Abstract: The present disclosure relates to methods, to an apparatus and to a computer program for processing of a lithography object. More particularly, the present invention relates to a method for removing a material, to a corresponding apparatus and to a method for lithographic processing of a wafer, and to a computer program for performing the methods. A method for processing a lithography object comprises, for example: providing a first gas comprising first molecules; providing a particle beam in a working region of the object for removal of a first material in the working region based at least partly on the first gas, wherein the first material comprises ruthenium.

Abstract: A method for obtaining a proof of work in a computer network, having the following features: an allocation problem of a multi-dimensional auction having a predetermined time complexity is set as a function of a computing power of the computer network, the allocation problem is transmitted to a service user in the computer network and a solution of the allocation problem found by the service user is checked by computation.