Patents by Inventor Bartholomeus Mathias Van Oerle

Bartholomeus Mathias Van Oerle has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8462314
    Abstract: A lithographic apparatus includes a projection system configured to project a patterned radiation beam onto a target portion of a substrate. The apparatus also includes a barrier member, surrounding a space between the projection system and, in use, the substrate, to define in part with the projection system a reservoir for liquid. A radially outer surface of the barrier member facing a portion of projection system and a radially outer surface of the portion of the projection system facing the barrier member each have a liquidphobic outer surface. The liquidphobic outer surface of the barrier member and/or the liquidphobic outer surface of the portion of the projection system has an inner edge that defines in part the reservoir.
    Type: Grant
    Filed: August 1, 2008
    Date of Patent: June 11, 2013
    Assignee: ASML Netherlands B.V.
    Inventors: Marcel Beckers, Marcus Adrianus Van De Kerkhof, Siebe Landheer, Wouterus Johannes Petrus Maria Maas, Jeroen Peter Johannes Bruijstens, Ivo Adam Johannes Thomas, Franciscus Johannes Joseph Janssen, Bartholomeus Mathias Van Oerle
  • Patent number: 8309205
    Abstract: A single crystal diamond element having a convex surface is disclosed, the convex surface including a spherical segment for which the maximum peak to valley deviation from a perfect spherical surface is less than about 5 ?m. Alternatively or in addition, the RMS deviation from a perfect spherical surface may be less than about 500 nm, or the RMS roughness less than about 30 nm. A single crystal diamond element with a radius of curvature less than about 20 mm is also disclosed. In one aspect a single crystal diamond element having a conical half-angle greater than about 10° is described. The invention also provides a method for forming a rotationally symmetrical surface on a single crystal diamond element, comprising rotating the element about a first axis, applying a laser beam to the element in a direction perpendicular to the first axis, and translating the laser beam in two dimensions in a plane perpendicular to the direction of the beam.
    Type: Grant
    Filed: July 7, 2006
    Date of Patent: November 13, 2012
    Assignee: Element Six Limited
    Inventors: Wilhelmus Gerarda Maria Nelissen, Herman Philip Godfried, Evert Pieter Houwman, Paulus Adrianus Cornelis Kriele, Johannes Cornelis Lamers, Gerrit Jan Pels, Bartholomeus Mathias Van Oerle, Paulus Geradus Hendricus Maria Spaay, Mark Robin McClymont, Christopher John Howard Wort, Geoffrey Alan Scarsbrook
  • Publication number: 20090059192
    Abstract: A lithographic apparatus includes a projection system configured to project a patterned radiation beam onto a target portion of a substrate. The apparatus also includes a barrier member, surrounding a space between the projection system and, in use, the substrate, to define in part with the projection system a reservoir for liquid. A radially outer surface of the barrier member facing a portion of projection system and a radially outer surface of the portion of the projection system facing the barrier member each have a liquidphobic outer surface. The liquidphobic outer surface of the barrier member and/or the liquidphobic outer surface of the portion of the projection system has an inner edge that defines in part the reservoir.
    Type: Application
    Filed: August 1, 2008
    Publication date: March 5, 2009
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Marcel Beckers, Marcus Adrianus Van De Kerkhof, Siebe Landheer, Wouterus Johannes Petrus Maas, Jeroen Peter Johannes Bruijstens, Ivo Adam Johannes Thomas, Franciscus Johannes Joseph Janssen, Bartholomeus Mathias Van Oerle
  • Publication number: 20090022951
    Abstract: A single crystal diamond element having a convex surface is disclosed, the convex surface including a spherical segment for which the maximum peak to valley deviation from a perfect spherical surface is less than about 5 ?m. Alternatively or in addition, the RMS deviation from a perfect spherical surface may be less than about 500 nm, or the RMS roughness less than about 30 nm. A single crystal diamond element with a radius of curvature less than about 20 mm is also disclosed. In one aspect a single crystal diamond element having a conical half-angle greater than about 10° is described. The invention also provides a method for forming a rotationally symmetrical surface on a single crystal diamond element, comprising rotating the element about a first axis, applying a laser beam to the element in a direction perpendicular to the first axis, and translating the laser beam in two dimensions in a plane perpendicular to the direction of the beam.
    Type: Application
    Filed: July 7, 2006
    Publication date: January 22, 2009
    Inventors: Wilhelmus Gerarda Maria Nelissen, Herman Philip Godfried, Evert Pieter Houwman, Paulus Adrianus Cornelis Kriele, Johannes Cornelis Lamers, Gerrit Jan Pels, Bartholomeus Mathias Van Oerle, Paulus Gerardus Hendricus Maria Spaay, Mark Robin McClymont, Christopher John Howard Wort, Geoffrey Alan Scarsbrook