Patents by Inventor BEN LLEWLYN GREEN

BEN LLEWLYN GREEN has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Microwave plasma reactor for manufacturing synthetic diamond material
    Patent number: 10734198
    Abstract: A microwave plasma reactor for manufacturing synthetic diamond material via chemical vapour deposition, the microwave plasma reactor comprising: a plasma chamber defining a resonant cavity for supporting a primary microwave resonance mode having a primary microwave resonance mode frequency f; a plurality of microwave sources coupled to the plasma chamber for generating and feeding microwaves having a total microwave power P? into the plasma chamber; a gas flow system for feeding process gases into the plasma chamber and removing them therefrom; and a substrate holder disposed in the plasma chamber and comprising a supporting surface for supporting a substrate on which the synthetic diamond material is to be deposited in use, wherein the plurality of microwave sources are configured to couple at least 30% of the total microwave power P? into the plasma chamber in the primary microwave resonance mode frequency f, and wherein at least some of the plurality of microwave sources are solid state microwave sources.
    Type: Grant
    Filed: June 10, 2015
    Date of Patent: August 4, 2020
    Assignee: Element Six Technologies Limited
    Inventors: John Robert Brandon, Ian Friel, Michael Andrew Cooper, Geoffrey Alan Scarsbrook, Ben Llewlyn Green
  • A MICROWAVE PLASMA REACTOR FOR MANUFACTURING SYNTHETIC DIAMOND MATERIAL
    Publication number: 20170040145
    Abstract: A microwave plasma reactor for manufacturing synthetic diamond material via chemical vapour deposition, the microwave plasma reactor comprising: a plasma chamber defining a resonant cavity for supporting a primary microwave resonance mode having a primary microwave resonance mode frequency f; a plurality of microwave sources coupled to the plasma chamber for generating and feeding microwaves having a total microwave power P? into the plasma chamber; a gas flow system for feeding process gases into the plasma chamber and removing them therefrom; and a substrate holder disposed in the plasma chamber and comprising a supporting surface for supporting a substrate on which the synthetic diamond material is to be deposited in use, wherein the plurality of microwave sources are configured to couple at least 30% of the total microwave power P? into the plasma chamber in the primary microwave resonance mode frequency f, and wherein at least some of the plurality of microwave sources are solid state microwave sources.
    Type: Application
    Filed: June 10, 2015
    Publication date: February 9, 2017
    Applicant: ELEMENT SIX TECHNOLOGIES LIMITED
    Inventors: JOHN ROBERT BRANDON, IAN FRIEL, MICHAEL ANDREW COOPER, GEOFFREY ALAN SCARSBROOK, BEN LLEWLYN GREEN