Patents by Inventor Barry Clark

Barry Clark has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 12235045
    Abstract: The disclosure describes equipment for magnetic annealing of a substrate, the equipment including: an anneal chamber configured to heat and cool a substrate held at a soak location along a first direction in the anneal chamber, the anneal chamber including: a heater, a cooler, and a substrate lifter including a substrate holder, where the substrate holder is configured to support a substrate oriented such that the first direction is perpendicular to a major surface of the substrate; and a magnet assembly configured to establish a homogeneous zone in the anneal chamber, the soak location being within the homogeneous zone, the homogeneous zone including a region of magnetic field.
    Type: Grant
    Filed: March 25, 2022
    Date of Patent: February 25, 2025
    Assignee: TOKYO ELECTRON LIMITED
    Inventors: Ian Colgan, Ioan Domsa, George Eyres, Bartlomiej Burkowicz, Barry Clarke, David Hurley, Einstein Noel Abarra
  • Patent number: 11894240
    Abstract: A system for processing semiconductor wafers, the system including: a processing chamber; a heat source; a substrate holder configured to expose a semiconductor wafer to the heat source; a first electrode configured to be detachably coupled to a first major surface of a semiconductor wafer; and a second electrode coupled to the substrate holder, the first electrode and the second electrode together configured to apply an electric field in the semiconductor wafer.
    Type: Grant
    Filed: February 25, 2021
    Date of Patent: February 6, 2024
    Assignee: TOKYO ELECTRON LIMITED
    Inventors: David Hurley, Ioan Domsa, Ian Colgan, Gerhardus Van Der Linde, Patrick Hughes, Maciej Burel, Barry Clarke, Mihaela Ioana Popovici, Lars-Ake Ragnarsson, Gerrit J. Leusink, Robert Clark, Dina Triyoso
  • Patent number: 11837652
    Abstract: A method of fabricating a semiconductor device includes placing a semiconductor wafer into a processing chamber, the semiconductor wafer including a first conductive layer and a second conductive layer separated by an intermediate layer; applying an electrical bias voltage across the intermediate layer by coupling the first conductive layer to a first potential and coupling the second conductive layer to a second potential; and annealing the semiconductor wafer while applying the electrical bias voltage.
    Type: Grant
    Filed: May 9, 2022
    Date of Patent: December 5, 2023
    Assignee: TOKYO ELECTRON LIMITED
    Inventors: David Hurley, Ioan Domsa, Ian Colgan, Gerhardus Van Der Linde, Patrick Hughes, Maciej Burel, Barry Clarke, Mihaela Ioana Popovici, Lars-Ake Ragnarsson
  • Publication number: 20230304741
    Abstract: The disclosure describes equipment for magnetic annealing of a substrate, the equipment including: an anneal chamber configured to heat and cool a substrate held at a soak location along a first direction in the anneal chamber, the anneal chamber including: a heater, a cooler, and a substrate lifter including a substrate holder, where the substrate holder is configured to support a substrate oriented such that the first direction is perpendicular to a major surface of the substrate; and a magnet assembly configured to establish a homogeneous zone in the anneal chamber, the soak location being within the homogeneous zone, the homogeneous zone including a region of magnetic field.
    Type: Application
    Filed: March 25, 2022
    Publication date: September 28, 2023
    Inventors: Ian Colgan, Ioan Domsa, George Eyres, Bartlomiej Burkowicz, Barry Clarke, David Hurley, Einstein Noel Abarra
  • Patent number: 11527345
    Abstract: An apparatus for magnetic annealing one or more workpieces, and a method of operating the apparatus, are described. The apparatus includes: a workpiece holder configured to support one or more workpieces, wherein the one or more workpieces having at least one substantially planar surface; an optional workpiece heating system configured to elevate the one or more workpieces to an anneal temperature; and a magnet assembly having a first magnet and a second magnet, the first and second magnets defining a gap between opposing poles of each magnet, wherein the magnet assembly is arranged to generate a magnetic field substantially perpendicular to the planar surface of the one or more workpieces.
    Type: Grant
    Filed: January 3, 2018
    Date of Patent: December 13, 2022
    Assignee: TOKYO ELECTRON LIMITED
    Inventors: Ian Colgan, Ioan Domsa, George Eyres, Toru Ishii, Makoto Saito, David Hurley, Noel O'Shaughnessy, Barry Clarke, Gerhardus Van Der Linde, Pat Hughes
  • Publication number: 20220262921
    Abstract: A method of fabricating a semiconductor device includes placing a semiconductor wafer into a processing chamber, the semiconductor wafer including a first conductive layer and a second conductive layer separated by an intermediate layer; applying an electrical bias voltage across the intermediate layer by coupling the first conductive layer to a first potential and coupling the second conductive layer to a second potential; and annealing the semiconductor wafer while applying the electrical bias voltage.
    Type: Application
    Filed: May 9, 2022
    Publication date: August 18, 2022
    Inventors: David Hurley, Ioan Domsa, lan Colgan, Gerhardus Van Der Linde, Patrick Hughes, Maciej Burel, Barry Clarke, Mihaela Ioana Popovici, Lars-Ake Ragnarsson
  • Patent number: 11335792
    Abstract: A method of fabricating a semiconductor device includes placing a semiconductor wafer into a processing chamber, the semiconductor wafer including a first conductive layer and a second conductive layer separated by an intermediate layer; applying an electrical bias voltage across the intermediate layer by coupling the first conductive layer to a first potential and coupling the second conductive layer to a second potential; and annealing the semiconductor wafer while applying the electrical bias voltage.
    Type: Grant
    Filed: April 6, 2020
    Date of Patent: May 17, 2022
    Assignee: TOKYO ELECTRON LIMITED
    Inventors: David Hurley, Ioan Domsa, Ian Colgan, Gerhardus Van Der Linde, Patrick Hughes, Maciej Burel, Barry Clarke, Mihaela Ioana Popovici, Lars-Ake Ragnarsson
  • Publication number: 20210313189
    Abstract: A system for processing semiconductor wafers, the system including: a processing chamber; a heat source; a substrate holder configured to expose a semiconductor wafer to the heat source; a first electrode configured to be detachably coupled to a first major surface of a semiconductor wafer; and a second electrode coupled to the substrate holder, the first electrode and the second electrode together configured to apply an electric field in the semiconductor wafer.
    Type: Application
    Filed: February 25, 2021
    Publication date: October 7, 2021
    Inventors: David Hurley, Ioan Domsa, Ian Colgan, Gerhardus Van Der Linde, Patrick Hughes, Maciej Burel, Barry Clarke, Mihaela Ioana Popovici, Lars-Ake Ragnarsson, Gerrit J. Leusink, Robert Clark, Dina Triyoso
  • Publication number: 20210313444
    Abstract: A method of fabricating a semiconductor device includes placing a semiconductor wafer into a processing chamber, the semiconductor wafer including a first conductive layer and a second conductive layer separated by an intermediate layer; applying an electrical bias voltage across the intermediate layer by coupling the first conductive layer to a first potential and coupling the second conductive layer to a second potential; and annealing the semiconductor wafer while applying the electrical bias voltage.
    Type: Application
    Filed: April 6, 2020
    Publication date: October 7, 2021
    Inventors: David Hurley, Ioan Domsa, Ian Colgan, Gerhardus Van Der Linde, Patrick Hughes, Maciej Burel, Barry Clarke, Mihaela Ioana Popovici, Lars-Ake Ragnarsson
  • Patent number: 10254046
    Abstract: Disclosed is a magnetic annealing apparatus including a processing container having a horizontally-elongated tubular shape and configured to perform a magnetic annealing processing on a plurality of substrates accommodated therein in a magnetic field; a heating unit provided to cover at least a part of a surface of the processing container that extends in a longitudinal direction, from outside; a magnet provided to cover the heating unit from the outside of the heating unit; a substrate holder configured to hold the plurality of substrates within the processing container; and a heat shielding plate provided to surround a part of the substrate holder.
    Type: Grant
    Filed: August 31, 2015
    Date of Patent: April 9, 2019
    Assignee: Tokyo Electron Limited
    Inventors: Mitsuru Yamazaki, Barry Clarke, Ian Colgan, George Eyres, Ioan Domsa
  • Patent number: 9851149
    Abstract: Disclosed is a magnetic annealing apparatus including a processing container that performs a magnetic annealing processing on a plurality of substrates accommodated therein in a magnetic field; a substrate holder that holds the plurality of substrates substantially horizontally in the processing container; a division heater including a plurality of sub-division heaters and covering a substantially entire circumferential surface of an outer periphery of a predetermined region of the processing container along a longitudinal direction; a magnet installed to cover an outside of the division heater; and a controller configured to feedback-control a temperature of a predetermined control target heater among the plurality of sub-division heaters, and to control temperatures of the plurality of sub-division heaters other than the predetermined control target heater based on a control output obtained by multiplying a control output of the predetermined control target heater and a predetermined ratio.
    Type: Grant
    Filed: August 26, 2015
    Date of Patent: December 26, 2017
    Assignee: Tokyo Electron Limited
    Inventors: Mitsuru Yamazaki, Barry Clarke, Jattie Van Der Linde, Makoto Saito, Kazuyoshi Sugawara, Toshiji Abe, Tadashi Enomoto
  • Publication number: 20160061526
    Abstract: Disclosed is a magnetic annealing apparatus including a processing container having a horizontally-elongated tubular shape and configured to perform a magnetic annealing processing on a plurality of substrates accommodated therein in a magnetic field; a heating unit provided to cover at least a part of a surface of the processing container that extends in a longitudinal direction, from outside; a magnet provided to cover the heating unit from the outside of the heating unit; a substrate holder configured to hold the plurality of substrates within the processing container; and a heat shielding plate provided to surround a part of the substrate holder.
    Type: Application
    Filed: August 31, 2015
    Publication date: March 3, 2016
    Inventors: Mitsuru Yamazaki, Barry Clarke, Ian Colgan, George Eyres, Ioan Domsa
  • Publication number: 20160061525
    Abstract: Disclosed is a magnetic annealing apparatus including a processing container that performs a magnetic annealing processing on a plurality of substrates accommodated therein in a magnetic field; a substrate holder that holds the plurality of substrates substantially horizontally in the processing container; a division heater including a plurality of sub-division heaters and covering a substantially entire circumferential surface of an outer periphery of a predetermined region of the processing container along a longitudinal direction; a magnet installed to cover an outside of the division heater; and a controller configured to feedback-control a temperature of a predetermined control target heater among the plurality of sub-division heaters, and to control temperatures of the plurality of sub-division heaters other than the predetermined control target heater based on a control output obtained by multiplying a control output of the predetermined control target heater and a predetermined ratio.
    Type: Application
    Filed: August 26, 2015
    Publication date: March 3, 2016
    Inventors: Mitsuru Yamazaki, Barry Clarke, Jattie Van Der Linde, Makoto Saito, Kazuyoshi Sugawara, Toshiji Abe, Tadashi Enomoto
  • Patent number: 9098963
    Abstract: A method of operating a sensor 112 having a first transmit plate 114, a second receive plate 115 and a dielectric material between the two plates 114, 115. The method comprises the steps of: applying an alternating across the transmit and receive plates 114, 115, thereby to create an alternating electric field, which applied voltage results in a current Iz flowing through the two plates 114, 115; producing a voltage signal corresponding to the resultant current Iz; determining the average value of the product of the corresponding voltage signal and a reference voltage signal Vref3; and adjusting the phase of the reference voltage Vref3 until a null condition is achieved, at which condition the average value is approximately zero. A sensor 112 is also disclosed.
    Type: Grant
    Filed: December 19, 2011
    Date of Patent: August 4, 2015
    Assignee: NCR Corporation
    Inventors: Barrie Clark, Jim Henderson
  • Patent number: 8922498
    Abstract: A touch screen unit comprises a touch sensitive layer, a display and a processor. The processor is arranged to receive a signal indicative of a parallax error between a user's view of the touch sensitive layer and the user selectable objects displayed on the display and to correct for this parallax error.
    Type: Grant
    Filed: August 6, 2010
    Date of Patent: December 30, 2014
    Assignee: NCR Corporation
    Inventors: Jan Vesely, Andrew Colley, Barrie Clark
  • Publication number: 20130154612
    Abstract: A method of operating a sensor 112 having a first transmit plate 114, a second receive plate 115 and a dielectric material between the two plates 114, 115. The method comprises the steps of: applying an alternating across the transmit and receive plates 114, 115, thereby to create an alternating electric field, which applied voltage results in a current Iz flowing through the two plates 114, 115; producing a voltage signal corresponding to the resultant current Iz; determining the average value of the product of the corresponding voltage signal and a reference voltage signal Vref3; and adjusting the phase of the reference voltage Vref3 until a null condition is achieved, at which condition the average value is approximately zero. A sensor 112 is also disclosed.
    Type: Application
    Filed: December 19, 2011
    Publication date: June 20, 2013
    Applicant: NCR Corporation
    Inventors: Barrie Clark, Jim Henderson
  • Publication number: 20130054472
    Abstract: A system and method of wirelessly downloading digital media items which automatically downloads the digital media items to portable communication devices in environments where users are engaged with other activities. An example system includes a network including a wireless network defining a zone of coverage, and a server. The server stores locked digital media items, establishes an account for a digital media customer, automatically downloads selected locked digital media items to a portable communication device of the customer when the customer has brought the portable communication device within the zone of coverage and the portable communication device is connected to the server through the wireless network, processes payment from the customer for a number of downloaded locked digital media items, and provides keys for unlocking the number of downloaded locked digital media items.
    Type: Application
    Filed: August 31, 2011
    Publication date: February 28, 2013
    Applicant: NCR CORPORATION
    Inventor: Barrie Clark
  • Patent number: 8314823
    Abstract: A printer comprises a moveable print head such that print elements of the print head are able to print to two streams of media having different physical locations.
    Type: Grant
    Filed: December 24, 2009
    Date of Patent: November 20, 2012
    Assignee: NCR Corporation
    Inventors: Ranjithkumar Mukeri Gunabalan, Phani Kumar Vutukuri, Raghul Sambathkumar, Barrie Clark
  • Patent number: 8251282
    Abstract: A card reader device has a card entrance for receiving a card and a card enclosure in registration with the card entrance. The card enclosure defines an area in which the card is read. The card reader also has a card transport mechanism for drawing a card into the card enclosure and for ejecting the card from the card enclosure. A sensor is provided for sensing displacement of part of the card transport mechanism in a direction transverse to the plane of transport of the card, and a control circuit ascertains if the displacement of the card transport mechanism fulfills an alarm criterion.
    Type: Grant
    Filed: December 20, 2007
    Date of Patent: August 28, 2012
    Assignee: NCR Corporation
    Inventors: Barrie Clark, Scott L. Colston
  • Patent number: 8116995
    Abstract: Methods and apparatus for media characterization in a self-service terminal are described. The media us characterized in the self-service terminal by passing it by two electrodes and measuring the impedance across those two electrodes. The media is characterized by analyzing the measured impedance. The impedance may be measured by applying a modulated reference signal to one electrode and detecting the current on the second electrode. In an embodiment, the detected current may be converted into a voltage signal and mixed with a phase shifted version of the modulated reference signal.
    Type: Grant
    Filed: December 20, 2007
    Date of Patent: February 14, 2012
    Assignee: NCR Corporation
    Inventors: Scott L. Colston, Barrie Clark