Patents by Inventor Benedikt Uhl

Benedikt Uhl has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10828884
    Abstract: Lithographic printing plate precursors are prepared with a unique substrate and one or more radiation-sensitive imageable layers. The substrate is prepared by two separate anodizing processes to provide an inner aluminum oxide layer having an average dry thickness (Ti) of 650-3,000 nm and a multiplicity of inner micropores having an average inner micropore diameter (Di) of ?15 nm. A formed outer aluminum oxide layer comprises a multiplicity of outer micropores having an average outer micropore diameter (Do) of 15-30 nm; an average dry thickness (To) of 130-650 nm; and a micropore density (Co) of 500-3,000 micropores/?m2. The ratio of Do to Di is greater than 1.1:1, and Do in nanometers and the outer aluminum oxide layer micropore density (Co) in micropores/?m2, are further defined by the outer aluminum oxide layer porosity (Po) according to the following equation: 0.3?Po?0.8 where Po is 3.14(Co)(Do2)/4,000,000.
    Type: Grant
    Filed: March 2, 2017
    Date of Patent: November 10, 2020
    Assignee: EASTMAN KODAK COMPANY
    Inventors: Oliver Merka, Jan-Phillip Kemmling, Oliver Richard Blum, Benedikt Uhl
  • Patent number: 10363734
    Abstract: On-press developable, negative-working lithographic printing plate precursors are used to provide lithographic printing plates. Such precursors are prepared with a substrate and one or more negative-working, infrared radiation-sensitive imagable layers. The substrate is prepared by two separate anodizing processes to provide an inner aluminum oxide layer having an average dry thickness (Ti) of 650-3,000 nm and inner micropores having an average inner micropore diameter (Di) of <15 nm. A formed outer aluminum oxide layer comprises outer micropores having an average outer micropore diameter (Do) of 15-30 nm; an average dry thickness (To) of 130-650 nm; and a micropore density (Co) of 500-3,000 micropores/?m2. The ratio of Do to Di is greater than 1.1:1, and Do in nanometers and the outer aluminum oxide layer micropore density (Co) in micropores/?m2, are further defined by the outer aluminum oxide layer porosity (Po) as: 0.3?Po?0.8 wherein Po is 3.14(Co)(Do2)/4,000,000.
    Type: Grant
    Filed: September 5, 2018
    Date of Patent: July 30, 2019
    Assignee: EASTMAN KODAK COMPANY
    Inventors: Oliver Merka, Jan-Phillip Kemmling, Oliver Richard Blum, Benedikt Uhl, Philipp Viehmann
  • Publication number: 20190016110
    Abstract: On-press developable, negative-working lithographic printing plate precursors are used to provide lithographic printing plates. Such precursors are prepared with a substrate and one or more negative-working, infrared radiation-sensitive imagable layers. The substrate is prepared by two separate anodizing processes to provide an inner aluminum oxide layer having an average dry thickness (Ti) of 650-3,000 nm and inner micropores having an average inner micropore diameter (Di) of <15 nm. A formed outer aluminum oxide layer comprises outer micropores having an average outer micropore diameter (Do) of 15-30 nm; an average dry thickness (To) of 130-650 nm; and a micropore density (Co) of 500-3,000 micropores/?m2. The ratio of Do to Di is greater than 1.1:1, and Do in nanometers and the outer aluminum oxide layer micropore density (Co) in micropores/?m2, are further defined by the outer aluminum oxide layer porosity (Po) as: 0.3?Po?0.8 wherein Po is 3.14(Co)(Do2)/4,000,000.
    Type: Application
    Filed: September 5, 2018
    Publication date: January 17, 2019
    Inventors: Oliver Merka, Jan-Phillip Kemmling, Oliver Blum, Benedikt Uhl, Philipp Viehmann
  • Publication number: 20180250925
    Abstract: Lithographic printing plate precursors are prepared with a unique substrate and one or more radiation-sensitive imageable layers. The substrate is prepared by two separate anodizing processes to provide an inner aluminum oxide layer having an average dry thickness (Ti) of 650-3,000 nm and a multiplicity of inner micropores having an average inner micropore diameter (Di) of ?15 nm. A formed outer aluminum oxide layer comprises a multiplicity of outer micropores having an average outer micropore diameter (Do) of 15-30 nm; an average dry thickness (To) of 130-650 nm; and a micropore density (Co) of 500-3,000 micropores/?m2. The ratio of Do to Di is greater than 1.1:1, and Do in nanometers and the outer aluminum oxide layer micropore density (Co) in micropores/?m2, are further defined by the outer aluminum oxide layer porosity (Po) according to the following equation: 0.3?Po?0.8 where Po is 3.14(Co)(Do2)/4,000,000.
    Type: Application
    Filed: March 2, 2017
    Publication date: September 6, 2018
    Inventors: Oliver Merka, Jan-Phillip Kemmling, Oliver Richard Blum, Benedikt Uhl