Patents by Inventor Ben KAHLE

Ben KAHLE has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20160070033
    Abstract: A light-absorbing layer system includes an absorber layer having an oxidic matrix. The oxidic matrix is based on a base component made of zinc oxide, tin oxide and/or indium oxide, and on an added component which can replace the base component K1 up to a fraction of 75% by weight. The added component consists of niobium oxide, hafnium oxide, titanium oxide, tantalum oxide, vanadium oxide, yttrium oxide, zirconium oxide, aluminum oxide and/or mixtures thereof. A blackening component, made of molybdenum, tungsten and alloys and mixtures thereof, is distributed in the matrix and is present either as metal or as substoichiometric-oxidic compound of the metal, such that the layer material has a degree of reduction which is defined by an oxygen content of at most 65% of the stoichiometrically maximum oxygen content. The weight fraction of the blackening component is in the range between 20 and 50% by weight.
    Type: Application
    Filed: April 3, 2014
    Publication date: March 10, 2016
    Inventors: Martin SCHLOTT, Albert KASTNER, Markus SCHULTHEIS, Jens WAGNER, Suk-Jae LEE, Ben KAHLE
  • Publication number: 20130264200
    Abstract: Planar or tubular sputtering targets made of a silver base alloy and at least one further alloy component selected from indium, tin, antimony, and bismuth accounting jointly for a weight fraction of 0.01 to 5.0% by weight are known. However, moving on to ever larger targets, spark discharges are evident and often lead to losses especially in the production of large and high-resolution displays having comparatively small pixels. For producing a sputtering target with a large surface area on the basis of a silver alloy of this type, which has a surface area of more than 0.3 m2 as a planar sputtering target and has a length of at least 1.0 m as a tubular sputtering target, and in which the danger of spark discharges is reduced and thus a sputtering process with comparatively high power density is made feasible, the invention proposes that the silver base alloy has a crystalline structure with a mean grain size of less than 120 ?m, an oxygen content of less than 50 wt.
    Type: Application
    Filed: March 18, 2013
    Publication date: October 10, 2013
    Applicant: Heraeus Materials Technology GmbH & Co. KG
    Inventors: Martin SCHLOTT, Sabine SCHNEIDER-BETZ, Uwe KONIETZKA, Markus SCHULTHEIS, Ben KAHLE, Lars EBEL