Patents by Inventor Bas WILLEMS

Bas WILLEMS has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • LITHOGRAPHIC APPARATUS, METHOD OF TRANSFERRING A SUBSTRATE AND DEVICE MANUFACTURING METHOD
    Publication number: 20170108781
    Abstract: A lithographic apparatus includes a substrate table, a post-exposure handling module, a substrate handling robot and a drying station. The substrate table is configured to support a substrate for an exposure process. The post-exposure handling module is configured to handle the substrate post-exposure. The substrate handling robot is configured to transfer the substrate from the substrate table along a substrate unloading path into the post-exposure handling module. The drying station is configured to actively remove liquid from a surface of the substrate. The drying station is located in the substrate unloading path. The drying station is located in the post-exposure handling module. The post-exposure handling module may be a substrate handler.
    Type: Application
    Filed: May 12, 2015
    Publication date: April 20, 2017
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Aart Adrianus VAN BEUZEKOM, Jozef Augustinus Maria ALBERTI, Hubert Marie SEGERS, Ronald VAN DER HAM, Francis FAHRNI, Ruud OLIESLAGERS, Gerben PIETERSE, Cornelius Maria ROPS, Pepijn VAN DEN EIJNDEN, Paul VAN DONGEN, Bas WILLEMS