Patents by Inventor Bastiaan Andreas Wilhelmus Hubertus KNARREN

Bastiaan Andreas Wilhelmus Hubertus KNARREN has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • SENSOR, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    Publication number: 20150077728
    Abstract: A sensor for use in lithographic apparatus of an immersion type and which, in use, comes into contact with the immersion liquid is arranged so that the thermal resistance of a first heat path from a transducer of the sensor to a temperature conditioning device is less than the thermal resistance of a second heat flow path from the transducer to the immersion liquid. Thus, heat flow is preferentially towards the temperature conditioning device and not the immersion liquid so that temperature-induced disturbance in the immersion liquid is reduced or minimized.
    Type: Application
    Filed: March 19, 2013
    Publication date: March 19, 2015
    Applicant: ASML Netherlands B.V.
    Inventors: Thibault Simon Mathieu Laurent, Johannes Henricus Wilhelmus Jacobs, Haico Victor Kok, Yuri Johannes Gabriël Van De Vijver, Johannes Antonius Maria Van De Wal, Bastiaan Andreas Wilhelmus Hubertus Knarren, Robbert Jan Voogd, Jan Steven Christiaan Westerlaken, Johannes Hubertus Antonius Van De Rijdt, Allard Eelco Kooiker, Wilhelmina Margareta Jozef Hurkens-Mertens, Yohann Bruno Yvon Teillet
  • Cooling arrangement and lithographic apparatus comprising a resilient wall creating a gap between a detector module housing and a heat sink of the cooling arrangement
    Patent number: 8817228
    Abstract: A cooling arrangement is described and includes a heat sink having a first thermal contact surface, an object having a second thermal contact surface and a resilient wall. The first thermal contact surface and the second thermal contact surface face each other and define a gap. The resilient wall is part of an enclosure that surrounds a space at least comprising the gap, and the cooling arrangement includes a facility to maintain a pressure difference between the space and an environment of the cooling arrangement. Additionally, a lithographic apparatus comprising such a cooling arrangement is described.
    Type: Grant
    Filed: March 30, 2010
    Date of Patent: August 26, 2014
    Assignee: ASML Netherland B.V.
    Inventors: Bastiaan Andreas Wilhelmus Hubertus Knarren, Raymond Turk, Allard Eelco Kooiker, Nico Antonius Hubertus Johannes Boonen
  • Detector Module, Cooling Arrangement And Lithographic Apparatus Comprising A Detector Module
    Publication number: 20120075607
    Abstract: A detector module (20) is described that includes at least one detector (30) for sensing photon radiation, an electronic circuit (40) coupled to the at least one detector (30), and a housing (50) having a first and a second body (60, 70), each having a bottom part (62, 72) and an at least partially cylindrical part (64, 74) extending from the bottom part (62, 72), wherein the at least partially cylindrical part (64) of the first body (60) is thermally coupled with the at least partially cylindrical part (74) of the second body (70), wherein the at least partially cylindrical part (64) of the first body (60) extends towards the bottom part (72) of the second body (70), and wherein the electronic circuit (40) is arranged inside the housing (50). A lithographic apparatus including the detector module (20) is also described.
    Type: Application
    Filed: February 16, 2010
    Publication date: March 29, 2012
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Bastiaan Andreas Wilhelmus Hubertus Knarren, Raymond Turk, Allard Eelco Kooiker
  • LITHOGRAPHIC APPARATUS AND METHOD
    Publication number: 20120013865
    Abstract: A substrate table to support a substrate on a substrate supporting area, the substrate table having a heat transfer fluid channel at least under the substrate supporting area, and a plurality of heaters and/or coolers to thermally control the heat transfer fluid in the channel at a location under the substrate supporting area.
    Type: Application
    Filed: July 14, 2011
    Publication date: January 19, 2012
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Thibault Simon Mathieu LAURENT, Gerardus Adrianus Antonius Maria Kusters, Bastiaan Andreas Wilhelmus Hubertus Knarren, Raymond Wilhelmus Louis Lafarre, Koen Steffens, Takeshi Kaneko, Robbert Jan Voogd, Gregory Martin Mason Corcoran, Ruud Hendricus Martinus Johannes Bloks, Johan Gertrudis Cornelis Kunnen, Ramin Badie
  • LITHOGRAPHIC APPARATUS AND METHOD
    Publication number: 20110222032
    Abstract: A lithographic apparatus is disclosed that includes a substrate table configured to support a substrate on a substrate supporting area and a heater and/or temperature sensor on a surface adjacent the substrate supporting area.
    Type: Application
    Filed: March 11, 2011
    Publication date: September 15, 2011
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Nicolaas TEN KATE, Johannes Henricus Wilhelmus JACOBS, Joost Jeroen OTTENS, Bastiaan Andreas Wilhelmus Hubertus KNARREN, Thibault Simon Mathieu LAURENT, Robbert Jan VOOGD, Giovanni Francisco NINO, Johan Gertrudis Cornelis KUNNEN, Marinus Jan REMIE
  • LITHOGRAPHIC APPARATUS AND METHOD
    Publication number: 20110222033
    Abstract: A lithographic apparatus is disclosed that includes a substrate table configured to support a substrate on a substrate supporting area and a heater and/or temperature sensor on a surface adjacent the substrate supporting area.
    Type: Application
    Filed: March 11, 2011
    Publication date: September 15, 2011
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Nicolaas Ten Kate, Johannes Henricus Wilhelmus Jacobs, Joost Jeroen Ottens, Bastiaan Andreas Wilhelmus Hubertus Knarren, Thibault Simon Mathieu Laurent, Robbert Jan Voogd, Giovanni Francisco Nino, Johan Gertrudis Cornelis Kunnen, Marinus Jan Remie
  • Cooling Device, Cooling Arrangement and Lithographic Apparatus Comprising a Cooling Arrangement
    Publication number: 20100259734
    Abstract: A cooling arrangement is described and includes a heat sink having a first thermal contact surface, an object having a second thermal contact surface and a resilient wall. The first thermal contact surface and the second thermal contact surface face each other and define a gap. The resilient wall is part of an enclosure that surrounds a space at least comprising the gap, and the cooling arrangement includes a facility to maintain a pressure difference between the space and an environment of the cooling arrangement. Additionally, a lithographic apparatus comprising such a cooling arrangement is described.
    Type: Application
    Filed: March 30, 2010
    Publication date: October 14, 2010
    Applicant: ASML Netherlands B.V
    Inventors: Bastiaan Andreas Wilhelmus Hubertus KNARREN, Raymond Turk, Allard Eelco Kooiker, Nico Antonius Johannes Hubertus Boonen