Patents by Inventor Ben Liou

Ben Liou has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Integration system and the method for operating the same
    Patent number: 7383095
    Abstract: An integration system for obtaining a set of overlay offset parameters of a first process layer which is going to be formed in an assigned photolithography tool with an assigned mask and an assigned pre-tool. By using the integration system, the set of overlay offset parameters of the first process layer can be precisely predicted based on summing the historic-recorded set of overlay offset parameters and the bias values including a mask bias value, a photolithography tool bias value and a pit-tool bias value. Therefore, the overlay offset parameters corresponding to the same process layer can be well integrated and managed. Hence, the cost and time due to performing the test run can be saved and the throughput can be increased as well.
    Type: Grant
    Filed: May 6, 2005
    Date of Patent: June 3, 2008
    Assignee: ProMOS Technologies Inc.
    Inventors: Yungyao Lee, Ben Liou
  • Integration system and the method for operating the same
    Publication number: 20060163568
    Abstract: An integration system for obtaining a set of overlay offset parameters of a first process layer which is going to be formed in an assigned photolithography tool with an assigned mask and an assigned pre-tool. By using the integration system, the set of overlay offset parameters of the first process layer can be precisely predicted based on summing the historic-recoded set of overlay offset parameters and the bias values including a mask bias value, a photolithography tool bias value and a pre-tool bias value. Therefore, the overlay offset parameters corresponding to the same process layer can be well integrated and managed. Hence, the cost and time due to performing the test run can be saved and the throughput can be increased as well.
    Type: Application
    Filed: May 6, 2005
    Publication date: July 27, 2006
    Inventors: Yungyao Lee, Ben Liou