Patents by Inventor Benjamin Bowers

Benjamin Bowers has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10366196
    Abstract: Disclosed systems and methods pertain to finfet based integrated circuits designed with logic cell architectures which support multiple diffusion regions for n-type and p-type diffusions. Different diffusion regions of each logic cell can have different widths or fin counts. Abutting two logic cells is enabled based on like fin counts for corresponding p-diffusion regions and n-diffusion regions of the two logic cells. Diffusion fills are used at common edges between the two logic cells for extending lengths of diffusion, based on the like fin counts. The logic cell architectures support via redundancy and the ability to selectively control threshold voltages of different logic cells with implant tailoring. Half-row height cells can be interleaved with standard full-row height cells.
    Type: Grant
    Filed: June 21, 2017
    Date of Patent: July 30, 2019
    Assignee: QUALCOMM Incorporated
    Inventors: Anthony Correale, Jr., Benjamin Bowers, Tracey Della Rova, William Goodall, III
  • Patent number: 10236302
    Abstract: Disclosed systems and methods pertain to finfet based integrated circuits designed with logic cell architectures which support multiple diffusion regions for n-type and p-type diffusions. Different diffusion regions of each logic cell can have different widths or fin counts. Abutting two logic cells is enabled based on like fin counts for corresponding p-diffusion regions and n-diffusion regions of the two logic cells. Diffusion fills are used at common edges between the two logic cells for extending lengths of diffusion, based on the like fin counts. The logic cell architectures support via redundancy and the ability to selectively control threshold voltages of different logic cells with implant tailoring. Half-row height cells can be interleaved with standard full-row height cells.
    Type: Grant
    Filed: June 21, 2017
    Date of Patent: March 19, 2019
    Assignee: QUALCOMM Incorporated
    Inventors: Anthony Correale, Jr., Benjamin Bowers, Tracey Della Rova, William Goodall, III
  • Publication number: 20170373090
    Abstract: Disclosed systems and methods pertain to finfet based integrated circuits designed with logic cell architectures which support multiple diffusion regions for n-type and p-type diffusions. Different diffusion regions of each logic cell can have different widths or fin counts. Abutting two logic cells is enabled based on like fin counts for corresponding p-diffusion regions and n-diffusion regions of the two logic cells. Diffusion fills are used at common edges between the two logic cells for extending lengths of diffusion, based on the like fin counts. The logic cell architectures support via redundancy and the ability to selectively control threshold voltages of different logic cells with implant tailoring. Half-row height cells can be interleaved with standard full-row height cells.
    Type: Application
    Filed: June 21, 2017
    Publication date: December 28, 2017
    Inventors: Anthony CORREALE, JR., Benjamin BOWERS, Tracey DELLA ROVA, William GOODALL, III
  • Publication number: 20170371995
    Abstract: Disclosed systems and methods pertain to finfet based integrated circuits designed with logic cell architectures which support multiple diffusion regions for n-type and p-type diffusions. Different diffusion regions of each logic cell can have different widths or fin counts. Abutting two logic cells is enabled based on like fin counts for corresponding p-diffusion regions and n-diffusion regions of the two logic cells. Diffusion fills are used at common edges between the two logic cells for extending lengths of diffusion, based on the like fin counts. The logic cell architectures support via redundancy and the ability to selectively control threshold voltages of different logic cells with implant tailoring. Half-row height cells can be interleaved with standard full-row height cells.
    Type: Application
    Filed: June 21, 2017
    Publication date: December 28, 2017
    Inventors: Anthony CORREALE, JR., Benjamin BOWERS, Tracey DELLA ROVA, William GOODALL, III
  • Publication number: 20080115093
    Abstract: Methods, systems, and media to improve the manufacturability of cells and structures within cells of an integrated circuit are disclosed. Embodiments comprise a method of arranging programmable cells, routing the programmable cells, analyzing the cell arrangement and interconnect wiring for manufacturing improvement opportunities, and modifying the programmable cell structures to incorporate the manufacturing improvements. In some embodiments, wires are spread to prevent shorting. In other embodiments, the reliability of contacts and vias is improved by adding additional metallization to the areas surrounding the contacts and vias, or by adding redundant contacts and vias. In one embodiment, a series of manufacturing improvements are made to integrated circuit cells in an iterative fashion.
    Type: Application
    Filed: January 8, 2008
    Publication date: May 15, 2008
    Inventors: Benjamin Bowers, Anthony Correale
  • Publication number: 20070170553
    Abstract: Methods and apparatuses for using gate arrays to create capacitive structures within an integrated circuit are disclosed. Embodiments comprise a method of placing a gate array of P-type field effect transistors (P-fets) and N-type field effect transistors (N-fets) in an integrated circuit design, coupling drains and sources for one or more P-fets and gates for one or more N-fets to a power supply ground, and coupling gates for the one or more P-fets and the drains and sources for one or more N-fets to a positive voltage of the power supply. In some embodiments, source-to-drain leakage current for capacitive apparatuses of P-fets and N-fets are minimized by biasing one or more P-fets and one or more N-fets to the positive voltage and the ground, respectively. In other embodiments, the capacitive structures may be implemented using fusible elements to isolate the capacitive structures in case of shorts.
    Type: Application
    Filed: January 20, 2006
    Publication date: July 26, 2007
    Applicant: International Business Machines Corporation
    Inventors: Anthony Correale, Benjamin Bowers, Douglass Lamb, Nishith Rohatgi
  • Publication number: 20070101306
    Abstract: Methods, systems, and media to improve the manufacturability of cells and structures within cells of an integrated circuit are disclosed. Embodiments comprise a method of arranging programmable cells, routing the programmable cells, analyzing the cell arrangement and interconnect wiring for manufacturing improvement opportunities, and modifying the programmable cell structures to incorporate the manufacturing improvements. In some embodiments, wires are spread to prevent shorting. In other embodiments, the reliability of contacts and vias is improved by adding additional metallization to the areas surrounding the contacts and vias, or by adding redundant contacts and vias. In one embodiment, a series of manufacturing improvements are made to integrated circuit cells in an iterative fashion.
    Type: Application
    Filed: November 2, 2005
    Publication date: May 3, 2007
    Applicant: International Business Machines Corporation
    Inventors: Benjamin Bowers, Anthony Correale
  • Publication number: 20070033427
    Abstract: Arrangements and methods to cycle steal and reduce power consumption in an integrated circuit are disclosed. Embodiments of the invention exploit the art of cycle stealing for increased system performance, while facilitating a more power efficient bypass mode when power conservation is desired over performance. One embodiment includes a network of integrated delay elements employing a multiplexor to transfer either a normal or a delayed clock signal to a clock splitter. Another embodiment includes a network of delay elements, configured to enable or disable power conservation. A further embodiment integrates a configurable delay circuit into a clock splitter arrangement.
    Type: Application
    Filed: July 19, 2005
    Publication date: February 8, 2007
    Applicant: International Business Machines Corporation
    Inventors: Anthony Correale, Benjamin Bowers, Ying Brown, Veena Pureswaran