Patents by Inventor Beeri NATIV

Beeri NATIV has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Lithographic method and apparatus
    Patent number: 10261423
    Abstract: A method of determining a configuration of a projection system for a lithographic apparatus, wherein manipulators of the projection system manipulate optical elements so as to adjust its optical properties, the method comprising: receiving dependencies of the optical properties of the projection system on a configuration of the manipulators, receiving a plurality of constraints of the manipulators, formulating a cost function, wherein the cost function represents a difference between the optical properties of the projection system for a given configuration of the manipulators and desired optical properties, wherein the cost function is formulated using the dependency of the optical properties on the configuration of the manipulators, scaling the cost function into a scaled variable space, wherein the scaling is performed by using the plurality of constraints and finding a solution configuration of the manipulators which substantially minimizes the scaled cost function subject to satisfying the plurality of co
    Type: Grant
    Filed: May 30, 2016
    Date of Patent: April 16, 2019
    Assignee: ASML Netherlands B.V.
    Inventors: Lense Hendrik-Jan Maria Swaenen, Johannes Jacobus Matheus Baselmans, Bogathi Vishnu Vardhana Reddy, Patricius Aloysius Jacobus Tinnemans, Beeri Nativ
  • Lithographic Method and Apparatus
    Publication number: 20180107120
    Abstract: A method of determining a configuration of a projection system for a lithographic apparatus, wherein manipulators of the projection system manipulate optical elements so as to adjust its optical properties, the method comprising: receiving dependencies of the optical properties of the projection system on a configuration of the manipulators, receiving a plurality of constraints of the manipulators, formulating a cost function, wherein the cost function represents a difference between the optical properties of the projection system for a given configuration of the manipulators and desired optical properties, wherein the cost function is formulated using the dependency of the optical properties on the configuration of the manipulators, scaling the cost function into a scaled variable space, wherein the scaling is performed by using the plurality of constraints and finding a solution configuration of the manipulators which substantially minimises the scaled cost function subject to satisfying the plurality of co
    Type: Application
    Filed: May 30, 2016
    Publication date: April 19, 2018
    Applicant: ASML Netherlands B.V.
    Inventors: Lense Hendrik-Jan Maria SWAENEN, Johannes Jacobus Matheus BASELMANS, Bogathi Vishnu Vardhana REDDY, Patricius Aloysius Jacobus TINNEMANS, Beeri NATIV