Patents by Inventor Barbel Trossbach

Barbel Trossbach has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • IMAGING DEVICE IN A PROJECTION EXPOSURE FACILITY
    Publication number: 20110199597
    Abstract: An imaging device in a projection exposure machine for microlithography has at least one optical element and at least one manipulator, having a linear drive, for manipulating the position of the optical element. The linear drive has a driven subregion and a nondriven subregion, which are movable relative to one another in the direction of a movement axis. The subregions are interconnected at least temporarily via functional elements with an active axis and via functional elements with an active direction at least approximately parallel to the movement axis.
    Type: Application
    Filed: April 28, 2011
    Publication date: August 18, 2011
    Applicant: CARL ZEISS SMT GMBH
    Inventors: Wolfgang Hummel, Jurgen Fischer, Karl-Eugen Aubele, Erich Merz, Raoul Reiner, Klaus Rief, Stefan Schöngart, Markus Neumaier, Bärbel Trossbach, Ulrich Weber, Michael Mühlbeyer, Hubert Holderer, Alexander Kohl, Jochen Weber, Johannes Lippert, Thorsten Rassel
  • Imaging device in a projection exposure machine
    Patent number: 7710542
    Abstract: An imaging device in a projection exposure machine for microlithography has at least one optical element and at least one manipulator, having a linear drive, for manipulating the position of the optical element. The linear drive has a driven subregion and a nondriven subregion, which are movable relative to one another in the direction of a movement axis. The subregions are interconnected at least temporarily via functional elements with an active axis and via functional elements with an active direction at least approximately parallel to the movement axis.
    Type: Grant
    Filed: November 7, 2007
    Date of Patent: May 4, 2010
    Assignee: Carl Zeiss SMT AG
    Inventors: Wolfgang Hummel, Jürgen Fischer, Karl-Eugen Aubele, Erich Merz, Raoul Reiner, Klaus Rief, Stefan Schöngart, Markus Neumaier, Bärbel Trossbach, Ulrich Weber, Michael Mühlbeyer, Hubert Holderer, Alexander Kohl, Jochen Weber, Johannes Lippert, Thorsten Rassel
  • IMAGING DEVICE IN A PROJECTION EXPOSURE FACILITY
    Publication number: 20090040487
    Abstract: An imaging device in a projection exposure machine for microlithography has at least one optical element and at least one manipulator, having a linear drive, for manipulating the position of the optical element. The linear drive has a driven subregion and a nondriven subregion, which are movable relative to one another in the direction of a movement axis. The subregions are interconnected at least temporarily via functional elements with an active axis and via functional elements with an active direction at least approximately parallel to the movement axis.
    Type: Application
    Filed: October 8, 2008
    Publication date: February 12, 2009
    Applicant: CARL ZEISS SMT AG
    Inventors: Wolfgang Hummel, Juergen Fischer, Karl-Eugen Aubele, Erich Merz, Raoul Reiner, Klaus Rief, Stefan Schongart, Markus Neumaier, Barbel Trossbach, Ulrich Weber, Michael Muehlbeyer, Hubert Holderer, Alexander Kohl, Jochen Weber, Johannes Lippert, Thorsten Rassel
  • IMAGING DEVICE IN A PROJECTION EXPOSURE MACHINE
    Publication number: 20080174757
    Abstract: An imaging device in a projection exposure machine for microlithography has at least one optical element and at least one manipulator, having a linear drive, for manipulating the position of the optical element. The linear drive has a driven subregion and a nondriven subregion, which are movable relative to one another in the direction of a movement axis. The subregions are interconnected at least temporarily via functional elements with an active axis and via functional elements with an active direction at least approximately parallel to the movement axis.
    Type: Application
    Filed: November 7, 2007
    Publication date: July 24, 2008
    Inventors: Wolfgang Hummel, Jurgen Fischer, Karl-Eugen Aubele, Erich Merz, Raoul Reiner, Klaus Rief, Stefan Schongart, Markus Neumaier, Barbel Trossbach, Ulrich Weber, Michael Muhlbeyer, Hubert Holderer, Alexander Kohl, Jochen Weber, Johannes Lippert, Thorsten Rassel
  • Imaging device in a projection exposure facility
    Publication number: 20040263812
    Abstract: An imaging device (7) in a projection exposure machine (1) for microlithography has at least one optical element (10, 33, 34) and at least one manipulator (9, 36, 41), having a linear drive (11), for manipulating the position of the optical element (10, 33, 34). The linear drive (11) has a driven subregion (14) and a nondriven subregion (15), which are movable relative to one another in the direction of a movement axis (17). The subregions (14, 15) are interconnected at least temporarily via functional elements (18) with an active axis (17) [sic] and via functional elements (19) with an active direction at least approximately parallel to the movement axis (17).
    Type: Application
    Filed: August 20, 2004
    Publication date: December 30, 2004
    Inventors: Wolfgang Hummel, Jurgen Fischer, Karl-Eugen Aubele, Erich Merz, Raoul Reiner, Klaus Rief, Stefan Schongart, Markus Neumaier, Barbel Trossbach, Ulrich Weber, Michael Muhlbeyer, Hubert Holderer, Alexander Kohl, Jochen Weber, Johannes Lippert, Thorsten Rassel