Abstract: Methods, systems, and apparatuses are provided for estimating a location on an object in a three-dimensional scene. Multiple radiation patterns are produced by spatially modulating each of multiple first radiations with a distinct combination of one or more modulating structures, each first radiation having at least one of a distinct radiation path, a distinct source, a distinct source spectrum, or a distinct source polarization with respect to the other first radiations. The location on the object is illuminated with a portion of each of two or more of the radiation patterns, the location producing multiple object radiations, each object radiation produced in response to one of the multiple radiation patterns. Multiple measured values are produced by detecting the object radiations from the location on the object due to each pattern separately using one or more detector elements. The location on the object is estimated based on the multiple measured values.

Abstract: Microlens array formation and alignment to heterogeneously integrated optoelectronic devices. Optoelectronic devices are printed or transferred in a single process step while also creating inactive optoelectronic devices that are precisely shaped for alignment purposes rather than for optical or electrical performance. Microlenses are integrated monolithically. The microlenses are aligned directly to a fiducial generated by the device integration step, reducing overall misalignment. Additionally, we use specific optical designs for the lenses to add novel functionalities to the system. By designing the lenses with engineered offsets, distances and curvatures with respect to the arrays of optoelectronic devices, we control properties of light such as: angles, phase, beam widths, and wavelength dependence.

Abstract: Methods, systems, and apparatuses are provided for estimating a location on an object in a three-dimensional scene. Multiple radiation patterns are produced by spatially modulating each of multiple first radiations with a distinct combination of one or more modulating structures, each first radiation having at least one of a distinct radiation path, a distinct source, a distinct source spectrum, or a distinct source polarization with respect to the other first radiations. The location on the object is illuminated with a portion of each of two or more of the radiation patterns, the location producing multiple object radiations, each object radiation produced in response to one of the multiple radiation patterns. Multiple measured values are produced by detecting the object radiations from the location on the object due to each pattern separately using one or more detector elements. The location on the object is estimated based on the multiple measured values.

Abstract: A compact bi-telecentric device includes refractive lenses and takes in light from a grid of emitters at the object plane and images them to a grid of receivers. It provides the capacity to combine multiple wavelengths of emitters at the object plane into a single receiver. The device is quite compact, less than 25 mm in length from object to image, and having a maximum diameter for any element of less than 4 mm. The device includes four optical lens elements, three of which have a positive focal length and one of which has a negative focal length. The device includes at least one diffractive optical element. The lens elements are separated into two distinct groups which each have positive optical power, separated by an aperture stop which may or may not be enabled by a physical surface. A diffractive element enables wavelength division multiplexing and compensates for distortion from the bi-telecentric device.

Abstract: Methods, systems, and devices for 3D measurement and/or pattern generation are provided in accordance with various embodiments. Some embodiments include a method of pattern projection that may include projecting one or more patterns. Each pattern from the one or more patterns may include an arrangement of three or more symbols that are arranged such that for each symbol in the arrangement, a degree of similarity between said symbol and a most proximal of the remaining symbols in the arrangement is less than a degree of similarity between said symbol and a most distal of the remaining symbols in the arrangement. Some embodiments further include: illuminating an object using the one or more projected patterns; collecting one or more images of the illuminated object; and/or computing one or more 3D locations of the illuminated object based on the one or more projected patterns and the one or more collected images.

Abstract: A positioning system for an optical system can include a support frame and a flexure arrangement. The flexure arrangement can be configured to secure an optical-system component relative to a support frame, with the optical-system component in a first orientation. The flexure arrangement can be configured to resiliently deform, upon application of a transient stress to the optical system, to move the optical-system component relative to the support frame along at least one degree of freedom. The flexure arrangement can be configured to return the optical-system component to the first orientation upon removal of the transient stress.

Abstract: Methods, systems, and devices involving patterned radiation are provided in accordance with various embodiments. Some embodiments include a device for projecting pattern radiation. Some embodiments include a method for estimating coordinates of a location on an object in a 3D scene. Some embodiments include a system for estimating the coordinates of a location on an object in a 3D scene. A variety of radiation patterns are provided in accordance with various embodiments. Some embodiments may relate to the use of patterned illumination to identify the angular information that may be utilized to measure depth by triangulation.

Abstract: A positioning system for an optical system can include a support frame and a flexure arrangement. The flexure arrangement can be configured to secure an optical-system component relative to a support frame, with the optical-system component in a first orientation. The flexure arrangement can be configured to resiliently deform, upon application of a transient stress to the optical system, to move the optical-system component relative to the support frame along at least one degree of freedom. The flexure arrangement can be configured to return the optical-system component to the first orientation upon removal of the transient stress.

Abstract: Methods, systems, and devices for 3D measurement and/or pattern generation are provided in accordance with various embodiments. Some embodiments include a method of pattern projection that may include projecting one or more patterns. Each pattern from the one or more patterns may include an arrangement of three or more symbols that are arranged such that for each symbol in the arrangement, a degree of similarity between said symbol and a most proximal of the remaining symbols in the arrangement is less than a degree of similarity between said symbol and a most distal of the remaining symbols in the arrangement. Some embodiments further include: illuminating an object using the one or more projected patterns; collecting one or more images of the illuminated object; and/or computing one or more 3D locations of the illuminated object based on the one or more projected patterns and the one or more collected images.

Abstract: Methods, systems, and devices involving patterned radiation are provided in accordance with various embodiments. Some embodiments include a device for projecting pattern radiation. Some embodiments include a method for estimating coordinates of a location on an object in a 3D scene. Some embodiments include a system for estimating the coordinates of a location on an object in a 3D scene. A variety of radiation patterns are provided in accordance with various embodiments. Some embodiments may relate to the use of patterned illumination to identify the angular information that may be utilized to measure depth by triangulation.

Abstract: Methods, systems, and devices for 3D measurement and/or pattern generation are provided in accordance with various embodiments. Some embodiments include a method of pattern projection that may include projecting one or more patterns. Each pattern from the one or more patterns may include an arrangement of three or more symbols that are arranged such that for each symbol in the arrangement, a degree of similarity between said symbol and a most proximal of the remaining symbols in the arrangement is less than a degree of similarity between said symbol and a most distal of the remaining symbols in the arrangement. Some embodiments further include: illuminating an object using the one or more projected patterns; collecting one or more images of the illuminated object; and/or computing one or more 3D locations of the illuminated object based on the one or more projected patterns and the one or more collected images.

Abstract: Methods, systems, and devices involving patterned radiation are provided in accordance with various embodiments. Some embodiments include a device for projecting pattern radiation. Some embodiments include a method for estimating coordinates of a location on an object in a 3D scene. Some embodiments include a system for estimating the coordinates of a location on an object in a 3D scene. A variety of radiation patterns are provided in accordance with various embodiments. Some embodiments may relate to the use of patterned illumination to identify the angular information that may be utilized to measure depth by triangulation.

Abstract: Catadioptric projector systems, devices, and methods are provided in accordance with various embodiments. For example, some embodiments include a catadioptric projector that may include: a radiation source; a static pattern generating element and/or a time-varying pattern generating element configured to condition radiation from the radiation source to produce the patterned illumination; and/or a convex reflector positioned to project the patterned illumination. Some embodiments include a system that includes a catadioptric projector and a camera configured to acquire one or more images based on the patterned illumination. Systems and methods in accordance with various embodiments are provided to estimate a distance to a point on an object based on the one or more acquired images.

Abstract: A positioning system for an optical system can include a support frame and a flexure arrangement. The flexure arrangement can be configured to secure an optical-system component relative to a support frame, with the optical-system component in a first orientation. The flexure arrangement can be configured to resiliently deform, upon application of a transient stress to the optical system, to move the optical-system component relative to the support frame along at least one degree of freedom. The flexure arrangement can be configured to return the optical-system component to the first orientation upon removal of the transient stress.

Abstract: Methods, systems, and apparatuses are provided for estimating a location on an object in a three-dimensional scene. Multiple radiation patterns are produced by spatially modulating each of multiple first radiations with a distinct combination of one or more modulating structures, each first radiation having at least one of a distinct radiation path, a distinct source, a distinct source spectrum, or a distinct source polarization with respect to the other first radiations. The location on the object is illuminated with a portion of each of two or more of the radiation patterns, the location producing multiple object radiations, each object radiation produced in response to one of the multiple radiation patterns. Multiple measured values are produced by detecting the object radiations from the location on the object due to each pattern separately using one or more detector elements. The location on the object is estimated based on the multiple measured values.

Abstract: Methods, systems, and devices involving patterned radiation are provided in accordance with various embodiments. Some embodiments include a device for projecting pattern radiation. Some embodiments include a method for estimating coordinates of a location on an object in a 3D scene. Some embodiments include a system for estimating the coordinates of a location on an object in a 3D scene. A variety of radiation patterns are provided in accordance with various embodiments. Some embodiments may relate to the use of patterned illumination to identify the angular information that may be utilized to measure depth by triangulation.

Abstract: Methods, systems, and apparatuses are provided for estimating a location on an object in a three-dimensional scene. Multiple radiation patterns are produced by spatially modulating each of multiple first radiations with a distinct combination of one or more modulating structures, each first radiation having at least one of a distinct radiation path, a distinct source, a distinct source spectrum, or a distinct source polarization with respect to the other first radiations. The location on the object is illuminated with a portion of each of two or more of the radiation patterns, the location producing multiple object radiations, each object radiation produced in response to one of the multiple radiation patterns. Multiple measured values are produced by detecting the object radiations from the location on the object due to each pattern separately using one or more detector elements. The location on the object is estimated based on the multiple measured values.

Abstract: Methods, systems, and devices involving patterned radiation are provided in accordance with various embodiments. Some embodiments include a device for projecting pattern radiation. Some embodiments include a method for estimating coordinates of a location on an object in a 3D scene. Some embodiments include a system for estimating the coordinates of a location on an object in a 3D scene. A variety of radiation patterns are provided in accordance with various embodiments. Some embodiments may relate to the use of patterned illumination to identify the angular information that may be utilized to measure depth by triangulation.

Abstract: Methods, systems, and devices for 3D measurement and/or pattern generation are provided in accordance with various embodiments. Some embodiments include a method of pattern projection that may include projecting one or more patterns. Each pattern from the one or more patterns may include an arrangement of three or more symbols that are arranged such that for each symbol in the arrangement, a degree of similarity between said symbol and a most proximal of the remaining symbols in the arrangement is less than a degree of similarity between said symbol and a most distal of the remaining symbols in the arrangement. Some embodiments further include: illuminating an object using the one or more projected patterns; collecting one or more images of the illuminated object; and/or computing one or more 3D locations of the illuminated object based on the one or more projected patterns and the one or more collected images.

Abstract: Methods, systems, and devices involving patterned radiation are provided in accordance with various embodiments. Some embodiments include a device for projecting pattern radiation. Some embodiments include a method for estimating coordinates of a location on an object in a 3D scene. Some embodiments include a system for estimating the coordinates of a location on an object in a 3D scene. A variety of radiation patterns are provided in accordance with various embodiments. Some embodiments may relate to the use of patterned illumination to identify the angular information that may be utilized to measure depth by triangulation.