Patents by Inventor Bei Hao

Bei Hao has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20230217383
    Abstract: In an aspect of the disclosure, a method, a computer-readable medium, and an apparatus are provided. The apparatus may be a UE. The UE receives a target SSB from a base station. The UE obtains received data carried in a broadcast channel of the target SSB. The UE reconstructs, based on received data carried in a broadcast channel of a previously received SSB, transmitted data placed in the broadcast channel of the target SSB at the base station. The UE preforms a channel estimation and/or synchronization based on a comparison of the received data and the transmitted data of the target SSB.
    Type: Application
    Filed: December 20, 2022
    Publication date: July 6, 2023
    Inventors: Chunhua Geng, Bohan Zhang, Wei-Jen Chen, Yabo Li, Yen-Chen Chen, Bei-Hao Chang, Qian-Zhi Huang, Chi-Hua Huang
  • Publication number: 20100248487
    Abstract: Described herein are exemplary methods and apparatuses for etching a nitride layer disposed above a substrate to form trenches without micro-trenching in accordance with one embodiment. The method includes forming openings in a resist layer and one or more dielectric layers. The dielectric layers may be disposed on a hard mask layer (e.g., nitride, polysilicon). Next, the method includes etching openings in the hard mask layer disposed above a substrate layer without micro-trenching. The etching occurs in a process chamber during a main etch with a first process gas mixture having a fluorocarbon gas, a hydrofluorocarbon gas, and an oxygenating gas. Next, the method includes etching openings partially into the substrate without micro-trenching with a second process gas mixture during an over etch having the fluorocarbon gas, the hydrofluorocarbon gas, and the oxygenating gas.
    Type: Application
    Filed: March 3, 2010
    Publication date: September 30, 2010
    Inventors: Gene H. Lee, Wallace Wang, Bei Hao