Abstract: Disclosed herein is an electromagnetic radiation absorber comprising a filamentary, three-dimensional, porous substrate of dielectric material having a relatively thin layer of electrically conductive material deposited thereupon. The layer is characterized by a generally gradual and continuous reduction in its thickness or bulk with inward progression into the substrate from one side thereof, thus resulting in a layer exhibiting a graduated resistivity. A filler substantially pervious to the radiation of interest may be disposed in the interstitial voids between filaments, and relatively small diameter magnetic/magnetizeable particles may be suspended in the filler to thereby further extend the useful frequency range of the absorber. Also disclosed is a sputtering method for producing such an absorber.

Abstract: Disclosed is a method for producing vertical recording media by using magnetically-assisted sputtering apparatus to sputter from a magnetic target while selected portions of the target are heated to a temperature at or above Curie. Also disclosed are improved means for supporting the magnetic target during sputtering which permits the realization of enhanced sputtering efficiencies.

Abstract: Disclosed herein is means adapted for use in combination with magnetically-enhanced sputtering devices whereby said devices are rendered more useful for sputter-coating substrates susceptible to heat-induced deterioration. Said means comprises a screen-like mesh or grid member disposed intermediate the target of said device and the substrate to be coated, and in such a position that said means is also disposed across the magnetic field formed by said device. Said screen-like mesh or grid member is formed of material which is magnetizable in response to the disposition thereof across said magnetic field. Said screen-like mesh or grid member has the desirable effect of suppressing the expansion of heated plasma whereby said plasma is confined to a region proximate said target and generally away from said substrate. Also disclosed is improved anodic means for collecting fast electrons emitted from said target.

Abstract: To provide a thin film magnetic head having good low frequency response, the invention teaches the use of a movable mask technique whereby a first deposited magnetic film is provided with a tapered, or knife-, edge. Gap spacer material is then deposited on the film knife-edge. Thereafter, a second magnetic film is deposited atop the knife-edge, as well as on the same substrate that supports the first magnetic film. What results, therefore, is a slant gap thin film magnetic head having good low frequency response.

Abstract: Disclosed is a method for producing vertical recording media by using magnetically-assisted sputtering apparatus to sputter from a magnetic target while selected portions of the target are heated to a temperature at or above Curie. Also disclosed are improved means for supporting the magnetic target during sputtering which permits the realization of enhanced sputtering efficiencies.

Abstract: To provide a thin film magnetic head having good low frequency response, the invention teaches the use of a movable mask technique whereby a first deposited magnetic film is provided with a tapered, or knife-, edge. Gap spacer material is then deposited on the film knife-edge. Thereafter, a second magnetic film is deposited atop the knife-edge, as well as on the same substrate that supports the first magnetic film. What results, therefore, is a slant gap thin film magnetic head having good low frequency response.

Abstract: The advantages of magnetron sputtering are applied to magnetic target materials by substantially reducing the saturation magnetization of the target material temporarily, and magnetron sputtering the magnetic material while in such a state of reduced magnetization. A technique is disclosed for using the thermal energy inherent in the sputtering process for initially heating the target material to its Curie temperature, thereby rendering the material non-magnetic, and for maintaining the target temperature at or above such temperature during the sputtering process.

Abstract: A sputtered thin film coating characterized by a stepwise and/or variable refractive index as a function of film depth. By means of an in-line assembly of planar magnetrons, each magnetron essentially isolated from the others but for a region of sputtering overlap, select materials and combinations of said materials with reactive gases can be continuously deposited upon a dynamic substrate whereby to obtain pre-determined refractive index gradients. Substrates coated with an inhomogeneous thin film exhibit superior non-spectral reflective characteristics particularly desirable for architectural designs and applications.

Abstract: The advantages of magnetron sputtering can be applied to magnetic target materials by substantially reducing the saturation magnetization of the target material temporarily, such as by heating the target material to its Curie point, and magnetron sputtering the magnetic material while in such a state of reduced magnetization. Disclosed herein is a magnetic target plate which is structured to facilitate heating of the plate to its Curie point by the thermal energy inherent in the conventional sputtering process.