Patents by Inventor Barry P. CRAVER

Barry P. CRAVER has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • ETALON THERMOMETRY FOR PLASMA ENVIRONMENTS
    Publication number: 20240385048
    Abstract: A method and apparatus for determining the temperature of a substrate within a processing chamber are described herein. The methods and apparatus described herein utilize an etalon assembly and a heterodyning effect to determine a first temperature of a substrate. The first temperature of the substrate is determined without physically contacting the substrate. A separate temperature sensor also measures a second temperature of the substrate and/or the substrate support at a similar location. The first temperature and the second temperature are utilized to calibrate one of the temperature sensors disposed within the substrate support, a model of the processes performed within the processing chamber, or to adjust a process parameter of the process performed within the processing chamber.
    Type: Application
    Filed: July 30, 2024
    Publication date: November 21, 2024
    Inventors: Bruce E. ADAMS, Samuel C. HOWELLS, Alvaro GARCIA, Barry P. CRAVER, Tony Jefferson GNANAPRAKASA, Lei LIAN
  • Etalon thermometry for plasma environments
    Patent number: 12078547
    Abstract: A method and apparatus for determining the temperature of a substrate within a processing chamber are described herein. The methods and apparatus described herein utilize an etalon assembly and a heterodyning effect to determine a first temperature of a substrate. The first temperature of the substrate is determined without physically contacting the substrate. A separate temperature sensor also measures a second temperature of the substrate and/or the substrate support at a similar location. The first temperature and the second temperature are utilized to calibrate one of the temperature sensors disposed within the substrate support, a model of the processes performed within the processing chamber, or to adjust a process parameter of the process performed within the processing chamber.
    Type: Grant
    Filed: September 28, 2021
    Date of Patent: September 3, 2024
    Assignee: Applied Materials, Inc.
    Inventors: Bruce E. Adams, Samuel C. Howells, Alvaro Garcia, Barry P. Craver, Tony Jefferson Gnanaprakasa, Lei Lian
  • ETALON THERMOMETRY FOR PLASMA ENVIRONMENTS
    Publication number: 20230102821
    Abstract: A method and apparatus for determining the temperature of a substrate within a processing chamber are described herein. The methods and apparatus described herein utilize an etalon assembly and a heterodyning effect to determine a first temperature of a substrate. The first temperature of the substrate is determined without physically contacting the substrate. A separate temperature sensor also measures a second temperature of the substrate and/or the substrate support at a similar location. The first temperature and the second temperature are utilized to calibrate one of the temperature sensors disposed within the substrate support, a model of the processes performed within the processing chamber, or to adjust a process parameter of the process performed within the processing chamber.
    Type: Application
    Filed: September 28, 2021
    Publication date: March 30, 2023
    Inventors: Bruce E. ADAMS, Samuel C. HOWELLS, Alvaro GARCIA, Barry P. CRAVER, Tony Jefferson GNANAPRAKASA, Lei LIAN