Abstract: Disclosed are a mixed oxide composition based on zirconium and cerium exhibiting a high reducibility, the process for preparing it and its use in the field of catalysis.

Abstract: The present invention relates to a suspension of nanoparticles of a mixed oxide based on cerium and zirconium. It also relates to the use of said suspension for the preparation of a catalysed gasoline particulate filter.

Abstract: Disclosed are a mixed oxide composition based on zirconium and cerium exhibiting a high reducibility, the process for preparing it and its use in the field of catalysis.

Abstract: A system allowing for the tilting of the rocket motor such that, in the tilted position, the centre of the nozzle is located at least approximately on the neutral orientation axis of said rocket motor.

Abstract: A spaceplane suitable for aeronautical flight comprising a body and a wing defining a lower airfoil surface in addition to attitude control means that comprise one or a plurality of shutters disposed under the lower airfoil surface of same and maneuverable between a stowed position and an inclined extended position for aerodynamic braking during the transition from a phase of space flight to a phase of aeronautical flight of the aircraft.

Abstract: A device for mounting and supporting a generally cylindrical or tapered tank, having a main axis X, that includes a pair of first retaining rods for retaining the tank along a vertical axis Z on each of a first and second end of the tank, a second retaining rod for retaining the tank along a horizontal axis Y, perpendicular to the main axis, on the first end of the tank, and a third retaining rod for retaining in a ball-and-socket joint, the means being located around the vertical axis and connected to the second end of the tank.

Abstract: A system allowing for the tilting of the rocket motor such that, in the tilted position, the centre of the nozzle is located at least approximately on the neutral orientation axis of said rocket motor.

Abstract: A spaceplane suitable for aeronautical flight comprising a body and a wing defining a lower airfoil surface in addition to attitude control means that comprise one or a plurality of shutters disposed under the lower airfoil surface of same and maneuverable between a stowed position and an inclined extended position for aerodynamic braking during the transition from a phase of space flight to a phase of aeronautical flight of the aircraft.

Abstract: The present invention relates to a device for mounting and supporting a generally cylindrical or tapered tank, having a main axis X, that includes a pair of first means for retaining the tank along a vertical axis Z on each of a first and second end of the tank, a second means for retaining the tank along a horizontal axis Y, perpendicular to the main axis, on the first end of the tank, and a third means for retaining in a ball-and-socket joint, the means being located around the vertical axis and connected to the second end of the tank.

Abstract: The invention concerns a tank retainer for retaining a tank in the fuselage of an aircraft which includes, between the tank and a frame rigidly connected to the fuselage of the aircraft, a hinged retaining means and a fastening rod on which said hinged retaining means is mounted. Advantageously, the hinged retaining means is intended to be connected to a rear end of the tank and the fastening rod is suitable for being mounted on the frame rigidly connected to the fuselage of the aircraft and, preferably, the hinged retaining means comprises a ball joint.

Abstract: A photomask is formed by depositing an opaque layer on a transparent substrate. A resist is formed on the opaque layer and selectively patterned to expose the portions of the opaque layer that are to be etched out. During the dry etching step, the photomask is exposed to an etchant gas mixture which exhibit a selectivity equal to or higher than 1.2:1 between the opaque layer and the resist layer. Due to the higher selectivity of the gas mixture, a thinner resist film can be used, thereby increasing resolution and accuracy of the opaque layer pattern. Also, due to reduced susceptibility to both a macro-loading effect and a pattern density effect, overetching of the resist and underetching of the opaque layer are significantly reduced, thereby achieving improved etching uniformity and consequently improved CD uniformity.

Abstract: A photomask is formed by depositing an opaque layer on a transparent substrate. A resist is formed on the opaque layer and selectively patterned to expose the portions of the opaque layer that are to be etched out. During the dry etching step, the photomask is exposed to an etchant gas mixture which exhibit a selectivity equal to or higher than 1.2:1 between the opaque layer and the resist layer. Due to the higher selectivity of the gas mixture, a thinner resist film can be used, thereby increasing resolution and accuracy of the opaque layer pattern. Also, due to reduced susceptibility to both a macro-loading effect and a pattern density effect, overetching of the resist and underetching of the opaque layer are significantly reduced, thereby achieving improved etching uniformity and consequently improved CD uniformity.

Abstract: The reactive ion etching resistance of radiation sensitive resist composition is enhanced by adding at least one organometallic compound to a radiation sensitive polymer. The resist composition can be patterned and used as mask for patterning an underlying layer.

Abstract: A structure and method for removing and recovering an anodically bonded glass device from a substrate using a metal interlayer interposed between the glass and the substrate is provided. As used in semiconductor mask fabrication, the structure comprises a silicon wafer substrate coated with a membrane on which a metal interlayer is disposed. The metal interlayer and a glass device are anodically bonded together. Recovery of the glass device is accomplished by chemically and mechanically removing the wafer and its membrane from the metal interlayer. The membrane is preferably removed using reactive ion etching to which the metal interlayer is resistant. The metal interlayer is then removed from the glass device using a highly corrosive chemical solution. The recovered glass device may then be reused.