Patents by Inventor Barry Sheffield

Barry Sheffield has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240143513
    Abstract: An apparatus and method for switching between different types of paging using separate control registers and without disabling paging. For example, one embodiment of a processor comprises: a first control register to store a first base address of a first paging structure associated with a first type of paging having a first number of paging structure levels; a second control register to store a second base address of a second paging structure associated with a first type of paging having a second number of paging structure levels greater than the first number of paging structure levels; page walk circuitry to select either the first base address from the first control register or the second base address from the second control register responsive to a first address translation request, the selection based on a characteristic of program code initiating the address translation request.
    Type: Application
    Filed: October 1, 2022
    Publication date: May 2, 2024
    Inventors: Gilbert NEIGER, Andreas KLEEN, David SHEFFIELD, Jason BRANDT, Ittai ANATI, Vedvyas SHANBHOGUE, Ido OUZIEL, Michael S. BAIR, Barry E. HUNTLEY, Joseph NUZMAN, Toby OPFERMAN, Michael A. ROTHMAN
  • Patent number: 7084074
    Abstract: Chemical vapor deposition (CVD) is enhanced by compensating for a depleted gas concentration zone in a CVD reactor. According to an example embodiment of the present invention, a chemical-vapor deposition (CVD) gas injector is adapted to supply gas to a CVD chamber in a manner that enhances the properties of deposited films. The injector has a gas inlet coupled to a gas source and supplies gas from the source to the CVD system via at least one gas outlet. The injector is adapted to deliver gas in a manner that sufficiently maintains uniform supply of the gas in a zone of the CVD system that would exhibit a depleted gas supply absent the injector. The uniform gas supply improves the CVD process in various manners, including making possible the deposition of films having uniform properties, such as reflectivity, extinction coefficient, thickness and refractive index.
    Type: Grant
    Filed: May 19, 2000
    Date of Patent: August 1, 2006
    Assignee: Advanced Micro Devices, Inc.
    Inventors: Michael J. D'Elia, Barry Sheffield, Raymond Branstetter, Jayendra D. Bhakta