Patents by Inventor Barbara Ihlow-Mahrer

Barbara Ihlow-Mahrer has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Electron-beam cured polymer mask for DRIE micro-machining
    Publication number: 20010045527
    Abstract: This invention presents a method and system for etching a silicon substrate. This includes depositing a non-thermally cured photoresist mask on the upper region of a trench in the silicon substrate. A fluorocarbon film is deposited on the silicon substrate, and the silicon substrate is bombarded with ions. As a result, the fluorocarbon film is preferentially removed from the lower region of the trench in the substrate, and the upper region of the trench is substantially protected by the photoresist mask. This invention can include curing the photoresist mask using an electron-beam system.
    Type: Application
    Filed: April 5, 2001
    Publication date: November 29, 2001
    Inventors: Barry Dean Wissman, Lee Walter, Roger Lee Hipwell, Barbara Ihlow-Mahrer, Zine-Eddine Boutaghou