Patents by Inventor Ben Eynon

Ben Eynon has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Films for prevention of crystal growth on fused silica substrates for semiconductor lithography
    Patent number: 7604906
    Abstract: Photolithography masks, systems and methods and more particularly to photolithography masks systems and methods for making and using silicon dioxide mask substrates are disclosed. The mask generally includes a silicon-dioxide mask substrate having a front surface, a patterned layer disposed on the front surface, and a coating of a fluoride of an element of group IIA that covers the patterned layer. The coating reduces undesired crystal growth on the silicon dioxide mask substrate. Such masks can be incorporated into photolithography systems and used in photolithography methods wherein a layer of photoresist is formed on a substrate and to radiation that impinges on the mask. Such a mask can be fabricated, e.g., by forming a patterned layer on a front surface of a silicon dioxide mask substrate and covering the patterned layer with a coating of a fluoride of an element of group IIA.
    Type: Grant
    Filed: September 21, 2005
    Date of Patent: October 20, 2009
    Assignee: KLA- Tencor Technologies Corporation
    Inventors: William Volk, Ben Eynon, Brian Grenon
  • Fused silica pellicle in intimate contact with the surface of a photomask
    Patent number: 7351503
    Abstract: A fused silica pellicle for use on photomasks having increased durability and improved transmission uniformity and birefringence properties. The pellicle is to be intimately secured to the patterned surface of a photomask.
    Type: Grant
    Filed: December 11, 2003
    Date of Patent: April 1, 2008
    Assignee: Photronics, Inc.
    Inventor: Ben Eynon
  • Fused silica pellicle in intimate contact with the surface of a photomask
    Publication number: 20040121248
    Abstract: A fused silica pellicle for use on photomasks having increased durability and improved transmission uniformity and birefringence properties. The pellicle is to be intimately secured to the patterned surface of a photomask.
    Type: Application
    Filed: December 11, 2003
    Publication date: June 24, 2004
    Inventor: Ben Eynon
  • Fused silica pellicle
    Patent number: 6686103
    Abstract: A fused silica pellicle for use on photomasks having increased durability and improved transmission uniformity and birefringence properties. The pellicle may be secured to the photomask using an adhesive or a slide rail system, or may be held in place using a static charge.
    Type: Grant
    Filed: December 18, 2002
    Date of Patent: February 3, 2004
    Assignee: Photronics, Inc.
    Inventor: Ben Eynon
  • Fused silica pellicle
    Publication number: 20030124440
    Abstract: A fused silica pellicle for use on photomasks having increased durability and improved transmission uniformity and birefringence properties. The pellicle may be secured to the photomask using an adhesive or a slide rail system, or may be held in place using a static charge.
    Type: Application
    Filed: December 18, 2002
    Publication date: July 3, 2003
    Inventor: Ben Eynon
  • Fused silica pellicle
    Patent number: 6524754
    Abstract: A fused silica pellicle for use on photomasks having increased durability and improved transmission uniformity and birefringence properties. The pellicle may be secured to the photomask using an adhesive or a slide rail system, or may be held in place using a static charge.
    Type: Grant
    Filed: January 22, 2001
    Date of Patent: February 25, 2003
    Assignee: Photronics, Inc.
    Inventor: Ben Eynon
  • Fused silica pellicle
    Publication number: 20020098420
    Abstract: A fused silica pellicle for use on photomasks having increased durability and improved transmission uniformity and birefringence properties. The pellicle may be secured to the photomask using an adhesive or a slide rail system, or may be held in place using a static charge.
    Type: Application
    Filed: January 22, 2001
    Publication date: July 25, 2002
    Inventor: Ben Eynon