Abstract: This application discloses a method for manufacturing a thin film transistor, and a display panel. The method for manufacturing a thin film transistor includes steps of providing a substrate; forming an amorphous silicon thin film layer on the substrate; patterning the amorphous silicon thin film layer to form an amorphous silicon layer; forming a metal seed layer made of a nickel disilicide (NiSi2) material on the amorphous silicon layer; converting the amorphous silicon layer into a polysilicon layer under an induction effect of the metal seed layer and through an annealing treatment; and forming a source and drain layer.

Abstract: This application discloses a method for manufacturing a thin film transistor, and a display panel. The method for manufacturing a thin film transistor includes steps of providing a substrate; forming an amorphous silicon thin film layer on the substrate; patterning the amorphous silicon thin film layer to form an amorphous silicon layer; forming a metal seed layer made of a nickel disilicide (NiSi2) material on the amorphous silicon layer; converting the amorphous silicon layer into a polysilicon layer under an induction effect of the metal seed layer and through an annealing treatment; and forming a source and drain layer.

Abstract: A method of manufacturing array substrate and a display panel, wherein, the method of manufacturing array substrate includes: depositing a gate electrode, a gate insulation layer, a semiconductor layer, a metal layer and a photoresist; forming an non-exposure area, a partial exposure area and a full exposure area through exposure and developing; then, performing a first ashing treatment and a wet etching to form a metal layer recess, and performing a second ashing treatment to etch off residual photoresist which remains in the metal layer recess after the first ashing treatment; and finally performing a dry etching to form a pattern of a channel region.

Abstract: This application discloses a display substrate, a method of manufacturing the display substrate, and a display device. The method of manufacturing the display substrate includes a step of: sequentially forming a first structural layer, a second structural layer, a third structural layer, a fourth structural layer, and a fifth structural layer stacked on a substrate, and after the second structural layer is formed and before the third structural layer is formed, further includes the following step: performing plasma cleaning on a surface of the second structural layer.

Abstract: A method of manufacturing array substrate and a display panel, wherein, the method of manufacturing array substrate includes: depositing a gate electrode, a gate insulation layer, a semiconductor layer, a metal layer and a photoresist; forming an non-exposure area, a partial exposure area and a full exposure area through exposure and developing; then, performing a first ashing treatment and a wet etching to form a metal layer recess, and performing a second ashing treatment to etch off residual photoresist which remains in the metal layer recess after the first ashing treatment; and finally performing a dry etching to form a pattern of a channel region.

Abstract: A method for fabricating an array substrate, after the wet etching process of the source-drain metal layer (17), performs first ashing for the island-like photoresist pattern (19), such that the edge of the island-like photoresist pattern (19) is aligned with the edge of the source-drain metal segment (171).

Abstract: A method of manufacturing array substrate and a display panel, wherein, the method of manufacturing array substrate includes: depositing a gate electrode, a gate insulation layer, a semiconductor layer, a metal layer and a photoresist; forming an non-exposure area, a partial exposure area and a full exposure area through exposure and developing; then, performing a first ashing treatment and a wet etching to form a metal layer recess, and performing a second ashing treatment to etch off residual photoresist which remains in the metal layer recess after the first ashing treatment; and finally performing a dry etching to form a pattern of a channel region.

Abstract: A method of manufacturing array substrate and a display panel, wherein, the method of manufacturing array substrate includes: depositing a gate electrode, a gate insulation layer, a semiconductor layer, a metal layer and a photoresist; forming an non-exposure area, a partial exposure area and a full exposure area through exposure and developing; then, performing a first ashing treatment and a wet etching to form a metal layer recess, and performing a second ashing treatment to etch off residual photoresist which remains in the metal layer recess after the first ashing treatment; and finally performing a dry etching to form a pattern of a channel region.

Abstract: A method for fabricating an array substrate, after the wet etching process of the source-drain metal layer (17), performs first ashing for the island-like photoresist pattern (19), such that the edge of the island-like photoresist pattern (19) is aligned with the edge of the source-drain metal segment (171).