Abstract: A corsage wristlet decorating support device is provided. The present wristlet decorating device securely holds a wristlet in place so that it can be easily decorated. The present wristlet support device comprises a horizontally-extending tubular support portion, an adjustable clamp portion, and a vertical, elongated body portion connecting the tubular portion and the clamp. The curvature of the walls of the tubular portion roughly conforms to the curvature of the inner arch of a wristlet so that the wristlet may be supported thereon. The body supports the tubular portion in a vertical, raised position that is comfortable to work from. The clamp is designed to be adjustable so that it can secure the device to a large range of support surfaces of varying thicknesses and configurations.

Abstract: A method of determining the degree of calibration of an RTP chamber (1) includes providing a test wafer having a deposited sichrome layer (22) of sheet resistance Rsi on an oxide layer (21) formed on a silicon substrate (20). The test wafer is annealed in the RTP chamber for a selected duration at a selected anneal temperature which is measured by the a permanent thermocouple or pyrometer (8). The sheet resistance of the annealed sichrome is measured, and a sheet resistance change ?Rs=Rsi?Rsf is computed. The “actual” value of the anneal temperature is determined from predetermined characterizing information relating ?Rs to a range of values of anneal temperature. The RTP chamber is re-calibrated if in accordance with the value of ?Rs if the difference between the “actual” value of the anneal temperature and the value measured by the permanent thermocouple or pyrometer exceeds an acceptable error.