Patents by Inventor Benjamin J. Jurcik, Jr.
Benjamin J. Jurcik, Jr. has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 10370248Abstract: An improved hydrogen generation system and method for using the same are provided. The system includes an HDS unit configured to remove sulfur, a first and second pre-reformers configured to pre-reform a process gas and fuel gas, respectively, a first and second heat exchangers configured to dry and heat the pre-reformed fuel gas, respectively, and a reformer configured to produce a syngas and flue gas. The method includes using a process stream selected from the group consisting of air, PSA off-gas, hydrocarbon gas, and combinations thereof to dry the fuel gas and using a process stream selected from the group consisting of the flue gas, the syngas, and combinations thereof to heat the dry fuel gas. The second pre-reformer is a low-pressure pre-reformer, so that the heat contents of the fuel gas is increased through converting heavy hydrocarbons in the fuel gas to CO and H2 by the second pre-reformer.Type: GrantFiled: January 27, 2017Date of Patent: August 6, 2019Assignees: L'Air Liquide Societe Anonyme Pour L'Etude, Et L'Exploration Des Procedes Georges ClaudeInventors: Taekyu Kang, Rong Fan, Pavol Pranda, Robert A. Gagliano, Benjamin J. Jurcik, Jr.
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Publication number: 20180215618Abstract: An improved hydrogen generation system and method for using the same are provided. The system includes an HDS unit configured to remove sulfur from a process gas and a fuel gas, a pre-reformer configured to convert heavy hydrocarbons in the process gas and the fuel gas to methane, a first heat exchanger configured to dry the pre-reformed fuel gas, a second heat exchanger configured to heat the dry pre-reformed fuel gas, and a reformer configured to produce a syngas and flue gas.Type: ApplicationFiled: January 27, 2017Publication date: August 2, 2018Applicant: L'Air Liquide, Societe Anonyme pour l'Etude et l'Exploitation des Procedes Georges ClaudeInventors: Taekyu KANG, Rong FAN, Pavol PRANDA, Robert A. GAGLIANO, Benjamin J. JURCIK, JR.
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Publication number: 20180215619Abstract: An improved hydrogen generation system and method for using the same are provided. The system includes an HDS unit configured to remove sulfur, a first and second pre-reformers configured to pre-reform a process gas and fuel gas, respectively, a first and second heat exchangers configured to dry and heat the pre-reformed fuel gas, respectively, and a reformer configured to produce a syngas and flue gas. The method includes using a process stream selected from the group consisting of air, PSA off-gas, hydrocarbon gas, and combinations thereof to dry the fuel gas and using a process stream selected from the group consisting of the flue gas, the syngas, and combinations thereof to heat the dry fuel gas. The second pre-reformer is a low-pressure pre-reformer, so that the heat contents of the fuel gas is increased through converting heavy hydrocarbons in the fuel gas to CO and H2 by the second pre-reformer.Type: ApplicationFiled: January 27, 2017Publication date: August 2, 2018Inventors: Taekyu KANG, Rong FAN, Pavol PRANDA, Robert A. GAGLIANO, Benjamin J. JURCIK, JR.
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Patent number: 9795927Abstract: A carbon molecular sieve (CMS) membrane is made by pyrolyzing a polymeric precursor membrane in a pyrolysis atmosphere containing a sulfur-containing compound.Type: GrantFiled: December 17, 2015Date of Patent: October 24, 2017Assignee: L'Air Liquide Société Anonyme Pour L'Étude Et L'Exploitation Des Procedes GeorgesInventors: Henri Chevrel, Benjamin J. Jurcik, Jr., Philippe A. Coignet, Raja Swaidan, Dean W. Kratzer
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Patent number: 9773683Abstract: Atomic layer or cyclic plasma etching chemistries and processes to etch films are disclosed. Films include Si, Ti, Ta, W, Al, Pd, Ir, Co, Fe, B, Cu, Ni, Pt, Ru, Mn, Mg, Cr, Au, alloys thereof, oxides thereof, nitrides thereof, and combinations thereof.Type: GrantFiled: June 4, 2015Date of Patent: September 26, 2017Assignee: American Air Liquide, Inc.Inventors: Rahul Gupta, Venkateswara R. Pallem, Benjamin J. Jurcik, Jr.
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Publication number: 20160184775Abstract: A carbon molecular sieve (CMS) membrane is made by pyrolyzing a polymeric precursor membrane in a pyrolysis atmosphere containing a sulfur-containing compound.Type: ApplicationFiled: December 17, 2015Publication date: June 30, 2016Applicant: L'Air Liquide, Societe Anonyme pour l'Etude et l'Exploitation des Procedes Georges ClaudeInventors: Henri CHEVREL, Benjamin J. JURCIK, JR., Philippe A. COIGNET, Raja SWAIDAN, Dean W. KRATZER
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Publication number: 20160184776Abstract: A carbon molecular sieve (CMS) membrane is made by pyrolyzing a polymeric precursor membrane in a pyrolysis atmosphere containing a sulfur-containing compound.Type: ApplicationFiled: May 29, 2015Publication date: June 30, 2016Inventors: Henri CHEVREL, Benjamin J. JURCIK, JR.
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Patent number: 9206507Abstract: Disclosed are homoleptic diazabutadiene nickel precursors used for the vapor deposition of nickel-containing films. The precursors have the general formula Ni(R-DAD)2, wherein R-DAD stands for substituted 1,4-diazabuta-1,3-diene ligands. The sole presence of the Ni—N bonds was also considered to avoid too high intrusion of other elements, such as carbon, into the nickel-containing films. The flexibility of the Ni—N bond in terms of film deposition also allows using the molecules for nickel, nickel-nitride, nickel-carbonitride, nickel oxide or any other type of nickel-containing films. The nickel-containing film depositions can be carried out by thermal and/or plasma-enhanced CVD, ALD, and pulse CVD or any other type of depositions methods.Type: GrantFiled: September 27, 2012Date of Patent: December 8, 2015Assignees: L'Air Liquide, Société Anonyme pour l'Etude et l'Exploitation des Procédés Georges Claude, American Air Liquide, Inc.Inventors: Clément Lansalot-Matras, Julien Gatineau, Benjamin J. Jurcik, Jr.
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Publication number: 20150325097Abstract: Disclosed are smart canisters for use in the materials industry. The smart canisters include sensors and communication devices that allow users to continuously monitor various physical and chemical properties of the product insider the canisters. For a variety of products that have limited stability and tend to decompose over time, variations in product properties can adversely impact the process in which the material is used. The smart canister can alert the user, in real time, when the product is starting to deviate from pre-set functional parameters.Type: ApplicationFiled: July 16, 2015Publication date: November 12, 2015Inventors: Ashutosh MISRA, Benjamin J. JURCIK, JR.
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Publication number: 20150270140Abstract: Atomic layer or cyclic plasma etching chemistries and processes to etch films are disclosed. Films include Si, Ti, Ta, W, Al, Pd, Ir, Co, Fe, B, Cu, Ni, Pt, Ru, Mn, Mg, Cr, Au, alloys thereof, oxides thereof, nitrides thereof, and combinations thereof.Type: ApplicationFiled: June 4, 2015Publication date: September 24, 2015Inventors: Rahul GUPTA, Venkateswara R. PALLEM, Benjamin J. JURCIK, JR.
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Patent number: 8758867Abstract: Methods and compositions for depositing metal films are described herein. In general, the disclosed methods utilize precursor compounds comprising gold, silver or copper. More specifically, the disclosed precursor compounds utilize neutral ligands derived from ethylene or acetylene.Type: GrantFiled: September 17, 2008Date of Patent: June 24, 2014Assignee: L'Air Liquide, Société Anonyme pour l'Etude et l'Exploitation des Procédés George ClaudeInventors: Benjamin J. Jurcik, Jr., Christian Dussarrat
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Patent number: 7770448Abstract: A chemical storage device and a method for monitoring chemical usage are described herein. The device and disclosed method utilize a chemical storage canister and a load cell integrated into one transportable unit. The load cell is capable of compensating for the added weight of attached dispensing devices used in the semiconductor industry. Additionally, the load cell continuously displays the weight of the chemicals as they are withdrawn from the chemical storage device. These functionalities are included in the control logic of the load cell which is incorporated into the load cell itself.Type: GrantFiled: July 19, 2006Date of Patent: August 10, 2010Assignee: Air Liquide Electronics U.S. LP.Inventors: Ashutosh Misra, Benjamin J. Jurcik, Jr., Ravi Laxman
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Patent number: 6885452Abstract: Provided is a novel chamber effluent monitoring system. The system comprises a chamber having an exhaust line connected thereto. The exhaust line includes a sample region, wherein substantially all of a chamber effluent also passes through the sample region. The system further comprises an absorption spectroscopy measurement system for detecting a gas phase molecular species. The measurement system comprises a light source and a main detector in optical communication with the sample region through one or more light transmissive window. The light source directs a light beam into the sample region through one of the one or more light transmissive window. The light beam passes through the sample region and exits the sample region through one of the one or more light transmissive window. The main detector responds to the light beam exiting the sample region.Type: GrantFiled: November 5, 2002Date of Patent: April 26, 2005Assignee: American Air Liquide, Inc.Inventors: James McAndrew, Hwa-Chi Wang, Benjamin J. Jurcik, Jr.
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Patent number: 6493086Abstract: Provided is a novel chamber effluent monitoring system. The system comprises a chamber having an exhaust line connected thereto. The exhaust line includes a sample region, wherein substantially all of a chamber effluent also passes through the sample region. The system further comprises an absorption spectroscopy measurement system for detecting a gas phase molecular species. The measurement system comprises a light source and a main detector in optical communication with the sample region through one or more light transmissive window. The light source directs a light beam into the sample region through one of the one or more light transmissive window. The light beam passes through the sample region and exits the sample region through one of the one or more light transmissive window. The main detector responds to the light beam exiting the sample region.Type: GrantFiled: November 28, 2000Date of Patent: December 10, 2002Assignees: American Air Liquide, Inc., L'Air Liquide-Societe Anonyme a Directoire et Conseil de Surveillance pour l'Etude et l'Exploitation des Procedes Georges ClaudeInventors: James McAndrew, Hwa-Chi Wang, Benjamin J. Jurcik, Jr.
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Patent number: 6171100Abstract: Burner firing method and device are presented where an oxidizing oxygen-fuel burner is fired at an angle to the reducing air-fuel burner flame to reduce overall NOx emissions from high temperature furnaces. The oxidizing oxy-fuel burner stoichiometric equivalence ratio (oxygen/fuel) is maintained in the range of about 1.5 to about 12.5. The reducing air-fuel burner is fired at an equivalence ratio of 0.6 to 1.00 to reduce the availability of oxygen in the flame and reducing NOx emissions. The oxidizing flame from the oxy-fuel burner is oriented such that the oxidizing flame gas stream intersects the reducing air-fuel flame gas stream at or near the tail section of the air-fuel flame. The inventive methods improve furnace temperature control and thermal efficiency by eliminating some nitrogen and provide an effective burnout of CO and other hydrocarbons using the higher mixing ability of the oxidizing flame combustion products.Type: GrantFiled: September 20, 1999Date of Patent: January 9, 2001Assignees: American Air Liquide, Inc., L'Air Liquide Societe Anonyme pour l'Elude et l'Exploitation des Procedes George ClaudeInventors: Mahendra L. Joshi, Benjamin J. Jurcik, Jr., Jean-Francois Simon
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Patent number: 6154284Abstract: Provided is a novel chamber effluent monitoring system. The system comprises a chamber having an exhaust line connected thereto. The exhaust line includes a sample region, wherein substantially all of a chamber effluent also passes through the sample region. The system further comprises an absorption spectroscopy measurement system for detecting a gas phase molecular species. The measurement system comprises a light source and a main detector in optical communication with the sample region through one or more light transmissive window. The light source directs a light beam into the sample region through one of the one or more light transmissive window. The light beam passes through the sample region and exits the sample region through one of the one or more light transmissive window. The main detector responds to the light beam exiting the sample region.Type: GrantFiled: March 30, 1999Date of Patent: November 28, 2000Assignee: American Air Liquide Inc.Inventors: James McAndrew, Hwa-Chi Wang, Benjamin J. Jurcik, Jr.
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Patent number: 5963336Abstract: Provided is a novel chamber effluent monitoring system. The system comprises a chamber having an exhaust line connected thereto. The exhaust line includes a sample region, wherein substantially all of a chamber effluent also passes through the sample region. The system further comprises an absorption spectroscopy measurement system for detecting a gas phase molecular species. The measurement system comprises a light source and a main detector in optical communication with the sample region through one or more light transmissive window. The light source directs a light beam into the sample region through one of the one or more light transmissive window. The light beam passes through the sample region and exits the sample region through one of the one or more light transmissive window. The main detector responds to the light beam exiting the sample region.Type: GrantFiled: September 10, 1996Date of Patent: October 5, 1999Assignee: American Air Liquide Inc.Inventors: James McAndrew, Hwa-Chi Wang, Benjamin J. Jurcik, Jr.
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Patent number: 5954498Abstract: Burner firing method and device are presented where an oxidizing oxygen-fuel burner is fired at an angle to the reducing air-fuel burner flame to reduce overall NOx emissions from high temperature furnaces. The oxidizing oxy-fuel burner stoichiometric equivalence ratio (oxygen/fuel) is maintained in the range of about 1.5 to about 12.5. The reducing air-fuel burner is fired at an equivalence ratio of 0.6 to 1.00 to reduce the availability of oxygen in the flame and reducing NOx emissions. The oxidizing flame from the oxy-fuel burner is oriented such that the oxidizing flame gas stream intersects the reducing air-fuel flame gas stream at or near the tail section of the air-fuel flame. The inventive methods improve furnace temperature control and thermal efficiency by eliminating some nitrogen and provide an effective burnout of CO and other hydrocarbons using the higher mixing ability of the oxidizing flame combustion products.Type: GrantFiled: February 26, 1998Date of Patent: September 21, 1999Assignees: American Air Liquide, Inc., L'Air Liquide, Societe Anonyme pour l'Etude et l'Exploitation des Procedes Georges ClaudeInventors: Mahendra L. Joshi, Benjamin J. Jurcik, Jr., Jean-Francois Simon
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Patent number: 5409159Abstract: A circuit board is wave soldered as it is carried by a conveyor through a solder wave established in a solder reservoir. Disposed on both sides of the solder wave are gas plenums which discharge shield gas. Each gas plenum includes a top wall, a side wall, and a bottom wall. The side wall is spaced horizontally from the wave, and the bottom wall is submerged within the solder. The side and (optionally) top walls include orifices for directing shield gas (i) at high velocity toward the solder wave to protect the solder wave with an atmosphere of shield gas, and (ii) upwardly toward an underside of the circuit board to strip entrained air therefrom. Instead of being submerged within the solder, the bottom wall could be spaced above the solder and provided with orifices to emit shield gas downwardly between the plenum and solder reservoir to create an inert atmosphere above the solder.Type: GrantFiled: June 2, 1994Date of Patent: April 25, 1995Assignees: L'Air Liquide, Societe Anonyme pour l'Etude et l'Exploitation des Procedes Georges Claude, American Air Liquide, Inc., Air Liquide America Corp.Inventors: Robert W. Connors, Frederick W. Giacobbe, Benjamin J. Jurcik, Jr., Frederic Rotman, Kevin P. McKean