Patents by Inventor Bean-Jon Li

Bean-Jon Li has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8279436
    Abstract: Disclosed is a trace detection device of a biological and chemical analyte, including a metal substrate, a periodic metal nanostructure on the metallic substrate, a dielectric layer on the periodic metal nanostructure, and a continuous metal film on the dielectric layer. Tuning the thickness of the dielectric layer and/or the continuous metal film to meet the laser wavelength can shift the absorption peak wavelength of the sensor, thereby further enhancing the Raman signals of the analyte molecules.
    Type: Grant
    Filed: March 9, 2010
    Date of Patent: October 2, 2012
    Assignee: Industrial Technology Research Institute
    Inventors: Ding-Zheng Lin, Tien-Li Chang, Jen-You Chu, Yi-Ping Chen, Pei-Chen Chuang, Bean-Jon Li, Chiung-Hui Huang, Jyi-Tyan Yeh
  • Publication number: 20110109902
    Abstract: Disclosed is a trace detection device of a biological and chemical analyte, including a metal substrate, a periodic metal nanostructure on the metallic substrate, a dielectric layer on the periodic metal nanostructure, and a continuous metal film on the dielectric layer. Tuning the thickness of the dielectric layer and/or the continuous metal film to meet the laser wavelength can shift the absorption peak wavelength of the sensor, thereby further enhancing the Raman signals of the analyte molecules.
    Type: Application
    Filed: March 9, 2010
    Publication date: May 12, 2011
    Applicant: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
    Inventors: Ding-Zheng Lin, Tien-Li Chang, Jen-You Chu, Yi-Ping Chen, Pei-Chen Chuang, Bean-Jon Li, Chiung-Hui Huang, Jyi-Tyan Yeh
  • Patent number: 6635219
    Abstract: A method of regenerating a phase-change sputtering target for optical storage media. First, a used powder-metallurgy sputtering target composed of a target material, an adhesion material, and a backing plate is recycled. Then, the target material is separated from the backing plate. Then, the target adhesion material is scraped from the recycled target material Thereafter, the surface of the recycled target material is processed. Finally, the backing plate, a new adhesion material, the recycled target material, and new powders are placed in a vacuum thermal-pressure furnace in sequence to perform a thermal-pressure sintering process.
    Type: Grant
    Filed: March 12, 2002
    Date of Patent: October 21, 2003
    Assignee: Industrial Technology Research Institute
    Inventors: Jyh-Chung Wen, Ming-Shyong Lai, Bean-Jon Li
  • Publication number: 20020130041
    Abstract: A method of regenerating a phase-change sputtering target for optical storage media. First, a used powder-metallurgy sputtering target composed of a target material, an adhesion material, and a backing plate is recycled. Then, the target material is separated from the backing plate. Then, the target adhesion material is scraped from the recycled target material Thereafter, the surface of the recycled target material is processed. Finally, the backing plate, a new adhesion material, the recycled target material, and new powders are placed in a vacuum thermal-pressure furnace in sequence to perform a thermal-pressure sintering process.
    Type: Application
    Filed: March 12, 2002
    Publication date: September 19, 2002
    Inventors: Jyh-Chung Wen, Ming-Shyong Lai, Bean-Jon Li