of material on the reactor wall and process for producing polycrystalline silicon product in a reactor that reduce the amount of silicon which deposits on the reactor wall.
    Type: Application
    Filed: June 29, 2009
    Publication date: December 31, 2009
    Applicant: MEMC ELECTRONIC MATERIALS, INC.
    Inventors: Milind S. Kulkarni, Puneet Gupta, Balaji Devulapalli, Jameel Ibrahim, Vithal Revankar, Kwasi Foli