Abstract: A low reflectivity coating (20) is formed of a layer of carbon nanostructures (20) over a contact surface (14) of a substrate (10), from a spray incorporating the carbon nanostructures in suspension in a solvent. The carbon nanostructure layer provides a very low reflectivity coating which may be further enhanced by etching the outer surface of the coating. The layer may be etched for reduced reflectivity. Very low reflectivity coatings have been achieved.

Abstract: A method of coating a substrate includes the steps of: (i) providing a suspension of dye and a binder in a solvent, wherein the ratio of dye to binder is greater than 40 wt % and the dye is uniformly dispersed in the solvent; (ii) spray-coating the suspension onto the substrate with the majority of the solvent evaporating during the spray coating step to result in a coating of dye and binder on the substrate having a density of up to 0.75 gcm-3; and (iii) continuing step (ii) until the coating thickness is at least 30 micrometres; wherein the dye does not include any carbon nanotubes.

Abstract: A low reflectivity coating (20) is formed of a layer of carbon nanostructures (20) over a contact surface (14) of a substrate (10), from a spray incorporating the carbon nanostructures in suspension in a solvent. The carbon nanostructure layer provides a very low reflectivity coating which may be further enhanced by etching the outer surface of the coating. The layer may be etched for reduced reflectivity. Very low reflectivity coatings have been achieved.

Abstract: A low reflectivity coating (20) is formed of a layer of carbon nanostructures (20) over a contact surface (14) of a substrate (10), from a spray incorporating the carbon nanostructures in suspension in a solvent. The carbon nanostructure layer provides a very low reflectivity coating which may be further enhanced by etching the outer surface of the coating. The layer may be etched for reduced reflectivity. Very low reflectivity coatings have been achieved.

Abstract: A low reflectivity coating (40, 80/82) is provided on a substrate (22). The coating includes a layer of substantially vertically aligned carbon nanotubes (40) on an exposed surface (21) of the substrate. Provided on and extending partially within the carbon nanotube layer (40) is a hydrophobic coating (80, 82), in the preferred embodiment of or containing fluorocarbon. The hydrophobic coating (80, 82) prevents any settling or ingress of water particles onto or into the carbon nanotube layer (40) and as a result increases the stability of the carbon nanotube layer during use (40) while improving the low reflectivity of the film.

Abstract: A low reflectivity coating (40, 80/82) is provided on a substrate (22). The coating includes a layer of substantially vertically aligned carbon nanotubes (40) on an exposed surface (21) of the substrate. Provided on and extending partially within the carbon nanotube layer (40) is a hydrophobic coating (80, 82), in the preferred embodiment of or containing fluorocarbon. The hydrophobic coating (80, 82) prevents any settling or ingress of water particles onto or into the carbon nanotube layer (40) and as a result increases the stability of the carbon nanotube layer during use (40) whilst improving the low reflectivity of the film.

Abstract: A low reflectivity coating (20) is formed of a layer of carbon nanostructures (20) over a contact surface (14) of a substrate (1 0), from a spray incorporating the carbon nanostructures in suspension in a solvent. The carbon nanostructure layer provides a very low reflectivity coating which may be further enhanced by etching the outer surface of the coating. The layer may be etched for reduced reflectivity. Very low reflectivity coatings have been achieved.

Abstract: The present invention relates to a method of forming nanostructures or nanomaterials. The method comprises providing a thermal control barrier on a substrate and forming the nanostructures or nanomaterials. The method may, for example, be used to form carbon nanotubes by plasma enhanced chemical vapor deposition using a carbon containing gas plasma: The temperature of the substrate may be maintained at less than 350° C. while the carbon nanotubes are formed.

Abstract: In a Chemical Vapour Deposition (CVD) process for forming carbon nanomaterials, a supply of acetylene gas is filtered by a filter to remove a volatile hydrocarbon gas before the acetylene gas is provided to a mass flow controller. The mass flow controller can mix the filtered acetylene gas with a supply of the volatile hydrocarbon gas so that a gas mixture has a selected proportion of the volatile hydrocarbon gas. The filter performs the filtering by passing the acetylene gas over active carbon.