Patents by Inventor Benjamin J. GITLIN

Benjamin J. GITLIN has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • High speed synchronization of plasma source/bias power delivery
    Patent number: 11935726
    Abstract: A radio frequency (RF) generator system includes first and second RF power sources, each RF power source applying a respective RF signal and second RF signal to a load. The first RF signal is applied in accordance with the application of the second RF signal. The application of the first RF signal is synchronized to application of the second RF signal. The first RF signal may be amplitude modulated in synchronization with the second RF signal, and the amplitude modulation can include blanking of the first RF signal. A frequency offset may be applied to the first RF signal in synchronization with the second RF signal. A variable actuator associated with the first RF power source may be controlled in accordance with the second RF signal.
    Type: Grant
    Filed: September 21, 2021
    Date of Patent: March 19, 2024
    Assignee: MKS Instruments, Inc.
    Inventors: Aaron T. Radomski, Benjamin J. Gitlin, Larry J. Fisk, II, Mariusz Oldziej, Aaron M. Burry, Jonathan W. Smyka, Alexei Marakhtanov, Bing Ji, Felix Leib Kozakevich, John Holland, Ranadeep Bhowmick
  • System and method for arc detection using a bias RF generator signal
    Patent number: 11536755
    Abstract: An arc detector for a RF power supply system, where the RF power supply incudes a first RF power supply and a second RF power supply. A signal applied to a non-linear load varies in accordance with an output from one of the first RF power supply or the second RF power supply. The signal has a frequency. During an arc or arc condition in the non-linear load, the frequency of the signal changes, and if the frequency is outside of a selected range, an arc or arc condition is indicated. The frequency can be determined by digitizing the signal into a series of pulses and measuring a time or period between pulses.
    Type: Grant
    Filed: May 29, 2020
    Date of Patent: December 27, 2022
    Assignee: MKS Instruments, Inc.
    Inventors: Larry J. Fisk, II, Benjamin J. Gitlin, Mariusz Oldziej, Aaron M. Burry, Matthew G. Harrington, Aaron T. Radomski
  • High Speed Synchronization Of Plasma Source/Bias Power Delivery
    Publication number: 20220005674
    Abstract: A radio frequency (RF) generator system includes first and second RF power sources, each RF power source applying a respective RF signal and second RF signal to a load. The first RF signal is applied in accordance with the application of the second RF signal. The application of the first RF signal is synchronized to application of the second RF signal. The first RF signal may be amplitude modulated in synchronization with the second RF signal, and the amplitude modulation can include blanking of the first RF signal. A frequency offset may be applied to the first RF signal in synchronization with the second RF signal. A variable actuator associated with the first RF power source may be controlled in accordance with the second RF signal.
    Type: Application
    Filed: September 21, 2021
    Publication date: January 6, 2022
    Inventors: Aaron T. RADOMSKI, Benjamin J. GITLIN, Larry J. FISK, II, Mariusz OLDZIEJ, Aaron M. BURRY, Jonathan W. SMYKA, Alexei MARAKHTANOV, Bing JI, Felix Leib KOZAKEVICH, John HOLLAND, Ranadeep BHOWMICK
  • System and Method for Arc Detection Using a Bias RF Generator Signal
    Publication number: 20210373054
    Abstract: An arc detector for a RF power supply system, where the RF power supply incudes a first RF power supply and a second RF power supply. A signal applied to a non-linear load varies in accordance with an output from one of the first RF power supply or the second RF power supply. The signal has a frequency. During an arc or arc condition in the non-linear load, the frequency of the signal changes, and if the frequency is outside of a selected range, an arc or arc condition is indicated. The frequency can be determined by digitizing the signal into a series of pulses and measuring a time or period between pulses.
    Type: Application
    Filed: May 29, 2020
    Publication date: December 2, 2021
    Inventors: Larry J. FISK, II, Benjamin J. GITLIN, Mariusz OLDZIEJ, Aaron M. BURRY, Matthew G. HARRINGTON, Aaron T. RADOMSKI
  • High speed synchronization of plasma source/bias power delivery
    Patent number: 11158488
    Abstract: A radio frequency (RF) generator system includes first and second RF power sources, each RF power source applying a respective RF signal and second RF signal to a load. The first RF signal is applied in accordance with the application of the second RF signal. The application of the first RF signal is synchronized to application of the second RF signal. The first RF signal may be amplitude modulated in synchronization with the second RF signal, and the amplitude modulation can include blanking of the first RF signal. A frequency offset may be applied to the first RF signal in synchronization with the second RF signal. A variable actuator associated with the first RF power source may be controlled in accordance with the second RF signal.
    Type: Grant
    Filed: June 26, 2019
    Date of Patent: October 26, 2021
    Assignees: MKS Instruments, Inc., Lam Research Corporation
    Inventors: Aaron T. Radomski, Benjamin J. Gitlin, Larry J. Fisk, II, Mariusz Oldziej, Aaron M. Burry, Jonathan W. Smyka, Alexei Marakhtanov, Bing Ji, Felix Leib Kozakevich, John Holland, Ranadeep Bhowmick
  • High Speed Synchronization Of Plasma Source/Bias Power Delivery
    Publication number: 20200411289
    Abstract: A radio frequency (RF) generator system includes first and second RF power sources, each RF power source applying a respective RF signal and second RF signal to a load. The first RF signal is applied in accordance with the application of the second RF signal. The application of the first RF signal is synchronized to application of the second RF signal. The first RF signal may be amplitude modulated in synchronization with the second RF signal, and the amplitude modulation can include blanking of the first RF signal. A frequency offset may be applied to the first RF signal in synchronization with the second RF signal. A variable actuator associated with the first RF power source may be controlled in accordance with the second RF signal.
    Type: Application
    Filed: June 26, 2019
    Publication date: December 31, 2020
    Inventors: Aaron T. RADOMSKI, Benjamin J. GITLIN, Larry J. FISK, II, Mariusz OLDZIEJ, Aaron M. BURRY, Jonathan W. SMYKA, Alexei MARAKHTANOV, Bing JI, Felix Leib KOZAKEVICH, John HOLLAND, Ranadeep BHOWMICK