Abstract: Disclosed is a full-section anti-slide water-cut wall for treating giant landslides, which comprises at least one water-cut wall embedded in the landslide and arranged along the direction of blocking the movement of a sliding body; the water-cut wall comprises a plurality of anti-slide piles arranged at intervals, the bottom end of the anti-slide piles extend into the sliding bed, and a blocking wall is fixedly connected between adjacent anti-slide piles; the anti-slide pile and the blocking wall are provided with a plurality of drainage holes.

Abstract: An ultra-high performance concrete (UHPC) with waste brick powder and preparation method and application thereof are provided, which relates to the technical field of concrete. The preparation method includes the following steps: stimulating activity of a brick powder by a method of mechanically stimulating activity to obtain waste brick powder; and preparing UHPC according to a mass ratio of cement to waste brick powder of 5:5-7:3 to obtain the UHPC with waste brick powder. The UHPC is prepared by treating waste bricks from construction waste (mechanically stimulating activity) to make waste brick powder with activity, therefore partially replacing cement. The UHPC is applied in a construction field.

Abstract: An ultra-high performance concrete (UHPC) with waste brick powder and preparation method and application thereof are provided, which relates to the technical field of concrete. The preparation method includes the following steps: stimulating activity of a brick powder by a method of mechanically stimulating activity to obtain waste brick powder; and preparing UHPC according to a mass ratio of cement to waste brick powder of 5:5-7:3 to obtain the UHPC with waste brick powder. The UHPC is prepared by treating waste bricks from construction waste (mechanically stimulating activity) to make waste brick powder with activity, therefore partially replacing cement. The UHPC is applied in a construction field.

Abstract: The present invention belongs to the technical field of bridges, and specifically discloses a spatial multi-point synchronous closure construction method for a three-main-truss steel truss arch bridge. Problems such as difficult control, low efficiency and poor precision of a three-main-truss steel truss arch bridge can be improved by mounting standard rods, adjusting the standard rods to designed coordinates, observing coordinates and spacing of closure rods, processing and mounting the closure rods, adjusting spatial locations, monitoring the atmospheric temperature, analyzing a change rule, pushing the standard rods, adjusting gaps, and carrying out closure.

Abstract: An apparatus includes a photoelastic modulator (PEM) optical element including a first driving axis and a second driving axis arranged at a selected angle with respect to each other and perpendicular to an optical axis, wherein the first driving axis and the second driving axis extend respective predetermined non-equal lengths that correspond to respective predetermined non-equal natural first and second PEM frequencies f1 and f2. Methods of manufacture and operation are also disclosed.

Abstract: A reaction force diversion mechanism, a motor device and a photolithography machine are disclosed. The photolithography machine includes an illumination unit, a mask stage, a projection objective, a main baseplate, a wafer stage and a main carrier frame. The illumination unit and the mask stage are disposed above the main baseplate, and the main carrier frame is arranged above a ground base. Both of the wafer stage and the main baseplate are supported on the main carrier frame, and vibration dampers are deployed between the main carrier frame and the ground base. Reaction force diversion mechanisms are disposed between the wafer stage and the ground base and between the mask stage and the ground base. The reaction force diversion mechanisms can divert reaction forces generated from movement of the two motion stages onto the ground base while blocking vibration propagating from the ground base toward the motion stages.

Abstract: Example embodiments of methods, apparatus, and systems for measuring polarimetric parameters using spectroscopy are disclosed herein. Particular embodiments concern circular dichroism (CD) spectrometers that use a vertically aligned beam. In such embodiments, the solution being analyzed may have a top surface that forms a convex or concave meniscus, creating a surface through which the measuring beam passes that may refract the beam in undesirable ways. Accordingly, particular embodiments of the disclosed technology include one or more meniscus-compensating (meniscus-effect-reducing) components or subsystems. These components and/or subsystems can be used alone or in combination with one another to reduce the undesirable refractive effects caused by the meniscus at the solution's surface, thereby improving the resulting quality of the spectroscopy measurement and potentially improving the speed with which CD spectroscopy can be performed.

Abstract: An apparatus includes a photoelastic modulator (PEM) optical element including a first driving axis and a second driving axis arranged at a selected angle with respect to each other and perpendicular to an optical axis, wherein the first driving axis and the second driving axis extend respective predetermined non-equal lengths that correspond to respective predetermined non-equal natural first and second PEM frequencies f1 and f2. Methods of manufacture and operation are also disclosed.

Abstract: A reaction force diversion mechanism, a motor device and a photolithography machine are disclosed. The photolithography machine includes an illumination unit, a mask stage, a projection objective, a main baseplate, a wafer stage and a main carrier frame. The illumination unit and the mask stage are disposed above the main baseplate, and the main carrier frame is arranged above a ground base. Both of the wafer stage and the main baseplate are supported on the main carrier frame, and vibration dampers are deployed between the main carrier frame and the ground base. Reaction force diversion mechanisms are disposed between the wafer stage and the ground base and between the mask stage and the ground base. The reaction force diversion mechanisms can divert reaction forces generated from movement of the two motion stages onto the ground base while blocking vibration propagating from the ground base toward the motion stages.

Abstract: This disclosure is generally directed to systems for imaging polarization properties of optical-material samples. As one aspect, there is provided a system for precise, simultaneous imaging of both the in-plane and out-of-plane birefringence properties of sample material over a wide range of incidence angles. The spatially resolved imaging approach described here is amenable to determination of a wide range of polarimetric properties, in addition to the in-plane and out-of-plane birefringence measure discussed as a preferred embodiment.

Abstract: Example embodiments of methods, apparatus, and systems for measuring polarimetric parameters using spectroscopy are disclosed herein. Particular embodiments concern circular dichroism (CD) spectrometers that use a vertically aligned beam. In such embodiments, the solution being analyzed may have a top surface that forms a convex or concave meniscus, creating a surface through which the measuring beam passes that may refract the beam in undesirable ways. Accordingly, particular embodiments of the disclosed technology include one or more meniscus-compensating (meniscus-effect-reducing) components or subsystems. These components and/or subsystems can be used alone or in combination with one another to reduce the undesirable refractive effects caused by the meniscus at the solution's surface, thereby improving the resulting quality of the spectroscopy measurement and potentially improving the speed with which CD spectroscopy can be performed.

Abstract: This invention is directed to methods of unambiguously measuring the absolute retardance, ?A of an optical sample. A method for measuring absolute retardance of an optical sample includes directing light comprising a plurality of wavelengths through a polarization state generator source, the optical sample, and a polarization state analyzer, detecting, at an imaging device, retardance measurement light emanating from the optical sample after also passing through the polarization state analyzer at the plurality of wavelengths, determining a measurement retardance associated with the detected retardance measurement light at each of the wavelengths, and determining an absolute retardance associated with the optical sample based on the measurement retardances determined at each of the wavelengths.

Abstract: This disclosure is generally directed to systems for imaging polarization properties of optical-material samples. As one aspect, there is provided a system for precise, simultaneous imaging of both the in-plane and out-of-plane birefringence properties of sample material over a wide range of incidence angles. The spatially resolved imaging approach described here is amenable to determination of a wide range of polarimetric properties, in addition to the in-plane and out-of-plane birefringence measure discussed as a preferred embodiment.

Abstract: This disclosure is generally directed to systems for imaging polarization properties of optical-material samples. As one example, there is provided a system for precise, simultaneous imaging of both the in-plane and out-of-plane birefringence properties of sample material over a wide range of incidence angles. An example spatially resolved imaging approach described herein is amenable to determination of a wide range of polarimetric properties, in addition to the in-plane and out-of-plane birefringence measure discussed as a preferred embodiment.

Abstract: This disclosure is generally directed to systems for imaging polarization properties of optical-material samples. As one example, there is provided a system for precise, simultaneous imaging of both the in-plane and out-of-plane birefringence properties of sample material over a wide range of incidence angles. An example spatially resolved imaging approach described herein is amenable to determination of a wide range of polarimetric properties, in addition to the in-plane and out-of-plane birefringence measure discussed as a preferred embodiment.

Abstract: This invention is directed to methods of unambiguously measuring the absolute retardance, ?A of an optical sample. A method for measuring absolute retardance of an optical sample includes directing light comprising a plurality of wavelengths through a polarization state generator source, the optical sample, and a polarization state analyzer, detecting, at an imaging device, retardance measurement light emanating from the optical sample after also passing through the polarization state analyzer at the plurality of wavelengths, determining a measurement retardance associated with the detected retardance measurement light at each of the wavelengths, and determining an absolute retardance associated with the optical sample based on the measurement retardances determined at each of the wavelengths.

Abstract: A birefringence measurement system includes a lens mounted for selective movement into and out of use in the optical setup so that a wide range of sample types can be handled by the system without reconfiguring the primary components of the optical setup of the system (moving the detector, changing the light source power, etc.) in a manner that would sacrifice the cost effectiveness, efficiency, mechanical reliability and repeatability of measurements for such systems.

Abstract: A birefringence measurement system includes a lens mounted for selective movement into and out of use in the optical setup so that a wide range of sample types can be handled by the system without reconfiguring the primary components of the optical setup of the system (moving the detector, changing the light source power, etc.) in a manner that would sacrifice the cost effectiveness, efficiency, mechanical reliability and repeatability of measurements for such systems.

Abstract: A system for measuring linear or circular diattenuation in an optical element includes a sample rotation stage for securing an optical element sample; a light source module for generating a source light beam and a detector module. The light source module and detector module are arranged with the sample rotation stage between them, thereby permitting the source light beam to propagate through a sample that may be secured in the sample stage and to the detector module. Linear motion control of the light source module and the detector module, as well as tilt control of the light source module, the sample rotation stage and the detector module is provided, thereby to facilitate detection, by the detector module of the modulated light intensity information corresponding to a diattenuation characteristic of the optical sample secured in the sample stage.

Abstract: An illumination assembly for creating an illumination display by manipulating the angle of an electromagnetic radiation, such as visible light. The assembly includes variously configured lenses that at least partially deviate the direction of an electromagnetic radiation from an illumination portion. A housing contains an illumination portion and lenses. The housing portion further includes a thermal absorbing portion for absorbing heat generated by the illumination portion. A sealing portion helps inhibit moisture from entering the housing. The illumination portion includes a flexible light emitting diode strip. A diverging lens broadens the electromagnetic radiation. A converging lens focuses the electromagnetic radiation. A flat lens allows the electromagnetic radiation to remain in a substantially straight angle. The illumination portion and each lens can be oriented at various angles.