Abstract: In one embodiment, a semi-transparent reflector may include a multilayered photonic structure. The multilayered photonic structure includes a plurality of coating layers of high index dielectric material and a plurality of coating layers of low index dielectric material. The plurality of coating layers of high index dielectric material and the plurality of coating layers of low index dielectric material of the multilayered photonic structure are arranged in an [LH . . . (LH)N . . . L] structure. L is one of the plurality of coating layers of low index dielectric material. H is one of the plurality of coating layers of high index dielectric material. N is a positive integer. The multilayered photonic structure has substantially constant reflectance values for wavelengths of electromagnetic radiation in a visible spectrum over a range of angles of incidence of the electromagnetic radiation.

Abstract: A multi-layer photonic structure may include alternating layers of high index material and low index material having a form [H(LH)N] where, H is a layer of high index material, L is a layer of low index material and N is a number of pairs of layers of high index material and layers of low index material. N may be an integer?1. The low index dielectric material may have an index of refraction nL from about 1.3 to about 2.5. The high index dielectric material may have an index of refraction nH from about 1.8 to about 3.5, wherein nH>nL and the multi-layer photonic structure comprises a reflectivity band of greater than about 200 nm for light having angles of incidence from about 0 degrees to about 80 degrees relative to the multi-layer photonic structure. The multi-layer photonic structure may be incorporated into a paint or coating system thereby forming an omni-directional reflective paint or coating.

Abstract: A multi-layer photonic structure may include alternating layers of high index material and low index material having a form [H(LH)N] where, H is a layer of high index material, L is a layer of low index material and N is a number of pairs of layers of high index material and layers of low index material. N may be an integer ?1. The low index dielectric material may have an index of refraction nL from about 1.3 to about 2.5. The high index dielectric material may have an index of refraction nH from about 1.8 to about 3.5, wherein nH>nL and the multi-layer photonic structure comprises a reflectivity band of greater than about 200 nm for light having angles of incidence from about 0 degrees to about 80 degrees relative to the multi-layer photonic structure. The multi-layer photonic structure may be incorporated into a paint or coating system thereby forming an omni-directional reflective paint or coating.

Abstract: A multi-layer photonic structure may include alternating layers of high index material and low index material having a form [H(LH)N] where, H is a layer of high index material, L is a layer of low index material and N is a number of pairs of layers of high index material and layers of low index material. N may be an integer ?1. The low index dielectric material may have an index of refraction nL from about 1.3 to about 2.5. The high index dielectric material may have an index of refraction nH from about 1.8 to about 3.5, wherein nH>nL and the multi-layer photonic structure comprises a reflectivity band of greater than about 200 nm for light having angles of incidence from about 0 degrees to about 80 degrees relative to the multi-layer photonic structure. The multi-layer photonic structure may be incorporated into a paint or coating system thereby forming an omni-directional reflective paint or coating.

Abstract: An omnidirectional reflector that reflects a band of electromagnetic radiation of less than 100 nanometers when viewed from angles between 0 and 45 degrees is provided. The omnidirectional reflector includes a multilayer stack having a plurality of layers of high index of refraction material and a plurality of layers of low index of refraction material. In addition, the plurality of high index of refraction material layers and low index of refraction material layers are alternately stacked on top of or across each other and provide a non-periodic layered structure.

Abstract: An omnidirectional reflector that reflects a band of electromagnetic radiation of less than 100 nanometers when viewed from angles between 0 and 45 degrees is provided. The omnidirectional reflector includes a multilayer stack having a plurality of layers of high index of refraction material and a plurality of layers of low index of refraction material. In addition, the plurality of high index of refraction material layers and low index of refraction material layers are alternately stacked on top of or across each other and provide a non-periodic layered structure.

Abstract: A multilayer photonic structure may include a plurality of coating layers of high index dielectric material of index of refraction nH and a plurality of coating layers of low index dielectric material of index of refraction nL alternately arranged with a first coating layer and a last coating layer of the multi-layer photonic structure comprise low index material. An index-thickness of each coating layer of the multilayer photonic structure is different than every other coating layer of the multilayer photonic structure. The multilayer photonic structure has a first high reflectivity bandwidth, a second high reflectivity bandwidth and a low reflectivity bandwidth wherein the low reflectivity bandwidth is positioned between the first high reflectivity bandwidth and the second high reflectivity bandwidth.

Abstract: A catalyst material for use at elevated temperatures is provided. The material can include a plurality of fibers and a plurality of particles supported on the fibers. In addition, a porous layer can cover the plurality of particles and allow for process fluid to come into contact with the particles, and yet retard sintering of the particles at elevated temperatures is present. The plurality of fibers can be a plurality of nanofibers which may or may not be oxide nanofibers. The particles can be metallic nanoparticles and the porous layer can be a porous oxide layer.

Abstract: A method for producing a multi-layer photonic structure having at least one group of alternating layers of high index material and low index material may include, determining a characteristic property function for the multi-layer photonic structure, determining a thickness multiplier for the at least one group of alternating layers based on a comparison of the characteristic property function to a target profile, adjusting the characteristic property function with the determined thickness multiplier, and comparing an adjusted characteristic property function to the target profile, wherein, when the adjusted characteristic property function does not approximate the target profile, at least one additional group of layers is added to the multi-layer photonic structure.

Abstract: In one embodiment, a method for identifying an article of manufacture may include: producing a plurality of multilayer photonic structures, wherein each of the plurality of multilayer photonic structures has a unique intensity profile; incorporating one of the plurality of multilayer photonic structures that produces the unique intensity profile into a coating; and generating an electronic code corresponding to the unique intensity profile of one of the plurality of multilayer photonic structures.

Abstract: In one embodiment, the optical lock system may include an electronic control unit, a lock housing including a lock chamber, and an optical key including a multilayer photonic structure. The multilayer photonic structure may produce a unique intensity profile and includes a plurality of coating layers of high index dielectric material and a plurality of coating layers of low index dielectric. A light source may transmit a reference light to the multilayer photonic structure when the optical key is disposed within the lock chamber. A photo detector may receive an interaction light from the multilayer photonic structure and may transmit the unique intensity profile to the electronic control unit which may execute machine readable instructions to: compare the unique intensity profile to an electronic master; and cause the lock actuator to transition from a first state to a second state when the unique intensity profile corresponds to the electronic master.

Abstract: In one embodiment, a semi-transparent reflector may include a multilayered photonic structure. The multilayered photonic structure includes a plurality of coating layers of high index dielectric material and a plurality of coating layers of low index dielectric material. The plurality of coating layers of high index dielectric material and the plurality of coating layers of low index dielectric material of the multilayered photonic structure are arranged in an [LH . . . (LH)N . . . L] structure. L is one of the plurality of coating layers of low index dielectric material. H is one of the plurality of coating layers of high index dielectric material. N is a positive integer. The multilayered photonic structure has substantially constant reflectance values for wavelengths of electromagnetic radiation in a visible spectrum over a range of angles of incidence of the electromagnetic radiation.

Abstract: In one embodiment, the optical lock system may include an electronic control unit, a lock housing including a lock chamber, and an optical key including a multilayer photonic structure. The multilayer photonic structure may produce a unique intensity profile and includes a plurality of coating layers of high index dielectric material and a plurality of coating layers of low index dielectric. A light source may transmit a reference light to the multilayer photonic structure when the optical key is disposed within the lock chamber. A photo detector may receive an interaction light from the multilayer photonic structure and may transmit the unique intensity profile to the electronic control unit which may execute machine readable instructions to: compare the unique intensity profile to an electronic master; and cause the lock actuator to transition from a first state to a second state when the unique intensity profile corresponds to the electronic master.

Abstract: In one embodiment, a method for identifying an article of manufacture may include: producing a plurality of multilayer photonic structures, wherein each of the plurality of multilayer photonic structures has a unique intensity profile; incorporating one of the plurality of multilayer photonic structures that produces the unique intensity profile into a coating; and generating an electronic code corresponding to the unique intensity profile of one of the plurality of multilayer photonic structures.

Abstract: A catalyst material for use at elevated temperatures is provided. The material can include a plurality of fibers and a plurality of particles supported on the fibers. In addition, a porous layer can cover the plurality of particles and allow for process fluid to come into contact with the particles, and yet retard sintering of the particles at elevated temperatures is present. The plurality of fibers can be a plurality of nanofibers which may or may not be oxide nanofibers. The particles can be metallic nanoparticles and the porous layer can be a porous oxide layer.

Abstract: An omnidirectional reflector that reflects a band of electromagnetic radiation of less than 100 nanometers when viewed from angles between 0 and 45 degrees is provided. The omnidirectional reflector includes a multilayer stack having a plurality of layers of high index of refraction material and a plurality of layers of low index of refraction material. In addition, the plurality of high index of refraction material layers and low index of refraction material layers are alternately stacked on top of or across each other and provide a non-periodic layered structure.

Abstract: A method for producing a multi-layer photonic structure having at least one group of alternating layers of high index material and low index material may include, determining a characteristic property function for the multi-layer photonic structure, determining a thickness multiplier for the at least one group of alternating layers based on a comparison of the characteristic property function to a target profile, adjusting the characteristic property function with the determined thickness multiplier, and comparing an adjusted characteristic property function to the target profile, wherein, when the adjusted characteristic property function does not approximate the target profile, at least one additional group of layers is added to the multi-layer photonic structure.

Abstract: A multilayer photonic structure may include a plurality of coating layers of high index dielectric material of index of refraction nH and a plurality of coating layers of low index dielectric material of index of refraction nL alternately arranged with a first coating layer and a last coating layer of the multi-layer photonic structure comprise low index material. An index-thickness of each coating layer of the multilayer photonic structure is different than every other coating layer of the multilayer photonic structure. The multilayer photonic structure has a first high reflectivity bandwidth, a second high reflectivity bandwidth and a low reflectivity bandwidth wherein the low reflectivity bandwidth is positioned between the first high reflectivity bandwidth and the second high reflectivity bandwidth.

Abstract: A multi-layer photonic structure may include alternating layers of high index material and low index material having a form [H(LH)N] where, H is a layer of high index material, L is a layer of low index material and N is a number of pairs of layers of high index material and layers of low index material. N may be an integer ?1. The low index dielectric material may have an index of refraction nL from about 1.3 to about 2.5. The high index dielectric material may have an index of refraction nH from about 1.8 to about 3.5, wherein nH>nL and the multi-layer photonic structure comprises a reflectivity band of greater than about 200 nm for light having angles of incidence from about 0 degrees to about 80 degrees relative to the multi-layer photonic structure. The multi-layer photonic structure may be incorporated into a paint or coating system thereby forming an omni-directional reflective paint or coating.