Abstract: Novel methods of electroless plating are described. Catalyst coatings can be applied within microchannel apparatus. Various reactions, including combustion and steam reforming, can be conducted over electroless catalyst coatings.

Abstract: Catalysts are described in which an active catalyst is disposed on a low surface area, oxide support. Methods of forming catalysts are described in which a Cr-containing metal is oxidized to form a chromium oxide layer and an active catalyst is applied directly on the chromium oxide layer. Methods of making new catalysts are described in which the surface is sonicated prior to depositing the catalyst. Catalyst systems and methods of oxidation are also described. The inventive systems, catalysts and methods are, in some instances, characterized by surprisingly superior results.

Abstract: Catalysts are described in which an active catalyst is disposed on a low surface area, oxide support. Methods of forming catalysts are described in which a Cr-containing metal is oxidized to form a chromium oxide layer and an active catalyst is applied directly on the chromium oxide layer. Methods of making new catalysts are described in which the surface is sonicated prior to depositing the catalyst. Catalyst systems and methods of oxidation are also described. The inventive systems, catalysts and methods are, in some instances, characterized by surprisingly superior results.

Abstract: Catalysts are described in which an active catalyst is disposed on a low surface area, oxide support. Methods of forming catalysts are described in which a Cr-containing metal is oxidized to form a chromium oxide layer and an active catalyst is applied directly on the chromium oxide layer. Methods of making new catalysts are described in which the surface is sonicated prior to depositing the catalyst. Catalyst systems and methods of oxidation are also described. The inventive systems, catalysts and methods are, in some instances, characterized by surprisingly superior results.

Abstract: Device of layered structures for optical reflectors and method for making the device. A device for providing environmental stability and mechanical integrity in space includes a substrate and a first silicon oxynitride layer on the substrate. The first silicon oxynitride layer has a tensile stress. Additionally, the device includes a second silicon oxynitride layer on the first silicon oxynitride layer. The second silicon oxynitride layer has a compressive stress.

Abstract: Chemical vapor deposition is performed using a plurality of expanding thermal plasma generating means to produce a coating on a substrate, such as a thermoplastic and especially a polycarbonate substrate. The substrate is preferably moved past the generating means. Included are methods which coat both sides of the substrate or which employ multiple sets of generating means, either in a single deposition chamber or in a plurality of chambers for deposition of successive coatings. The substrate surfaces spaced from the axes of the generating means are preferably heated to promote coating uniformity.

Abstract: Catalysts are described in which an active catalyst is disposed on a low surface area, oxide support. Methods of forming catalysts are described in which a Cr-containing metal is oxidized to form a chromium oxide layer and an active catalyst is applied directly on the chromium oxide layer. Methods of making new catalysts are described in which the surface is sonicated prior to depositing the catalyst. Catalyst systems and methods of oxidation are also described. The inventive systems, catalysts and methods are, in some instances, characterized by surprisingly superior results.

Abstract: According to an exemplary embodiment of the invention, a method of forming a plurality of layers on an article comprises steps of generating a plasma by forming an arc between a cathode and an anode; injecting a first material comprising an organic compound into the plasma to deposit a first layer on the article; injecting a second material comprising an organometallic material into the plasma to form a second layer on the first layer; and injecting a third material comprising a silicon containing organic compound into the plasma to deposit a third layer on the second layer. The invention also relates to an article of manufacture comprising a substrate; an interlayer disposed on the substrate; a second layer disposed on the interlayer, the second layer comprising an inorganic ultraviolet absorbing material; and a third layer disposed on the second layer, the third layer comprising an abrasion resistant material.

Abstract: A method and apparatus for injecting a fluid into a plasma stream with a uniform distribution and with reduced likelihood of clogging over prolonged use is provided. An injector includes a first channel portion for restricting a flow of the fluid and having a shape such that inner walls of the first channel portion are parallel to a first axis. The injector also includes a second channel portion in fluid communication with the first channel portion. The second channel portion includes a recessed portion such that inner walls of the second channel portion diverge from the first axis at a predetermined angle. The second channel portion reduces a buildup of a clogging layer on the inner walls of the second channel portion over a period of use. In addition, the injector can further include a tip portion that protrudes into the plasma. The injector can be integrated into or interchangeable within an injector system that can be designed for operation within a plasma deposition apparatus.

Abstract: Chemical vapor deposition is performed using a plurality of expanding thermal plasma generating means to produce a coating on a substrate, such as a thermoplastic and especially a polycarbonate substrate. The substrate is preferably moved past the generating means. Included are methods which coat both sides of the substrate or which employ multiple sets of generating means, either in a single deposition chamber or in a plurality of chambers for deposition of successive coatings. The substrate surfaces spaced from the axes of the generating means are preferably heated to promote coating uniformity.

Abstract: A method and apparatus for injecting a fluid into a plasma stream with a uniform distribution and with reduced likelihood of clogging over prolonged use is provided. An injector includes a first channel portion for restricting a flow of the fluid and having a shape such that inner walls of the first channel portion are parallel to a first axis. The injector also includes a second channel portion in fluid communication with the first channel portion. The second channel portion includes a recessed portion such that inner walls of the second channel portion diverge from the first axis at a predetermined angle. The second channel portion reduces a buildup of a clogging layer on the inner walls of the second channel portion over a period of use. In addition, the injector can further include a tip portion that protrudes into the plasma. The injector can be integrated into or interchangeable within an injector system that can be designed for operation within a plasma deposition apparatus.

Abstract: According to an exemplary embodiment of the invention, a method of forming a plurality of layers on an article comprises steps of generating a plasma by forming an arc between a cathode and an anode; injecting a first material comprising an organic compound into the plasma to deposit a first layer on the article; injecting a second material comprising an organometallic material into the plasma to form a second layer on the first layer; and injecting a third material comprising a silicon containing organic compound into the plasma to deposit a third layer on the second layer. The invention also relates to an article of manufacture comprising a substrate; an interlayer disposed on the substrate; a second layer disposed on the interlayer, the second layer comprising an inorganic ultraviolet absorbing material; and a third layer disposed on the second layer, the third layer comprising an abrasion resistant material.

Abstract: A method for depositing adherent metal oxide-based protective coatings on glass, metal, and plastic substrates by arc plasma deposition.

Abstract: According to an exemplary embodiment of the invention, a method of forming a plurality of layers on an article comprises steps of generating a plasma by forming an arc between a cathode and an anode; injecting a first material comprising an organic compound into the plasma to deposit a first layer on the article; injecting a second material comprising an organometallic material into the plasma to form a second layer on the first layer; and injecting a third material comprising a silicon containing organic compound into the plasma to deposit a third layer on the second layer. The invention also relates to an article of manufacture comprising a substrate; an interlayer disposed on the substrate; a second layer disposed on the interlayer, the second layer comprising an inorganic ultraviolet absorbing material; and a third layer disposed on the second layer, the third layer comprising an abrasion resistant material.

Abstract: Chemical vapor deposition is performed using a plurality of expanding thermal plasma generating means to produce a coating on a substrate, such as a thermoplastic and especially a polycarbonate substrate. The substrate is preferably moved past the generating means. Included are methods which coat both sides of the substrate or which employ multiple sets of generating means, either in a single deposition chamber or in a plurality of chambers for deposition of successive coatings. The substrate surfaces spaced from the axes of the generating means are preferably heated to promote coating uniformity.

Abstract: A method and apparatus for depositing a coating on a substrate. A method of coating a substrate comprises evaporating a first reactant; introducing the evaporated reactant into a plasma; and depositing the first reactant on a surface of the substrate. This method may be used to deposit an electrically conductive, ultraviolet filter coating at high rate on a glass or polycarbonate substrate, for example. An apparatus for depositing a UV filter coating on a polymeric substrate comprises a plasma generator having an anode and a cathode to form a plasma, and a first inlet for introducing a first reactant into the plasma, the first reactant comprising an evaporated material that is deposited on the substrate by the plasma. Optionally, a nozzle can be utilized to provide a controlled delivery of the first reactant into the plasma.

Abstract: A nozzle-injector was designed and fabricated for plasma deposition of thin-film coatings using a wall-stabilized arc torch as the plasma generator. The design of the nozzle-injector controls the injection, ionization, and reaction of the reagents, and these functions, in turn, determine the coating deposition rate, coating area, coating composition, and coating quality.

Abstract: A method for depositing adherent metal oxide-based protective coatings on glass, metal, and plastic substrates by arc plasma deposition.