Abstract: Disclosed herein are methods and devices for cleaning a surface of a substrate having a layer of dust disposed thereon by ejecting at least a portion of the dust from the surface. The methods comprise irradiating the layer of dust with an electron beam, such that the electron beam irradiates a particle thereby inducing said particle to emit a plurality of secondary electrons; wherein at least a portion of the plurality of secondary electrons impinge two or more neighboring particles to thereby generate a secondary charge on the two or more neighboring particles, wherein the secondary charge on the two or more neighboring particles creates an electrostatic repulsive force between said particles, wherein the electrostatic repulsive force is sufficient to eject said particles from the surface.