Patents by Inventor Bart Schoondermark

Bart Schoondermark has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Lithographic apparatus and device manufacturing method
    Publication number: 20060033898
    Abstract: A lithographic apparatus is disclosed having a liquid supply system configured to at least partly fill a space between a projection system of the lithographic apparatus and a substrate with liquid, a barrier member arranged to substantially contain the liquid within the space, and one or more elements to control and/or compensate for evaporation of liquid from the substrate.
    Type: Application
    Filed: August 17, 2005
    Publication date: February 16, 2006
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Theodorus Cadee, Johannes Jacobs, Nicolaas Kate, Erik Loopstra, Aschwin Lodewijk Vermeer, Jeroen Maria Mertens, Christianus De Mol, Marcel Hubertus Muitjens, Antonius Van Der Net, Joost Ottens, Johannes Quaedackers, Maria Reuhman-Huisken, Marco Stavenga, Patricius Tinnemans, Martinus Verhagen, Jacobus Johannus Hendricus Verspay, Frederik De Jong, Koen Goorman, Boris Menchtchikov, Herman Boom, Stoyan Nihtianov, Richard Moerman, Martin Smeets, Bart Schoondermark, Franciscus Janssen, Michel Riepen
  • Lithographic apparatus and device manufacturing method
    Publication number: 20060033892
    Abstract: A lithographic apparatus is disclosed. The apparatus includes an illumination system configured to condition a radiation beam, and a support constructed to support a patterning device. The patterning device is capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam. The apparatus also includes a substrate table constructed to hold a substrate, a projection system configured to project the patterned radiation beam onto a target portion of the substrate, a liquid supply system configured to at least partly fill a space between the projection system and the substrate with liquid, a seal member arranged to substantially contain the liquid within the space, and elements to control and/or compensate for evaporation of immersion liquid from the substrate.
    Type: Application
    Filed: August 13, 2004
    Publication date: February 16, 2006
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Theodorus Cadee, Joost Ottens, Jeroen Johannes Mertens, Frederick De Jong, Koen Goorman, Boris Menchtchikov, Marco Stavenga, Martin Smeets, Aschwin Lodewijk Van Meer, Bart Schoondermark, Patricius Tinnemans, Stoyan Nihtianov