Patents by Inventor Bei-Shen Sywe

Bei-Shen Sywe has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11009462
    Abstract: Disclosed are calibration apparatuses for fluorescent microscopy instruments and methods of making and using them. Specifically, disclosed are calibration apparatuses with a fluorescent layer, such as photoresist, deposited on a substrate, with an optional layer of a reflective material, such as chrome. Illumination of the fluorescent and/or reflective layers, and detection and analysis of the resulting emissions allows evaluation of the instrument with respect to both reflective and fluorescent channels. Selection of appropriate fluorescent materials for the one or more fluorescent layers allows the evaluation of an instrument with respect to different fluorophores, as would be used with an instrument capable of two color detection.
    Type: Grant
    Filed: August 13, 2019
    Date of Patent: May 18, 2021
    Assignee: Affymetrix, Inc.
    Inventors: Bei-Shen Sywe, Mark Borodkin, Chuan Gao, Liana Ilkova, Devin Nguyen
  • Publication number: 20200041416
    Abstract: Disclosed are calibration apparatuses for fluorescent microscopy instruments and methods of making and using them. Specifically, disclosed are calibration apparatuses with a fluorescent layer, such as photoresist, deposited on a substrate, with an optional layer of a reflective material, such as chrome. Illumination of the fluorescent and/or reflective layers, and detection and analysis of the resulting emissions allows evaluation of the instrument with respect to both reflective and fluorescent channels. Selection of appropriate fluorescent materials for the one or more fluorescent layers allows the evaluation of an instrument with respect to different fluorophores, as would be used with an instrument capable of two color detection.
    Type: Application
    Filed: August 13, 2019
    Publication date: February 6, 2020
    Inventors: Bei-Shen Sywe, Mark Borodkin, Chuan Gao, Liana Ilkova, Devin Nguyen
  • Patent number: 10422750
    Abstract: Disclosed are calibration apparatuses for fluorescent microscopy instruments and methods of making and using them. Specifically, disclosed are calibration apparatuses with a fluorescent layer, such as photoresist, deposited on a substrate, with an optional layer of a reflective material, such as chrome. Illumination of the fluorescent and/or reflective layers, and detection and analysis of the resulting emissions allows evaluation of the instrument with respect to both reflective and fluorescent channels. Selection of appropriate fluorescent materials for the one or more fluorescent layers allows the evaluation of an instrument with respect to different fluorophores, as would be used with an instrument capable of two color detection.
    Type: Grant
    Filed: February 6, 2018
    Date of Patent: September 24, 2019
    Assignee: Affymetrix, Inc.
    Inventors: Bei-Shen Sywe, Mark Borodkin, Chuan Gao, Liana Ilkova, Devin Nguyen
  • Publication number: 20180238802
    Abstract: Disclosed are calibration apparatuses for fluorescent microscopy instruments and methods of making and using them. Specifically, disclosed are calibration apparatuses with a fluorescent layer, such as photoresist, deposited on a substrate, with an optional layer of a reflective material, such as chrome. Illumination of the fluorescent and/or reflective layers, and detection and analysis of the resulting emissions allows evaluation of the instrument with respect to both reflective and fluorescent channels. Selection of appropriate fluorescent materials for the one or more fluorescent layers allows the evaluation of an instrument with respect to different fluorophores, as would be used with an instrument capable of two color detection.
    Type: Application
    Filed: February 6, 2018
    Publication date: August 23, 2018
    Inventors: Bei-Shen Sywe, Mark Borodkin, Chuan Gao, Liana Ilkova, Devin Nguyen
  • Patent number: 9933365
    Abstract: Disclosed are calibration apparatuses for fluorescent microscopy instruments and methods of making and using them. Specifically, disclosed are calibration apparatuses with a fluorescent layer, such as photoresist, deposited on a substrate, with an optional layer of a reflective material, such as chrome. Illumination of the fluorescent and/or reflective layers, and detection and analysis of the resulting emissions allows evaluation of the instrument with respect to both reflective and fluorescent channels. Selection of appropriate fluorescent materials for the one or more fluorescent layers allows the evaluation of an instrument with respect to different fluorophores, as would be used with an instrument capable of two color detection.
    Type: Grant
    Filed: February 21, 2017
    Date of Patent: April 3, 2018
    Assignee: Affymetrix, Inc.
    Inventors: Bei-Shen Sywe, Mark Borodkin, Chuan Gao, Liana Ilkova, Devin Nguyen
  • Publication number: 20170160199
    Abstract: Disclosed are calibration apparatuses for fluorescent microscopy instruments and methods of making and using them. Specifically, disclosed are calibration apparatuses with a fluorescent layer, such as photoresist, deposited on a substrate, with an optional layer of a reflective material, such as chrome. Illumination of the fluorescent and/or reflective layers, and detection and analysis of the resulting emissions allows evaluation of the instrument with respect to both reflective and fluorescent channels. Selection of appropriate fluorescent materials for the one or more fluorescent layers allows the evaluation of an instrument with respect to different fluorophores, as would be used with an instrument capable of two color detection.
    Type: Application
    Filed: February 21, 2017
    Publication date: June 8, 2017
    Inventors: Bei-Shen Sywe, Mark Borodkin, Chuan Gao, Liana Ilkova, Devin Nguyen
  • Patent number: 9599561
    Abstract: Disclosed are calibration apparatuses for fluorescent microscopy instruments and methods of making and using them. Specifically, disclosed are calibration apparatuses with a fluorescent layer, such as photoresist, deposited on a substrate, with an optional layer of a reflective material, such as chrome. Illumination of the fluorescent and/or reflective layers, and detection and analysis of the resulting emissions allows evaluation of the instrument with respect to both reflective and fluorescent channels. Selection of appropriate fluorescent materials for the one or more fluorescent layers allows the evaluation of an instrument with respect to different fluorophores, as would be used with an instrument capable of two color detection.
    Type: Grant
    Filed: October 12, 2012
    Date of Patent: March 21, 2017
    Assignee: Affymetrix, Inc.
    Inventors: Bei-Shen Sywe, Mark Borodkin, Chuan Gao, Liana Ilkova, Devin Nguyen
  • Patent number: 8859196
    Abstract: The present invention provides an array of polymers and methods of forming arrays of polymers by providing a substrate having a first layer including one or more dielectric coatings on a solid support and a second layer including a plurality of polymers disposed on the first layer. The invention also provides methods for forming an array of polymers on a substrate using light-directed synthesis by providing a substrate having a first layer including one or more dielectric coatings on a solid support, derivatizing the first layer by contacting the first layer with a silanation reagent, and a second layer disposed on said first layer wherein the second layer includes functional groups protected with a photolabile protecting group.
    Type: Grant
    Filed: October 18, 2011
    Date of Patent: October 14, 2014
    Assignee: Affymetrix, Inc.
    Inventors: Mark O. Trulson, Glenn H. McGall, Bei-Shen Sywe, Lisa T. Kajisa, Dana Truong, Richard P. Rava, Martin J. Goldberg
  • Patent number: 8114584
    Abstract: The present invention provides an array of polymers and methods of forming arrays of polymers by providing a substrate having a first layer including one or more dielectric coatings on a solid support and a second layer including a plurality of polymers disposed on the first layer. The invention also provides methods for forming an array of polymers on a substrate using light-directed synthesis by providing a substrate having a first layer including one or more dielectric coatings on a solid support, derivatizing the first layer by contacting the first layer with a silanation reagent, and a second layer disposed on said first layer wherein the second layer includes functional groups protected with a photolabile protecting group.
    Type: Grant
    Filed: July 8, 2010
    Date of Patent: February 14, 2012
    Assignee: Affymetrix, Inc.
    Inventors: Mark O. Trulson, Glenn H. McGall, Bei-Shen Sywe, Lisa T. Kajisa, Dana Truong, Rich P. Rava, Martin J. Goldberg
  • Publication number: 20120035083
    Abstract: The present invention provides an array of polymers and methods of forming arrays of polymers by providing a substrate having a first layer including one or more dielectric coatings on a solid support and a second layer including a plurality of polymers disposed on the first layer. The invention also provides methods for forming an array of polymers on a substrate using light-directed synthesis by providing a substrate having a first layer including one or more dielectric coatings on a solid support, derivatizing the first layer by contacting the first layer with a silanation reagent, and a second layer disposed on said first layer wherein the second layer includes functional groups protected with a photolabile protecting group.
    Type: Application
    Filed: October 18, 2011
    Publication date: February 9, 2012
    Applicant: AFFYMETRIX, INC.
    Inventors: Mark O. Trulson, Martin J. Goldberg, Glenn H. McGall, Bei-Shen Sywe, Lisa T. Kajisa, Richard P. Rava, Dana Truong
  • Publication number: 20110003716
    Abstract: The present invention provides an array of polymers and methods of forming arrays of polymers by providing a substrate having a first layer including one or more dielectric coatings on a solid support and a second layer including a plurality of polymers disposed on the first layer. The invention also provides methods for forming an array of polymers on a substrate using light-directed synthesis by providing a substrate having a first layer including one or more dielectric coatings on a solid support, derivatizing the first layer by contacting the first layer with a silanation reagent, and a second layer disposed on said first layer wherein the second layer includes functional groups protected with a photolabile protecting group.
    Type: Application
    Filed: July 8, 2010
    Publication date: January 6, 2011
    Applicant: Affymetrix, INC.
    Inventors: Mark O. Trulson, Glenn H. McGall, Bei-Shen Sywe, Lisa T. Kajisa, Dana Truong, Richard P. Rava, Martin J. Goldberg
  • Patent number: 7790389
    Abstract: The present invention provides an array of polymers and methods of forming arrays of polymers by providing a substrate having a first layer including one or more dielectric coatings on a solid support and a second layer including a plurality of polymers disposed on the first layer. The invention also provides methods for forming an array of polymers on a substrate using light-directed synthesis by providing a substrate having a first layer including one or more dielectric coatings on a solid support, derivatizing the first layer by contacting the first layer with a silanation reagent, and a second layer disposed on said first layer wherein the second layer includes functional groups protected with a photolabile protecting group.
    Type: Grant
    Filed: January 16, 2008
    Date of Patent: September 7, 2010
    Assignee: Affymetrix, Inc.
    Inventors: Mark O. Trulson, Glenn H. McGall, Bei-Shen Sywe, Lisa T. Kajisa, Dana Truong, Richard P. Rava, Martin J. Goldberg
  • Publication number: 20080119371
    Abstract: The present invention provides an array of polymers and methods of forming arrays of polymers by providing a substrate having a first layer including one or more dielectric coatings on a solid support and a second layer including a plurality of polymers disposed on the first layer. The invention also provides methods for forming an array of polymers on a substrate using light-directed synthesis by providing a substrate having a first layer including one or more dielectric coatings on a solid support, derivatizing the first layer by contacting the first layer with a silanation reagent, and a second layer disposed on said first layer wherein the second layer includes functional groups protected with a photolabile protecting group.
    Type: Application
    Filed: January 16, 2008
    Publication date: May 22, 2008
    Applicant: Affymetrix, Inc.
    Inventors: Mark TRULSON, Glenn McGall, Bei-Shen Sywe, Lisa Kajisa, Dana Truong
  • Patent number: 7332273
    Abstract: The present invention provides an array of polymers and methods of forming arrays of polymers by providing a substrate having a first layer including one or more dielectric coatings on a solid support and a second layer including a plurality of polymers disposed on the first layer. The invention also provides methods for forming an array of polymers on a substrate using light-directed synthesis by providing a substrate having a first layer including one or more dielectric coatings on a solid support; derivatizing the first layer by contacting the first layer with a silanation reagent, and a second layer disposed on said first layer wherein the second layer includes functional groups protected with a photolabile protecting group.
    Type: Grant
    Filed: June 20, 2002
    Date of Patent: February 19, 2008
    Assignee: Affymetrix, Inc.
    Inventors: Mark Trulson, Glenn H. McGall, Bei-Shen Sywe, Lisa T. Kajisa, Dana Troung
  • Publication number: 20030235824
    Abstract: The present invention provides an array of polymers and methods of forming arrays of polymers by providing a substrate having a first layer including one or more dielectric coatings on a solid support and a second layer including a plurality of polymers disposed on the first layer. The invention also provides methods for forming an array of polymers on a substrate using light-directed synthesis by providing a substrate having a first layer including one or more dielectric coatings on a solid support; derivatizing the first layer by contacting the first layer with a silanation reagent, and a second layer disposed on said first layer wherein the second layer includes functional groups protected with a photolabile protecting group.
    Type: Application
    Filed: June 20, 2002
    Publication date: December 25, 2003
    Applicant: Affymetrix, INC.
    Inventors: Mark Trulson, Glenn H. McGall, Bei-Shen Sywe, Lisa T. Kajisa, Dana Truong