Abstract: Optical systems and methods including interferometric systems and methods are disclosed herein. In some embodiments, the present invention relates to a system comprising at least one light source including a deep ultraviolet light source, a lens device, a beam splitter, and a camera device. The lens device receives first light, directs at least some of that light toward a target location, receives reflected light therefrom, and directs at least some of the reflected light toward a further location, where at least part of a light path between the deep ultraviolet light source and the target location is other than at a high vacuum. The camera device is positioned at either the further location or an additional location, whereby an image is generated by the camera device based upon at least a portion of the reflected light. Also encompassed herein are interferometric lithography and optical microscopy systems.

Abstract: Optical systems and methods including interferometric systems and methods are disclosed herein. In some embodiments, the present invention relates to a system comprising at least one light source including a deep ultraviolet light source, a lens device, a beam splitter, and a camera device. The lens device receives first light, directs at least some of that light toward a target location, receives reflected light therefrom, and directs at least some of the reflected light toward a further location, where at least part of a light path between the deep ultraviolet light source and the target location is other than at a high vacuum. The camera device is positioned at either the further location or an additional location, whereby an image is generated by the camera device based upon at least a portion of the reflected light. Also encompassed herein are interferometric lithography and optical microscopy systems.

Abstract: An apparatus and method for performing optical microscopy are disclosed. In at least one embodiment, the apparatus includes a deep ultraviolet light source configured to generate light having a wavelength within a window in the deep ultraviolet region of the electromagnetic spectrum within which a local minimum in the absorption coefficient of Oxygen occurs. Further, the apparatus includes a lens device that receives at least a first portion of the generated light, directs at least some of the first portion of the generated light toward a location, receives reflected light from the location, and directs at least some of the reflected light toward a further location. Additionally, the apparatus includes a camera device that is positioned at one of the further location and an additional location, where the camera device receives at least a second portion of the reflected light, whereby an image is generated by the camera device.

Abstract: Apparatuses and methods for performing spectroscopy and optical microscopy are disclosed. In at least one embodiment, a Raman spectrometer includes a vacuum ultraviolet light source configured to generate light having a wavelength within a window in the vacuum ultraviolet region of the electromagnetic spectrum within which a local minimum in the absorption coefficient of Oxygen occurs. The spectrometer also includes a lens device that receives a first portion of the generated light, directs at least some of the first portion of the generated light toward a target location, receives reflected light from the target location, and directs the reflected light toward a further location. The spectrometer further includes a dispersive device that receives at least some of the reflected light and outputs dispersed light produced based thereupon, and a camera module that is positioned at additional location, where the camera module receives at least some of the dispersed light.

Abstract: Apparatuses and methods for performing spectroscopy and optical microscopy are disclosed. In at least one embodiment, a Raman spectrometer includes a vacuum ultraviolet light source configured to generate light having a wavelength within a window in the vacuum ultraviolet region of the electromagnetic spectrum within which a local minimum in the absorption coefficient of Oxygen occurs. The spectrometer also includes a lens device that receives a first portion of the generated light, directs at least some of the first portion of the generated light toward a target location, receives reflected light from the target location, and directs the reflected light toward a further location. The spectrometer further includes a dispersive device that receives at least some of the reflected light and outputs dispersed light produced based thereupon, and a camera module that is positioned at additional location, where the camera module receives at least some of the dispersed light.

Abstract: An apparatus and method for performing optical microscopy are disclosed. In at least one embodiment, the apparatus includes a deep ultraviolet light source configured to generate light having a wavelength within a window in the deep ultraviolet region of the electromagnetic spectrum within which a local minimum in the absorption coefficient of Oxygen occurs. Further, the apparatus includes a lens device that receives at least a first portion of the generated light, directs at least some of the first portion of the generated light toward a location, receives reflected light from the location, and directs at least some of the reflected light toward a further location. Additionally, the apparatus includes a camera device that is positioned at one of the further location and an additional location, where the camera device receives at least a second portion of the reflected light, whereby an image is generated by the camera device.

Abstract: An optical storage device and method of operating that device are disclosed. The device includes an optical storage medium, and a light source capable of generating light that is transmitted to the medium. The light generated by the light source is at a first wavelength that is within the vacuum ultraviolet region of the electromagnetic spectrum and satisfies at least one of the following criteria: (i) the wavelength is within a 1.0 nm-wide window in the vacuum ultraviolet region of the electromagnetic spectrum at which a local minimum in the absorption coefficient of Oxygen (O2) occurs; and (ii) the absorption coefficient of Oxygen (O2) at standard temperature and pressure that corresponds to the wavelength is less than 25 atm?1 cm?1. In one embodiment, the light is at approximately 121.6 nm, and the light source is a gas discharge light source that produces light at the Hydrogen Lyman-? line.

Abstract: An optical storage device and method of operating that device are disclosed. The device includes an optical storage medium, and a light source capable of generating light that is transmitted to the medium. The light generated by the light source is at a first wavelength that is within the vacuum ultraviolet region of the electromagnetic spectrum and satisfies at least one of the following criteria: (i) the wavelength is within a 1.0 nm-wide window in the vacuum ultraviolet region of the electromagnetic spectrum at which a local minimum in the absorption coefficient of Oxygen (O2) occurs; and (ii) the absorption coefficient of Oxygen (O2) at standard temperature and pressure that corresponds to the wavelength is less than 25 atm?1 cm?1. In one embodiment, the light is at approximately 121.6 nm, and the light source is a gas discharge light source that produces light at the Hydrogen Lyman-? line.

Abstract: A vapor flow controller apparatus for delivery of chemical reagent vapors from a liquid phase source material is provided which includes a source container containing the liquid phase source material, a pump to transport the liquid phase source material to a vaporizor module, the pump having a flow rate controller, and the vaporizer module having a source material inlet, a carrier gas inlet, and a vaporized gas outlet. The vaporizer module converts the liquid phase source material to a vapor. The vapor flow controller apparatus further includes a source material conduit for passage of the liquid phase source material from the source container to the source material inlet of the vaporizer module. The vapor flow controller apparatus further includes a carrier gas container containing a carrier gas and having a carrier gas outlet conduit controlled by a mass flow controller.

Abstract: An optical storage device and method of operating that device are disclosed. The device includes an optical storage medium, and a light source capable of generating light that is transmitted to the medium. The light generated by the light source is at a first wavelength that is within the vacuum ultraviolet region of the electromagnetic spectrum and satisfies at least one of the following criteria: (i) the wavelength is within a 1.0 nm-wide window in the vacuum ultraviolet region of the electromagnetic spectrum at which a local minimum in the absorption coefficient of Oxygen (O2) occurs; and (ii) the absorption coefficient of Oxygen (O2) at standard temperature and pressure that corresponds to the wavelength is less than 25 atm−1 cm−1. In one embodiment, the light is at approximately 121.6 nm, and the light source is a gas discharge light source that produces light at the Hydrogen Lyman-&agr; line.

Abstract: A method of vacuum ultraviolet (VUV) lithography in which an irradiating wavelength is selected to be in a region of low absorption in air, e.g., one in the vicinity of a local minimum in an oxygen absorption spectrum. In one embodiment, a lithographic exposure wavelength is advantageously selected between 121.0 nm to 122.0 nm, preferably at about 121.6 nm, corresponding to an absorption window in the oxygen spectrum. This method relaxes the otherwise stringent vacuum and inert gas purge requirement imposed on a VUV lithographic tool.

Abstract: A vapor flow controller apparatus for delivery of chemical reagent vapors from a liquid phase source material is provided which includes a source container containing the liquid phase source material, a pump to transport the liquid phase source material to a vaporizor module, the pump having a flow rate controller, and the vaporizer module having a source material inlet, a carrier gas inlet, and a vaporized gas outlet. The vaporizer module converts the liquid phase source material to a vapor. The vapor flow controller apparatus further includes a source material conduit for passage of the liquid phase source material from the source container to the source material inlet of the vaporizer module. The vapor flow controller apparatus further includes a carrier gas container containing a carrier gas and having a carrier gas outlet conduit controlled by a mass flow controller.

Abstract: A method and apparatus for determining ammoniacal species concentration in a gas sample. In one embodiment, trace concentration of ammonia in an air sample is determined by monitoring emission intensity from an excited radical species (NH*), which is produced in a reaction between ammonia and fluorine. The observed emission intensity is compared with calibration data obtained from previously analyzed gas samples containing ammonia. The method and apparatus can also be adapted to detect ammoniacal species concentration in other NH-containing gas samples.

Abstract: A method and apparatus for determining ammoniacal species concentration in a gas sample. In one embodiment, trace concentration of ammonia in an air sample is determined by monitoring emission intensity from an excited radical species (NH*), which is produced in a reaction between ammonia and fluorine. The observed emission intensity is compared with calibration data obtained from previously analyzed gas samples containing ammonia. The method and apparatus can also be adapted to detect ammoniacal species concentration in other NH-containing gas samples.

Abstract: A method of vacuum ultraviolet (VUV) lithography in which an irradiating wavelength is selected to be in a region of low absorption in air, e.g., one in the vicinity of a local minimum in an oxygen absorption spectrum. In one embodiment, a lithographic exposure wavelength is advantageously selected between 121.0 nm to 122.0 nm, preferably at about 121.6 nm, corresponding to an absorption window in the oxygen spectrum.

Abstract: A method of vacuum ultraviolet (VUV) lithography in which an irradiating wavelength is selected to be in a region of low absorption in air, e.g., one in the vicinity of a local minimum in an oxygen absorption spectrum. In one embodiment, a lithographic exposure wavelength is advantageously selected between 121.0 nm to 122.0 nm, preferably at about 121.6 nm, corresponding to an absorption window in the oxygen spectrum. This method relaxes the otherwise stringent vacuum and inert gas purge requirement imposed on a VUV lithographic tool.

Abstract: Aluminum chloride gases and other gases from a processing system are directed to a cold trap including a blower connected thereto. The blower directs the gases, except for the aluminum chloride, out of the cold trap. The aluminum chloride is solidified in the trap. Means including a heater are provided to convert the solid aluminum chloride to a vapor and selectively empty the aluminum chloride out of the cold trap into another trap associated with means for chemically treating the aluminum chloride. The cold trap is then cooled and ready to receive additional aluminum chloride from the processing system.

Abstract: A method for determining the completion of removal by plasma etching of phosphorus doped silicon dioxide from an underlying substrate.

Abstract: An apparatus for automatically compensating for deviation of a capacitance manometer reading from true pressure. The capacitance manometer is connected to a source of pressure having a value less than the pressure the capacitance manometer is capable of reading and the indicated pressure is stored as a correction factor. Thereafter, each pressure read by the manometer is adjusted by the correction factor.