Patents by Inventor Becky Min Hon

Becky Min Hon has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7144848
    Abstract: The present invention is directed to resist and etching residue removing compositions containing at least one nucleophilic amine compound possessing reduction and oxidation potentials, a two-carbon atom linkage alkanolamine compound, and optionally water and/or one or more corrosion inhibitors. The compositions may be substantially free of hydroxylamine, polar organic solvents, water, corrosion inhibitors, or a combination thereof. The compositions are useful in processes for removing resists and etching residue from metal or metal alloy substrates or substrate layers used in micro-circuitry fabrication.
    Type: Grant
    Filed: October 22, 2003
    Date of Patent: December 5, 2006
    Assignee: EKC Technology, Inc.
    Inventors: De-Ling Zhou, Jing Qiao, Shihying Lee, Bakul P. Patel, Becky Min Hon
  • Publication number: 20040147420
    Abstract: The present invention is directed to resist and etching residue removing compositions containing at least one nucleophilic amine compound possessing reduction and oxidation potentials, a two-carbon atom linkage alkanolamine compound, and optionally water and/or one or more corrosion inhibitors. The compositions may be substantially free of hydroxylamine, polar organic solvents, water, corrosion inhibitors, or a combination thereof. The compositions are useful in processes for removing resists and etching residue from metal or metal alloy substrates or substrate layers used in micro-circuitry fabrication.
    Type: Application
    Filed: October 22, 2003
    Publication date: July 29, 2004
    Inventors: De-Ling Zhou, Jing Qiao, Shihying Lee, Bakul P. Patel, Becky Min Hon