Abstract: Silicon-based tocopherol derivatives are provided, as well as methods for making the same, in which the derivatives have a tocopherol molecule having a silicon-based group. The derivatives are useful in cosmetic compositions, have antioxidant properties, enhance solubility and compatibility in cosmetic formulations having silicon-based materials within the compositions.

Abstract: A class of volatile cyclic and acyclic azasilanes is provided as well as methods for their preparation which comprise heating aminoalkoxysilanes in the presence of an ammonium salt, sulfuric acid, or phosphonium salt. The cyclic azasilanes may be used for the treatment of inorganic surfaces, particularly nanoparticles, by a ring-opening reaction when non-hydrolytic deposition methods are required.

Abstract: This invention pertains to UV-absorbing coatings that may optionally be covered with an anti-reflective layer and that are applied to exterior-facing surfaces such as a window or other glass surface that are transparent or translucent. Such coatings are visible to various species of birds, but are generally transparent to humans. The UV absorbing coatings have a silane- or silane-derived chromophore or a combination of a silane- or siloxane-based material and a chromophore, which chromophores absorb UV light at about 300 to about 400 nm. More particularly, the silane- or siloxane-based chromophore is 2-hydroxy-4-(3-triethoxysilylpropoxy) diphenylketone or a derivative thereof.

Abstract: Processes are provided for producing organchlorosilanes and dipodal silanes in which an organic halide or alkene or chloralkene is reacted with a hydridochlorosilane in the presence of a quaternary phosphonium salt catalyst by providing sufficient heat to effect a dehydrohalogenative coupling reaction and/or a hydrosilylation reaction and venting the reaction to control reaction pressure and to remove gaseous byproducts from the reaction. The processes are preferably continuous using a catalyst in fluid form at reaction pressures not exceeding about 600 psi. The reactions may be carried out substantially isothermally and/or isobarically, for example in a plug flow reactor or continuous stirred tank reactor. The processes may produce novel silylated compounds including 1,2-bis (trichlorosilyl)decane or 1,2-bis (trimethoxysilyl)decane.

Abstract: A method is provided for chemical vapor deposition of a TiSixNy film onto a substrate wherein x is greater than zero and no greater than about 5, and y is greater than zero and no greater than about 7, including introducing into a deposition chamber: (i) a substrate; (ii) a source precursor comprising titanium in a vapor state having the formula (I): Ti(I4-m-n)(Brm)(Cln) ??(I) wherein m is an integer from zero to 4, n is an integer from 0 to 2, and m+n is no greater than 4; (iii) a compound comprising silicon in a vapor state; (iv) a reactant gas comprising nitrogen; and maintaining a temperature of the substrate in the chamber at about 70 ° C. to about 550 ° C. for a period of time sufficient to deposit the TiSixNy film on the substrate.

Abstract: A polypodal silane compounds are provided for use as a bonded phase and which have embedded hydrophilicity. The compounds have at least two podal branches bonded via an ether linkage or alkoxy group to a hydrophilic group. Each podal branch has a silicon atom which is bonded to each podal branch through a Si—C bond and each of the podal branches is capable of bonding to a siliceous substrate through at least one hydrolyzable functional group capable of being displaced by a Si—O bond. Bonded phases using such compounds and substrates having such compounds bonded to their surface are also described, as well as a method for preparing a bonded phase.

Abstract: Processes are provided for producing organchlorosilanes and dipodal silanes in which an organic halide or alkene or chloralkene is reacted with a hydridochlorosilane in the presence of a quarternary phosphonium salt catalyst by providing sufficient heat to effect a dehydrohalogenative coupling reaction and/or a hydrosilylation reaction and venting the reaction to control reaction pressure and to remove gaseous byproducts from the reaction. The processes are preferably continuous using a catalyst in fluid form at reaction pressures not exceeding about 600 psi. The reactions may be carried out substantially isothermally and/or isobarically, for example in a plug flow reactor or continuous stirred tank reactor. The processes may produce novel silylated compounds including 1,2-bis(trichlorosilyl)decane or 1,2-bis(trimethoxysilyl)decane.

Abstract: A process for the preparation of cobalt disilicide films comprises chemical vapor deposition (CVD) of cobalt from cobalt tricarbonyl nitrosyl as cobalt source precursor, capping the cobalt layer and annealing to form epitaxial cobalt disilicide on the silicon substrate.

Abstract: This invention includes a process for producing an alkylsilane, comprising reducing an alkoxysilane in the presence of an alkali metal hydride in the presence of a high boiling solvent. The alkylsilane has a boiling point lower than the boiling point of the solvent, which is typically diglyme. This invention also includes a chloride-free alkylsilane formed from the reduction of an alkoxysilane in the presence of an alkali metal hydride. The alkylsilane produced according to the process of the present invention may be useful in microelectronic applications, such as in the production of chloride-free low dielectric constant materials which may be produced by the chemical vapor deposition of such silanes.

Abstract: The invention relates to compositions containing compounds of the structure (I):(R.sub.1).sub.a (R.sub.2).sub.b SiX.sub.c (I)wherein R.sub.1 is a neophyl, neohexyl or (CH.sub.3).sub.3 SiCH.sub.2 --group; R.sub.2 is a methyl group; X is a halo group or a saturated, unsaturated, branched, unbranched or cyclic alkoxy group of 1-18 carbon atoms; a is 1 or 2, b is an integer from 0 to 2, and c is an integer from 1 to 3.

Abstract: Cellular organelles, examples of which are mitochondria, microsomes and chloroplasts, are bound in an active state on a substantially inert and insoluble support surface, examples of which are alkylated glass, kaolin, talc, silica, ferrites, alumina, and some alkyl substituted high molecular weight polymers. Binding between the support surface and the organelle is accomplished by adsorption of the isolated organelle onto the support surface. Immobilization in this manner does not affect the functional behavior of the organelle. These systems have utility for the synthesis of specific chemical substances.