Patents by Inventor Ben Ward

Ben Ward has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • ETCHING PROCESSES USED IN MEMS PRODUCTION
    Publication number: 20090071933
    Abstract: The efficiency of an etching process may be increased in various ways, and the cost of an etching process may be decreased. Unused etchant may be isolated and recirculated during the etching process. Etching byproducts may be collected and removed from the etching system during the etching process. Components of the etchant may be isolated and used to general additional etchant. Either or both of the etchant or the layers being etched may also be optimized for a particular etching process.
    Type: Application
    Filed: September 12, 2008
    Publication date: March 19, 2009
    Applicant: Qualcomm MEMS Technologies, Inc.
    Inventors: Philip Floyd, Evgeni Gousev, David Heald, Ben Ward Hertzler, Chok Ho, Teruo Sasagawa, Xiaoming Yan, Todd Lyle Zion