Abstract: A pump insert (50) for supporting a rotor (14) of a pump comprises an annular resilient support (52) for engaging the body (26) of the pump, the support (52) extending about a rolling bearing (10) having an inner race (12) for engaging the rotor (14), an axially preloaded outer race (16) fixed to the support (52), and a plurality of rolling elements (18) located between the races. During assembly, the rolling bearing (10) can be accurately positioned within the support (52) so that there is a very low tolerance stack-up when the insert (50) is fitted to the rotor (14). Consequently, the position of the rotor (14) will hardly change, if at all, when the rolling bearing (10) is replaced during servicing of the pump.

Abstract: Lithography apparatus comprises a lithography tool housed in a first chamber, and a source of radiation at or below ultra violet wavelengths housed in a second chamber connected to the first chamber to enable radiation generated by the source to be supplied to the tool. A cryogenic vacuum pump is provided for at least one, preferably for each, of the chambers. A target material, such as xenon, supplied to the source for the generation of radiation is pumped from the second chamber, cryogenically purified and re-supplied to the source. A cryogenic refrigerator supplies cryogen to the cryogenic purifier and to the cryogenic vacuum pump(s).

Abstract: A vacuum pump has, in fluid communication with a location intermediate an inlet thereof for receiving fluid and an outlet thereof for exhausting pumped fluid, a sensor for receiving at least part of the fluid received by the pump and for sensing the presence of one or more contaminants therein.

Abstract: A lithographic apparatus is configured to project a pattern from a patterning device onto a substrate. The apparatus includes a gas purged sealing aperture extending between at least two different zones of the apparatus, and a gas supplier configured to supply the sealing aperture one or more gases selected from a group including hydrogen, deuterium, heavy hydrogen, deuterated hydrogen, and a mixture of argon and hydrogen.

Abstract: A lithographic apparatus includes a patterning device for patterning a beam of radiation, a projection system for projecting the patterned beam of radiation onto a substrate, a gas purged sealing aperture extending between different zones of the apparatus, and a gas supply arrangement for supplying a mixture of at least argon and hydrogen to the sealing aperture.

Abstract: A vacuum pumping system comprises a first gas supply for supplying a first gas, such as xenon, to a vacuum chamber. A pump receives the gas output from the chamber. A second gas supply supplies a purge gas, such as nitrogen or helium, for pumping with the first gas. A gas separator receives the pumped gases exhausted by the pump, and recovers the first gas and the purge gas from the stream. The recovered first gas is recirculated through the vacuum chamber, and the recovered second gas is recirculated through at least the pump.

Abstract: A sealing assembly for sealing a slit between two regions in a lithographic apparatus is disclosed. The assembly includes a vacuum pumping device that extends substantially in a longitudinal slit direction for at least partially preventing particle transmission in a transversal slit direction.