Patents by Inventor Bastian Nieman

Bastian Nieman has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 5222113
    Abstract: The invention is directed to an X-ray microscope having a pulsed X-ray radiation source which supplies an intensive line radiation such as a plasma focus source. The microscope includes a reflecting condenser which focusses the radiation of the radiation source on the specimen to be investigated and an X-ray optic configured as a zone plate. With the zone plate, the specimen is imaged on an X-ray detector with a high resolution. The above combination of elements makes it possible to free an adequately high amount of X-ray energy at the location of the specimen while providing a high resolution free of image errors so that the required short exposure times are provided for the investigation of living cells.
    Type: Grant
    Filed: August 29, 1991
    Date of Patent: June 22, 1993
    Assignee: Carl-Zeiss-Stiftung
    Inventors: Jurgen Thieme, Bastian Nieman, Gunter Schmahl, Dietbert Rudolph