Patents by Inventor Bart Rijpers

Bart Rijpers has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Marker structure and method for controlling alignment of layers of a multi-layered substrate
    Patent number: 7879682
    Abstract: The invention includes a lithographic system having a first source for generating radiation with a first wavelength and an alignment system with a second source for generating radiation with a second wavelength. The second wavelength is larger than the first wavelength. A marker structure is provided having a first layer and a second layer. The second layer is present either directly or indirectly on top of said first layer. The first layer has a first periodic structure and the second layer has a second periodic structure. At least one of the periodic structures has a plurality of features in at least one direction with a dimension smaller than 400 nm. Additionally, a combination of the first and second periodic structure forms a diffractive structure arranged to be illuminated by radiation with the second wavelength.
    Type: Grant
    Filed: November 3, 2009
    Date of Patent: February 1, 2011
    Assignee: ASML Netherlands B.V.
    Inventors: Richard Johannes Franciscus Van Haren, Arie Jeffrey Den Boef, Jacobus Burghoorn, Maurits Van Der Schaar, Bart Rijpers