Patents by Inventor Barbara J. Hughey
Barbara J. Hughey has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 6867415Abstract: An interface for introducing a non-gaseous sample as a predetermined gaseous form into an accelerator mass spectrometer which comprises a nebulizer that receives the non-gaseous sample to provide a fine spray of the sample, a converter that receives at least a portion of said fine spray and converts the desired elements to the predetermined gaseous form and a flow line that transports the predetermined gaseous form to the accelerator mass spectrometer.Type: GrantFiled: August 23, 2001Date of Patent: March 15, 2005Assignees: Newton Scientific, Inc., Massachusetts Institute of TechnologyInventors: Barbara J. Hughey, Paul L. Skipper, John S. Wishnok, Ruth E. Shefer, Naomi A. Fried, John T. Mehl, Steven R. Tannenbaum
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Publication number: 20040142384Abstract: This invention relates to magnetic separators for magnetically separating different components of a test sample. The magnetic separators can be used in methods of separating cells.Type: ApplicationFiled: January 16, 2003Publication date: July 22, 2004Inventors: Barb Ariel Cohen, Barbara J. Hughey, Michael F. Morris
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Patent number: 6707035Abstract: An interface system for introducing a non-gaseous sample as a predetermined gaseous form into an analytical instrument which comprises a substrate that receives the non-gaseous sample and a directed energy source that heats at least a portion of said substrate containing the non-gaseous sample to convert the sample to the predetermined gaseous form.Type: GrantFiled: August 23, 2001Date of Patent: March 16, 2004Assignees: Newton Scientific, Inc., Massachusetts Institute of TechnologyInventors: Barbara J. Hughey, Paul L. Skipper, John S. Wishnok, Ruth E. Shefer, John T. Mehl, Steven R. Tannenbaum
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Patent number: 6414327Abstract: A method and apparatus for ion beam generation in which acceleration of an ion beam in a first accelerating tube to a high voltage terminal, followed by transport of the beam through the terminal without significant charge changing, and deceleration of the beam substantially to ground potential in a second accelerating tube. Since the terminal is maintained at high voltage, the beam optical characteristics between the ion source and the terminal are identical to those of normal tandem operation. The optical elements of the injector and accelerator beamline can therefore be adjusted to produce an focused beam envelope in the high voltage terminal, allowing the beam to propagate efficiently through an empty stripper canal. Since the beam, does not undergo a charge change in the terminal, it is decelerated in the second tandem accelerating tube. Since the beam propagates through the accelerator at energies higher than the injection energy, expansion of the beam due to space charge and emittance is reduced.Type: GrantFiled: September 14, 1999Date of Patent: July 2, 2002Assignee: Newton Scientific, Inc.Inventors: Robert E. Klinkowstein, Ruth Shefer, Barbara J. Hughey
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Publication number: 20020066857Abstract: An interface system for introducing a non-gaseous sample as a predetermined gaseous form into an analytical instrument which comprises a substrate that receives the non-gaseous sample and a directed energy source that heats at least a portion of said substrate containing the non-gaseous sample to convert the sample to the predetermined gaseous form.Type: ApplicationFiled: August 23, 2001Publication date: June 6, 2002Inventors: Barbara J. Hughey, Paul L. Skipper, John S. Wishnok, Ruth E. Shefer, John T. Mehl, Steven R. Tannenbaum
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Publication number: 20020060288Abstract: An interface for introducing a non-gaseous sample as a predetermined gaseous form into an accelerator mass spectrometer which comprises a nebulizer that receives the non-gaseous sample to provide a fine spray of the sample, a converter that receives at least a portion of said fine spray and converts the desired elements to the predetermined gaseous form and a flow line that transports the predetermined gaseous form to the accelerator mass spectrometer.Type: ApplicationFiled: August 23, 2001Publication date: May 23, 2002Inventors: Barbara J. Hughey, Paul L. Skipper, John S. Wishnok, Ruth E. Shefer, Naomi A. Fried, John T. Mehl, Steven R. Tannenbaum
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Patent number: 6148061Abstract: A miniature x-ray unit includes a first electrical node, a second electrical node and an insulating material. The first and second nodes are separated by a vacuum gap. The first node includes a base portion and a projecting portion, wherein the projecting portion and the second node are surrounded by an x-ray transmissive window through which x-rays exit the unit. The insulating material coaxially surrounds the base portion of the first node such that the insulating material is recessed from the vacuum gap, and the insulator does not extend into the vacuum gap. Recessing the insulating material from the vacuum gap decreases the likelihood that the insulator will electrically break down due to the accumulation of electrical charge, and/or the accumulation of other materials on the surface of the insulator. In a preferred embodiment, the first node is an anode and the second node is a cathode. Alternatively, the first node may be the cathode and the second node may be the anode.Type: GrantFiled: April 28, 1998Date of Patent: November 14, 2000Assignee: Newton Scientific, Inc.Inventors: Ruth Shefer, Robert E. Klinkowstein, Barbara J. Hughey
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Patent number: 6025602Abstract: An ion implantation system that rapidly and efficiently processes large quantities of workpieces, such as flat panel displays. The ion implantation system includes a high vacuum process chamber that mounts an ion source, a single workpiece translating stage, and a loadlock. The single workpiece handling assembly mounted within the process chamber both removes the workpiece from the loadlock and supports the workpiece during implantation by the ion beam generated by the ion source. The process chamber is in selective fluid communication with a loadlock assembly, which in turn is mechanically integrated with a workpiece loading or end station. Additionally, the workpiece handling assembly includes a translation stage or element for translating the workpiece in a linear scanning direction during implantation. This linear scanning direction extends along a path transverse or orthogonal to the horizontal longitudinal axis of the implantation system.Type: GrantFiled: April 23, 1998Date of Patent: February 15, 2000Assignee: Eaton CorporationInventors: Peter H. Rose, Julian G. Blake, Adam A. Brailove, Zhongmin Yang, Richard F. McRay, Barbara J. Hughey
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Patent number: 5825038Abstract: A high throughput ion implantation system that rapidly and efficiently processes large quantities of flat panel displays. The ion implantation system has an ion chamber generating a stream of ions, a plasma electrode having an elongated slot with a high aspect ratio for shaping the stream of ions into a ribbon beam, and an electrode assembly for directing the stream of ions towards a workpiece. The plasma electrode can include a split extraction system having a plurality of elongated slots oriented substantially parallel to each other. The ion implantation system can also have a diffusing system for homogenizing the ion stream. Various exemplary diffusing systems include an apertured plate having an array of openings, diffusing magnets, diffusing electrodes, and dithering magnets.Type: GrantFiled: November 26, 1996Date of Patent: October 20, 1998Assignee: Eaton CorporationInventors: Julian G. Blake, Kenneth H. Purser, Adam A. Brailove, Peter H. Rose, Barbara J. Hughey
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Patent number: 5793050Abstract: An ion implantation system that rapidly and efficiently processes large quantities of workpieces, such as flat panel displays. The ion implantation system includes a high vacuum process chamber that mounts an ion source, a single workpiece translating stage, and a loadlock. The single workpiece handling assembly mounted within the process chamber both removes the workpiece from the loadlock and supports the workpiece during implantation by the ion beam generated by the ion source. The process chamber is in selective fluid communication with a loadlock assembly, which in turn is mechanically integrated with a workpiece loading or end station. Additionally, the workpiece handling assembly includes a translation stage or element for translating the workpiece in a linear scanning direction during implantation. This linear scanning direction extends along a path transverse or orthogonal to the horizontal longitudinal axis of the implantation system.Type: GrantFiled: November 26, 1996Date of Patent: August 11, 1998Assignee: Eaton CorporationInventors: Peter H. Rose, Julian G. Blake, Adam A. Brailove, Zhongmin Yang, Richard F. McRay, Barbara J. Hughey
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Patent number: 5468355Abstract: A target is bombarded with high energy particles to generate a radioisotope, and the radioisotope is preferably extracted by one of the following: combusting the target in oxygen, stopping the bombardment and heating the target, or heating the target by induction. Bombardment may take place through a windowless path, and the radioisotope may be used for PET. The particles used may be deuterons or protons, and .sup.13 N may be generated. .sup.11 C may also be generated from either .sup.11 B or .sup.10 B using protons or deuterons. Combustion may be performed by induction heating and may be controlled by the quantity of oxygen available or the temperature. Combustion may be primarily confined to a surface layer and the target may be reused. The beam energy may be 2.2 MeV or less. Another general aspect includes trapping the oxides of .sup.13 N in a trap. The oxides may be converted into .sup.Type: GrantFiled: June 4, 1993Date of Patent: November 21, 1995Assignees: Science Research Laboratory, Washington UniversityInventors: Ruth E. Shefer, Robert E. Klinkowstein, Barbara J. Hughey, Michael J. Welch, Carmen S. Dence
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Patent number: 5235239Abstract: Window constructions for use in particle accelerators to separate an evacuated accelerator beam chamber from a gas or liquid filled target area, which window structure enhances cooling of the foil covering the window opening and reduces stresses on the foil. For preferred embodiments, the window opening is shaped and dimensioned to provide high length-to-width aspect ratio and a rectangular shape with rounded corners. The openings should generally be as narrow as possible while still being wide enough to assure efficient transmission of the ion beam. Stresses in the foil is reduced by providing controlled bowing of the portions of the foil covering the window. This may be accomplished by providing some slack in the foil, at least in one dimension, but is preferably accomplished by pressing the foil between mating curved surfaces selectively extending from the edges of the window openings, resulting in the desired bow in the foil in the window area.Type: GrantFiled: June 7, 1991Date of Patent: August 10, 1993Assignee: Science Research Laboratory, Inc.Inventors: Jonah H. Jacob, Allen M. Flusberg, Barbara J. Hughey, Ruth Shefer, Robert Klinkowstein